JPS5693878A - Formation of tapered etched film - Google Patents

Formation of tapered etched film

Info

Publication number
JPS5693878A
JPS5693878A JP17201679A JP17201679A JPS5693878A JP S5693878 A JPS5693878 A JP S5693878A JP 17201679 A JP17201679 A JP 17201679A JP 17201679 A JP17201679 A JP 17201679A JP S5693878 A JPS5693878 A JP S5693878A
Authority
JP
Japan
Prior art keywords
film
thin
thin film
etched
tapered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17201679A
Other languages
Japanese (ja)
Inventor
Kazuhiko Amemori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17201679A priority Critical patent/JPS5693878A/en
Publication of JPS5693878A publication Critical patent/JPS5693878A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To form the thin tapered etched film in fabricating a thin film magnetic head by a method wherein the thin film of Al or an Al alloy is formed on a substrate plate and, after a surface thereof is oxidized, a resist layer is formed and etching is carried out.
CONSTITUTION: The thin film 11 of Al or the Al alloy is formed on the substrate plate by vapor deposition or the like and the stable thin oxide film 12 is formed on the thin film 11 by changing the atmosphere to the oxidative atmosphere. A desired resist film 13 is formed on said oxide film and, thereafter, said coated substrate plate is immersed in an etching solution. At firts, the oxide film 12 is rapidly etched and, subsequently, the thin film 11 is etched and the etched area is spread out to an underside of the resist film 13 and, finally, a cross area of the thin film 11 becomes tapered. In thin point, the etching treatment is stopped and a tapered angle without irregularities is formed.
COPYRIGHT: (C)1981,JPO&Japio
JP17201679A 1979-12-27 1979-12-27 Formation of tapered etched film Pending JPS5693878A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17201679A JPS5693878A (en) 1979-12-27 1979-12-27 Formation of tapered etched film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17201679A JPS5693878A (en) 1979-12-27 1979-12-27 Formation of tapered etched film

Publications (1)

Publication Number Publication Date
JPS5693878A true JPS5693878A (en) 1981-07-29

Family

ID=15933955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17201679A Pending JPS5693878A (en) 1979-12-27 1979-12-27 Formation of tapered etched film

Country Status (1)

Country Link
JP (1) JPS5693878A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5217995A (en) * 1975-07-31 1977-02-10 Haadouitsukuu Etsutaa Co Automatic packing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5217995A (en) * 1975-07-31 1977-02-10 Haadouitsukuu Etsutaa Co Automatic packing device

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