JPS57112080A - Manufacture of field-effect transistor - Google Patents
Manufacture of field-effect transistorInfo
- Publication number
- JPS57112080A JPS57112080A JP55187343A JP18734380A JPS57112080A JP S57112080 A JPS57112080 A JP S57112080A JP 55187343 A JP55187343 A JP 55187343A JP 18734380 A JP18734380 A JP 18734380A JP S57112080 A JPS57112080 A JP S57112080A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- injected
- fet
- hemt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005669 field effect Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55187343A JPS57112080A (en) | 1980-12-29 | 1980-12-29 | Manufacture of field-effect transistor |
EP19810305986 EP0056904B1 (en) | 1980-12-29 | 1981-12-21 | High electron mobility single heterojunction semiconductor devices and methods of production of such devices |
DE8181305986T DE3171953D1 (en) | 1980-12-29 | 1981-12-21 | High electron mobility single heterojunction semiconductor devices and methods of production of such devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55187343A JPS57112080A (en) | 1980-12-29 | 1980-12-29 | Manufacture of field-effect transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57112080A true JPS57112080A (en) | 1982-07-12 |
JPS6353708B2 JPS6353708B2 (ja) | 1988-10-25 |
Family
ID=16204331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55187343A Granted JPS57112080A (en) | 1980-12-29 | 1980-12-29 | Manufacture of field-effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57112080A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4795717A (en) * | 1983-06-09 | 1989-01-03 | Fujitsu Limited | Method for producing semiconductor device |
WO2002031886A1 (en) * | 2000-10-13 | 2002-04-18 | Kwangju Institute Of Science And Technology | Monolithically integrated e/d mode hemt and method for fabricating the same |
KR100499522B1 (ko) * | 2001-11-03 | 2005-07-07 | 조신호 | 초고속 반도체 광전도 스위칭 장치 |
-
1980
- 1980-12-29 JP JP55187343A patent/JPS57112080A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4795717A (en) * | 1983-06-09 | 1989-01-03 | Fujitsu Limited | Method for producing semiconductor device |
WO2002031886A1 (en) * | 2000-10-13 | 2002-04-18 | Kwangju Institute Of Science And Technology | Monolithically integrated e/d mode hemt and method for fabricating the same |
US6670652B2 (en) | 2000-10-13 | 2003-12-30 | Kwangju Institute Of Science And Technology | Monolithically integrated E/D mode HEMT and method for fabricating the same |
KR100499522B1 (ko) * | 2001-11-03 | 2005-07-07 | 조신호 | 초고속 반도체 광전도 스위칭 장치 |
Also Published As
Publication number | Publication date |
---|---|
JPS6353708B2 (ja) | 1988-10-25 |
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