JPS5688372A - Manufacture of semiconductor diaphragm - Google Patents
Manufacture of semiconductor diaphragmInfo
- Publication number
- JPS5688372A JPS5688372A JP16601479A JP16601479A JPS5688372A JP S5688372 A JPS5688372 A JP S5688372A JP 16601479 A JP16601479 A JP 16601479A JP 16601479 A JP16601479 A JP 16601479A JP S5688372 A JPS5688372 A JP S5688372A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- diaphragm
- etching
- thickness
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 6
- 238000005530 etching Methods 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Pressure Sensors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16601479A JPS5688372A (en) | 1979-12-19 | 1979-12-19 | Manufacture of semiconductor diaphragm |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16601479A JPS5688372A (en) | 1979-12-19 | 1979-12-19 | Manufacture of semiconductor diaphragm |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5688372A true JPS5688372A (en) | 1981-07-17 |
JPS6154268B2 JPS6154268B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Family
ID=15823297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16601479A Granted JPS5688372A (en) | 1979-12-19 | 1979-12-19 | Manufacture of semiconductor diaphragm |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5688372A (enrdf_load_stackoverflow) |
-
1979
- 1979-12-19 JP JP16601479A patent/JPS5688372A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6154268B2 (enrdf_load_stackoverflow) | 1986-11-21 |
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