JPS5678052A - Electron beam device - Google Patents

Electron beam device

Info

Publication number
JPS5678052A
JPS5678052A JP15430379A JP15430379A JPS5678052A JP S5678052 A JPS5678052 A JP S5678052A JP 15430379 A JP15430379 A JP 15430379A JP 15430379 A JP15430379 A JP 15430379A JP S5678052 A JPS5678052 A JP S5678052A
Authority
JP
Japan
Prior art keywords
cathode
wehnelt cylinder
electron beam
gun
electron gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15430379A
Other languages
Japanese (ja)
Inventor
Isao Sasaki
Kakuki Motoyama
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15430379A priority Critical patent/JPS5678052A/en
Publication of JPS5678052A publication Critical patent/JPS5678052A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15—External mechanical adjustment of electron or ion optical components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain an electron beam gun with stabilized electron beam current over long time and with long life by making the device so that the distance between a cathode and Wehnelt cylinder of the electron gun can be controlled from out of the room in which the electron gun is installed. CONSTITUTION:A cathode 7 and Wehnelt cylinder 4 of an electron gun to be used for electron beam exposuring devices are supported movably on a supporting base 2 in a vacuum outer container 1. LaB6 cathode 7 is fixed to a ceramic 3 through a heater 6, the position of ceramic 3 is controlled in the horizontal direction using an adjusting screw 10. The Wehnelt cylinder 4 is fixed on the supporting base 2 with a screw, and moved vertically by rotating the Wehnelt cylinder with a worm wheel. The relative position of cathode 7 and a hole D on the Wehnelt cylinder 4 can be measured and observed from a mirror 8, glass window 11, and window provided on prescribed position.
JP15430379A 1979-11-30 1979-11-30 Electron beam device Pending JPS5678052A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15430379A JPS5678052A (en) 1979-11-30 1979-11-30 Electron beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15430379A JPS5678052A (en) 1979-11-30 1979-11-30 Electron beam device

Publications (1)

Publication Number Publication Date
JPS5678052A true JPS5678052A (en) 1981-06-26

Family

ID=15581169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15430379A Pending JPS5678052A (en) 1979-11-30 1979-11-30 Electron beam device

Country Status (1)

Country Link
JP (1) JPS5678052A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58147946A (en) * 1982-02-25 1983-09-02 Toshiba Corp Electron gun unit
JPH0246359U (en) * 1988-09-24 1990-03-29
JP2011040341A (en) * 2009-08-18 2011-02-24 Nuflare Technology Inc Electron gun, charged particle beam lithography system, and charged particle beam lithography method
CN107452578A (en) * 2017-09-04 2017-12-08 国家纳米科学中心 A kind of filament alignment system and filament localization method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58147946A (en) * 1982-02-25 1983-09-02 Toshiba Corp Electron gun unit
JPS6322408B2 (en) * 1982-02-25 1988-05-11 Tokyo Shibaura Electric Co
JPH0246359U (en) * 1988-09-24 1990-03-29
JP2011040341A (en) * 2009-08-18 2011-02-24 Nuflare Technology Inc Electron gun, charged particle beam lithography system, and charged particle beam lithography method
CN107452578A (en) * 2017-09-04 2017-12-08 国家纳米科学中心 A kind of filament alignment system and filament localization method
US20190074156A1 (en) * 2017-09-04 2019-03-07 National Center For Nanoscience And Technology, China Filament positioning system and filament positioning method
US10607805B2 (en) 2017-09-04 2020-03-31 National Center For Nanoscience And Technology, China Filament positioning system and filament positioning method

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