JPS5687043A - Mask for exposure - Google Patents

Mask for exposure

Info

Publication number
JPS5687043A
JPS5687043A JP16404979A JP16404979A JPS5687043A JP S5687043 A JPS5687043 A JP S5687043A JP 16404979 A JP16404979 A JP 16404979A JP 16404979 A JP16404979 A JP 16404979A JP S5687043 A JPS5687043 A JP S5687043A
Authority
JP
Japan
Prior art keywords
substrate
pattern
light transmitting
refractive index
thermal expansion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16404979A
Other languages
Japanese (ja)
Inventor
Tsutomu Fujita
Susumu Koishikawa
Yoshinori Mitomi
Hideyuki Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16404979A priority Critical patent/JPS5687043A/en
Publication of JPS5687043A publication Critical patent/JPS5687043A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To manufacture a fine pattern of high accuracy on a photosensitive emulsion film coated onto a substrate by forming a light shielding pattern on the 1st light transmitting substrate together with the 2nd light transmitting substrate about equal to the 1st substrate in refractive index and thermal expansion coefft. CONSTITUTION:Fine pattern 4 made of light shielding substance such as Cr is formed on the 1st parallel plane substrate 3 made of light transmitting borosilicate glass, and the 2nd plane parallel substrate 7 made of light transmitting borosilicate glass free from an internal strain and about equal to substrate 3 in refractive index and thermal expansion coefft. is stuck to the pattern 4 side of substrate 3 with adhesive 8 about equal to substrate 3 in refractive index and thermal expansion coefft. Thus, no light refraction occurs between the layers, and high resolution is obtd. as if pattern 4 alone were present in air to enable fine working of high resolution.
JP16404979A 1979-12-19 1979-12-19 Mask for exposure Pending JPS5687043A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16404979A JPS5687043A (en) 1979-12-19 1979-12-19 Mask for exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16404979A JPS5687043A (en) 1979-12-19 1979-12-19 Mask for exposure

Publications (1)

Publication Number Publication Date
JPS5687043A true JPS5687043A (en) 1981-07-15

Family

ID=15785818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16404979A Pending JPS5687043A (en) 1979-12-19 1979-12-19 Mask for exposure

Country Status (1)

Country Link
JP (1) JPS5687043A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154242A (en) * 1981-01-05 1982-09-24 Western Electric Co Photomask and manufacture thereof
JPS57188039A (en) * 1981-02-17 1982-11-18 Sensaa Patent Unto Fueruzuufus Projection mask, production unit therefor, projection printing system and method of protecting pattern on glass substrate
JPS6257260U (en) * 1985-09-26 1987-04-09

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154242A (en) * 1981-01-05 1982-09-24 Western Electric Co Photomask and manufacture thereof
JPH0213780B2 (en) * 1981-01-05 1990-04-05 Ei Teii Ando Teii Tekunorojiizu Inc
JPS57188039A (en) * 1981-02-17 1982-11-18 Sensaa Patent Unto Fueruzuufus Projection mask, production unit therefor, projection printing system and method of protecting pattern on glass substrate
JPS6332379B2 (en) * 1981-02-17 1988-06-29 Tsuenzooru Patento Unto Fueazuufusu Anshutaruto
JPS6257260U (en) * 1985-09-26 1987-04-09

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