JPS5687671A - Dry etching apparatus - Google Patents

Dry etching apparatus

Info

Publication number
JPS5687671A
JPS5687671A JP16217779A JP16217779A JPS5687671A JP S5687671 A JPS5687671 A JP S5687671A JP 16217779 A JP16217779 A JP 16217779A JP 16217779 A JP16217779 A JP 16217779A JP S5687671 A JPS5687671 A JP S5687671A
Authority
JP
Japan
Prior art keywords
high frequency
electrodes
ground potential
samples
reactive gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16217779A
Other languages
English (en)
Japanese (ja)
Other versions
JPS627271B2 (enExample
Inventor
Tsutomu Tsukada
Katsuzo Ukai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP16217779A priority Critical patent/JPS5687671A/ja
Publication of JPS5687671A publication Critical patent/JPS5687671A/ja
Publication of JPS627271B2 publication Critical patent/JPS627271B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP16217779A 1979-12-15 1979-12-15 Dry etching apparatus Granted JPS5687671A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16217779A JPS5687671A (en) 1979-12-15 1979-12-15 Dry etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16217779A JPS5687671A (en) 1979-12-15 1979-12-15 Dry etching apparatus

Publications (2)

Publication Number Publication Date
JPS5687671A true JPS5687671A (en) 1981-07-16
JPS627271B2 JPS627271B2 (enExample) 1987-02-16

Family

ID=15749473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16217779A Granted JPS5687671A (en) 1979-12-15 1979-12-15 Dry etching apparatus

Country Status (1)

Country Link
JP (1) JPS5687671A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2516308A1 (fr) * 1981-11-12 1983-05-13 Varian Associates Plateau d'attaque radiofrequence, notamment pour l'attaque par pulverisation cathodique de tranches semi-conductrices
JPS6056076A (ja) * 1983-09-08 1985-04-01 Ulvac Corp スパツタエツチング装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2516308A1 (fr) * 1981-11-12 1983-05-13 Varian Associates Plateau d'attaque radiofrequence, notamment pour l'attaque par pulverisation cathodique de tranches semi-conductrices
JPS6056076A (ja) * 1983-09-08 1985-04-01 Ulvac Corp スパツタエツチング装置

Also Published As

Publication number Publication date
JPS627271B2 (enExample) 1987-02-16

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