JPS57106030A - Development of resist - Google Patents

Development of resist

Info

Publication number
JPS57106030A
JPS57106030A JP18190680A JP18190680A JPS57106030A JP S57106030 A JPS57106030 A JP S57106030A JP 18190680 A JP18190680 A JP 18190680A JP 18190680 A JP18190680 A JP 18190680A JP S57106030 A JPS57106030 A JP S57106030A
Authority
JP
Japan
Prior art keywords
developer
injection
substrate
resist
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18190680A
Other languages
Japanese (ja)
Inventor
Hisao Haruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18190680A priority Critical patent/JPS57106030A/en
Publication of JPS57106030A publication Critical patent/JPS57106030A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Abstract

PURPOSE:To eliminate residual resist and improve the deficiency of fine pattern resolution, as well as enhance the quality of resist surface, by repeating an ON process to inject developer and to rotate a substrate and an OFF process where neither injection nor rotation is taken place. CONSTITUTION:The resist film coated on a substrate is exposed in accordance with a designated pattern. And then, the resist film is injected with developer, and the substrate is rotated to develop a designated pattern. At the same time, an ON process for injection of developer and rotation of the substrate, and an OFF process, where neither injection nor rotation is taken place, are repeated for a certain interval of time. This eliminates the residual resist and the deficiency of fine pattern resolution at the time of developer injection. This stabilizes the surface quality and reduces wasteful developer in use.
JP18190680A 1980-12-24 1980-12-24 Development of resist Pending JPS57106030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18190680A JPS57106030A (en) 1980-12-24 1980-12-24 Development of resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18190680A JPS57106030A (en) 1980-12-24 1980-12-24 Development of resist

Publications (1)

Publication Number Publication Date
JPS57106030A true JPS57106030A (en) 1982-07-01

Family

ID=16108950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18190680A Pending JPS57106030A (en) 1980-12-24 1980-12-24 Development of resist

Country Status (1)

Country Link
JP (1) JPS57106030A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0483349A1 (en) * 1990-05-18 1992-05-06 Xinix, Inc. Method for control of photoresist develop processes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0483349A1 (en) * 1990-05-18 1992-05-06 Xinix, Inc. Method for control of photoresist develop processes
US5292605A (en) * 1990-05-18 1994-03-08 Xinix, Inc. Method for control of photoresist develop processes

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