JPS57111532A - Image forming material and formation of image - Google Patents

Image forming material and formation of image

Info

Publication number
JPS57111532A
JPS57111532A JP18867980A JP18867980A JPS57111532A JP S57111532 A JPS57111532 A JP S57111532A JP 18867980 A JP18867980 A JP 18867980A JP 18867980 A JP18867980 A JP 18867980A JP S57111532 A JPS57111532 A JP S57111532A
Authority
JP
Japan
Prior art keywords
layer
photosensitive resin
parts
substrate
active light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18867980A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0261021B2 (enrdf_load_stackoverflow
Inventor
Hiroyuki Obata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP18867980A priority Critical patent/JPS57111532A/ja
Publication of JPS57111532A publication Critical patent/JPS57111532A/ja
Publication of JPH0261021B2 publication Critical patent/JPH0261021B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP18867980A 1980-12-27 1980-12-27 Image forming material and formation of image Granted JPS57111532A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18867980A JPS57111532A (en) 1980-12-27 1980-12-27 Image forming material and formation of image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18867980A JPS57111532A (en) 1980-12-27 1980-12-27 Image forming material and formation of image

Publications (2)

Publication Number Publication Date
JPS57111532A true JPS57111532A (en) 1982-07-12
JPH0261021B2 JPH0261021B2 (enrdf_load_stackoverflow) 1990-12-18

Family

ID=16227940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18867980A Granted JPS57111532A (en) 1980-12-27 1980-12-27 Image forming material and formation of image

Country Status (1)

Country Link
JP (1) JPS57111532A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4565770A (en) * 1984-11-13 1986-01-21 E. I. Du Pont De Nemours And Company Process for dot etching acid soluble photopolymerizable elements utilizing chemically soluble pigments
US4567129A (en) * 1984-07-27 1986-01-28 E. I. Du Pont De Nemours And Company Process for image formation utilizing chemically soluble pigments
US4579808A (en) * 1984-07-27 1986-04-01 E. I. Du Pont De Nemours And Company Imageable colloidal metal/mercaptan elements
US4584261A (en) * 1984-07-27 1986-04-22 E. I. Du Pont De Nemours And Company Process for etching nonphotosensitive layer under washoff photopolymer layer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4567129A (en) * 1984-07-27 1986-01-28 E. I. Du Pont De Nemours And Company Process for image formation utilizing chemically soluble pigments
US4579808A (en) * 1984-07-27 1986-04-01 E. I. Du Pont De Nemours And Company Imageable colloidal metal/mercaptan elements
US4584261A (en) * 1984-07-27 1986-04-22 E. I. Du Pont De Nemours And Company Process for etching nonphotosensitive layer under washoff photopolymer layer
US4565770A (en) * 1984-11-13 1986-01-21 E. I. Du Pont De Nemours And Company Process for dot etching acid soluble photopolymerizable elements utilizing chemically soluble pigments

Also Published As

Publication number Publication date
JPH0261021B2 (enrdf_load_stackoverflow) 1990-12-18

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