JPS5675573A - Ion etching method - Google Patents
Ion etching methodInfo
- Publication number
- JPS5675573A JPS5675573A JP15071779A JP15071779A JPS5675573A JP S5675573 A JPS5675573 A JP S5675573A JP 15071779 A JP15071779 A JP 15071779A JP 15071779 A JP15071779 A JP 15071779A JP S5675573 A JPS5675573 A JP S5675573A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- dissociated
- etching
- etched
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15071779A JPS5675573A (en) | 1979-11-22 | 1979-11-22 | Ion etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15071779A JPS5675573A (en) | 1979-11-22 | 1979-11-22 | Ion etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5675573A true JPS5675573A (en) | 1981-06-22 |
Family
ID=15502860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15071779A Pending JPS5675573A (en) | 1979-11-22 | 1979-11-22 | Ion etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5675573A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6428822A (en) * | 1987-07-24 | 1989-01-31 | Hitachi Ltd | Plasma etching device |
JPH04257801A (ja) * | 1991-02-13 | 1992-09-14 | Sharp Corp | 偏光回折素子の製造方法 |
US11622425B2 (en) | 2016-08-05 | 2023-04-04 | Hydrogen Universe Ltd | Energy transfer method and system |
-
1979
- 1979-11-22 JP JP15071779A patent/JPS5675573A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6428822A (en) * | 1987-07-24 | 1989-01-31 | Hitachi Ltd | Plasma etching device |
JPH04257801A (ja) * | 1991-02-13 | 1992-09-14 | Sharp Corp | 偏光回折素子の製造方法 |
US11622425B2 (en) | 2016-08-05 | 2023-04-04 | Hydrogen Universe Ltd | Energy transfer method and system |
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