JPS55153938A - Image forming material for contact reflection exposure - Google Patents
Image forming material for contact reflection exposureInfo
- Publication number
- JPS55153938A JPS55153938A JP6172879A JP6172879A JPS55153938A JP S55153938 A JPS55153938 A JP S55153938A JP 6172879 A JP6172879 A JP 6172879A JP 6172879 A JP6172879 A JP 6172879A JP S55153938 A JPS55153938 A JP S55153938A
- Authority
- JP
- Japan
- Prior art keywords
- image
- refractive index
- layer
- image forming
- forming material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To obtain an image material capable of forming an image of a high contrast by covering a support material of a higher refractive index with a photosensitive layer of a lower refractive index.
CONSTITUTION: Support material 2 of higher refractive index is covered with photosensitive layer 5 of a lower refractive index to form image material (intermediate sheet) 1. Layer 5 of material 1 is contacted to image portion 6 and nonimage portion 7 of original 8, and by applying light from the material 1 side, resin 4 of layer 5 corresponding to portion 7 is set to form an image on material 1. Reflecting film 12 such as Al thin film may be interposed between support 2 and layer 5 of material 1 to form an image of a higher contrast.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6172879A JPS55153938A (en) | 1979-05-18 | 1979-05-18 | Image forming material for contact reflection exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6172879A JPS55153938A (en) | 1979-05-18 | 1979-05-18 | Image forming material for contact reflection exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55153938A true JPS55153938A (en) | 1980-12-01 |
Family
ID=13179553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6172879A Pending JPS55153938A (en) | 1979-05-18 | 1979-05-18 | Image forming material for contact reflection exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55153938A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4379833A (en) * | 1981-12-31 | 1983-04-12 | International Business Machines Corporation | Self-aligned photoresist process |
-
1979
- 1979-05-18 JP JP6172879A patent/JPS55153938A/en active Pending
Non-Patent Citations (1)
Title |
---|
LIGHT-SENSITIVE SYSTEMS=1965 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4379833A (en) * | 1981-12-31 | 1983-04-12 | International Business Machines Corporation | Self-aligned photoresist process |
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