JPS54151457A - Forming method of reflection reducing coating - Google Patents

Forming method of reflection reducing coating

Info

Publication number
JPS54151457A
JPS54151457A JP6027478A JP6027478A JPS54151457A JP S54151457 A JPS54151457 A JP S54151457A JP 6027478 A JP6027478 A JP 6027478A JP 6027478 A JP6027478 A JP 6027478A JP S54151457 A JPS54151457 A JP S54151457A
Authority
JP
Japan
Prior art keywords
film
optical material
refractive index
wavelength
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6027478A
Other languages
Japanese (ja)
Other versions
JPS6133161B2 (en
Inventor
Yoshio Hatsuda
Kanichi Isobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6027478A priority Critical patent/JPS54151457A/en
Publication of JPS54151457A publication Critical patent/JPS54151457A/en
Publication of JPS6133161B2 publication Critical patent/JPS6133161B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Optical Elements (AREA)

Abstract

PURPOSE: To reduce the surface reflection of optical material by holding a transparent sheet of a specified thickness having a refractive index smaller than the refractive index of the optical material being a target in close contact with the surface of the optical material.
CONSTITUTION: In a reduced pressure vacuum chamber, a film 22 [e.g., polyethylene sheet of thickness 33μ (optical thickness 50μ), refractive index 1.518] is compression-bonded and fixed on the surface of an optical material 21 (e.g., crystal quartz, refractive index 2.117 at wavelength 200μ), after which air is introduced into the chamber to let the film 22 be compression-bonded and held on the surface of the optical material 21. The provision of the abovementioned reflection reducing film enables the surface reflection at a wavelength 200μ to be made nearly zero. In case light other than the wavelength 200μ is a target, it is only required to make the optical thickness of the film 22 at 1/4 the target wavelength. The abovementioned method is particularly effective for far infrared region where thick film is required as a reflection reducing film.
COPYRIGHT: (C)1979,JPO&Japio
JP6027478A 1978-05-19 1978-05-19 Forming method of reflection reducing coating Granted JPS54151457A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6027478A JPS54151457A (en) 1978-05-19 1978-05-19 Forming method of reflection reducing coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6027478A JPS54151457A (en) 1978-05-19 1978-05-19 Forming method of reflection reducing coating

Publications (2)

Publication Number Publication Date
JPS54151457A true JPS54151457A (en) 1979-11-28
JPS6133161B2 JPS6133161B2 (en) 1986-07-31

Family

ID=13137388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6027478A Granted JPS54151457A (en) 1978-05-19 1978-05-19 Forming method of reflection reducing coating

Country Status (1)

Country Link
JP (1) JPS54151457A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796415U (en) * 1980-12-02 1982-06-14
JPS59195203A (en) * 1983-04-20 1984-11-06 Matsushita Electric Ind Co Ltd Infrared transmitting fiber
JPH01112201A (en) * 1987-10-26 1989-04-28 Hamamatsu Photonics Kk Optical element
JPH01307701A (en) * 1988-06-06 1989-12-12 Nitto Denko Corp Film for forming antireflection layer and production of antireflection plate by using the film
JPH08101302A (en) * 1994-09-30 1996-04-16 Dainippon Printing Co Ltd Antireflection sheet and its production

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS495342A (en) * 1972-03-30 1974-01-18
JPS5136553U (en) * 1974-09-09 1976-03-18

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5136553B2 (en) * 1973-10-26 1976-10-08

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS495342A (en) * 1972-03-30 1974-01-18
JPS5136553U (en) * 1974-09-09 1976-03-18

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796415U (en) * 1980-12-02 1982-06-14
JPS59195203A (en) * 1983-04-20 1984-11-06 Matsushita Electric Ind Co Ltd Infrared transmitting fiber
JPH01112201A (en) * 1987-10-26 1989-04-28 Hamamatsu Photonics Kk Optical element
JPH01307701A (en) * 1988-06-06 1989-12-12 Nitto Denko Corp Film for forming antireflection layer and production of antireflection plate by using the film
JPH08101302A (en) * 1994-09-30 1996-04-16 Dainippon Printing Co Ltd Antireflection sheet and its production

Also Published As

Publication number Publication date
JPS6133161B2 (en) 1986-07-31

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