JPS5685826A - Vacuum treatment device - Google Patents

Vacuum treatment device

Info

Publication number
JPS5685826A
JPS5685826A JP16153379A JP16153379A JPS5685826A JP S5685826 A JPS5685826 A JP S5685826A JP 16153379 A JP16153379 A JP 16153379A JP 16153379 A JP16153379 A JP 16153379A JP S5685826 A JPS5685826 A JP S5685826A
Authority
JP
Japan
Prior art keywords
pipe
wafer
valve
chamber
fragments
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16153379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS648464B2 (enrdf_load_stackoverflow
Inventor
Arata Kimoto
Tetsujiro Kotani
Takao Nagasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16153379A priority Critical patent/JPS5685826A/ja
Publication of JPS5685826A publication Critical patent/JPS5685826A/ja
Publication of JPS648464B2 publication Critical patent/JPS648464B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP16153379A 1979-12-14 1979-12-14 Vacuum treatment device Granted JPS5685826A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16153379A JPS5685826A (en) 1979-12-14 1979-12-14 Vacuum treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16153379A JPS5685826A (en) 1979-12-14 1979-12-14 Vacuum treatment device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP459590A Division JPH02224237A (ja) 1990-01-16 1990-01-16 真空処理方法

Publications (2)

Publication Number Publication Date
JPS5685826A true JPS5685826A (en) 1981-07-13
JPS648464B2 JPS648464B2 (enrdf_load_stackoverflow) 1989-02-14

Family

ID=15736897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16153379A Granted JPS5685826A (en) 1979-12-14 1979-12-14 Vacuum treatment device

Country Status (1)

Country Link
JP (1) JPS5685826A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154025A (ja) * 1983-02-23 1984-09-03 Hitachi Ltd 半導体製造装置反応室のリ−ク方法
JPS60227421A (ja) * 1985-04-05 1985-11-12 Hitachi Ltd 真空容器
JPH02224237A (ja) * 1990-01-16 1990-09-06 Hitachi Ltd 真空処理方法
US5370709A (en) * 1990-07-18 1994-12-06 Kabushiki Kaisha Toshiba Semiconductor wafer processing apparatus having a Bernoulli chuck

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0431652U (enrdf_load_stackoverflow) * 1990-07-11 1992-03-13

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501667A (enrdf_load_stackoverflow) * 1973-05-07 1975-01-09
JPS5339745A (en) * 1976-09-22 1978-04-11 Konishiroku Photo Ind Co Ltd Formation of pigment image

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501667A (enrdf_load_stackoverflow) * 1973-05-07 1975-01-09
JPS5339745A (en) * 1976-09-22 1978-04-11 Konishiroku Photo Ind Co Ltd Formation of pigment image

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154025A (ja) * 1983-02-23 1984-09-03 Hitachi Ltd 半導体製造装置反応室のリ−ク方法
JPS60227421A (ja) * 1985-04-05 1985-11-12 Hitachi Ltd 真空容器
JPH02224237A (ja) * 1990-01-16 1990-09-06 Hitachi Ltd 真空処理方法
US5370709A (en) * 1990-07-18 1994-12-06 Kabushiki Kaisha Toshiba Semiconductor wafer processing apparatus having a Bernoulli chuck

Also Published As

Publication number Publication date
JPS648464B2 (enrdf_load_stackoverflow) 1989-02-14

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