JPS565974A - Film forming method - Google Patents

Film forming method

Info

Publication number
JPS565974A
JPS565974A JP8209379A JP8209379A JPS565974A JP S565974 A JPS565974 A JP S565974A JP 8209379 A JP8209379 A JP 8209379A JP 8209379 A JP8209379 A JP 8209379A JP S565974 A JPS565974 A JP S565974A
Authority
JP
Japan
Prior art keywords
supporter
chamber
discharge
reactive gas
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8209379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6257712B2 (enrdf_load_stackoverflow
Inventor
Hidekazu Inoue
Isamu Shimizu
Kyosuke Ogawa
Nobuo Kitajima
Tadaharu Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP8209379A priority Critical patent/JPS565974A/ja
Publication of JPS565974A publication Critical patent/JPS565974A/ja
Publication of JPS6257712B2 publication Critical patent/JPS6257712B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
JP8209379A 1979-06-27 1979-06-27 Film forming method Granted JPS565974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8209379A JPS565974A (en) 1979-06-27 1979-06-27 Film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8209379A JPS565974A (en) 1979-06-27 1979-06-27 Film forming method

Publications (2)

Publication Number Publication Date
JPS565974A true JPS565974A (en) 1981-01-22
JPS6257712B2 JPS6257712B2 (enrdf_load_stackoverflow) 1987-12-02

Family

ID=13764810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8209379A Granted JPS565974A (en) 1979-06-27 1979-06-27 Film forming method

Country Status (1)

Country Link
JP (1) JPS565974A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61288074A (ja) * 1985-06-17 1986-12-18 Canon Inc Ｃｖｄ法による堆積膜形成方法
JPH09115836A (ja) * 1995-09-29 1997-05-02 Hyundai Electron Ind Co Ltd 薄膜蒸着装置
JPWO2016133131A1 (ja) * 2015-02-18 2017-11-24 株式会社ニコン 薄膜製造装置、及び薄膜製造方法
CN110770885A (zh) * 2017-06-23 2020-02-07 东京毅力科创株式会社 探针装置和针迹转印方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61288074A (ja) * 1985-06-17 1986-12-18 Canon Inc Ｃｖｄ法による堆積膜形成方法
JPH09115836A (ja) * 1995-09-29 1997-05-02 Hyundai Electron Ind Co Ltd 薄膜蒸着装置
US5948167A (en) * 1995-09-29 1999-09-07 Hyundai Electronics Industries Co., Ltd. Thin film deposition apparatus
JPWO2016133131A1 (ja) * 2015-02-18 2017-11-24 株式会社ニコン 薄膜製造装置、及び薄膜製造方法
CN110770885A (zh) * 2017-06-23 2020-02-07 东京毅力科创株式会社 探针装置和针迹转印方法
CN110770885B (zh) * 2017-06-23 2023-06-20 东京毅力科创株式会社 探针装置和针迹转印方法

Also Published As

Publication number Publication date
JPS6257712B2 (enrdf_load_stackoverflow) 1987-12-02

Similar Documents

Publication Publication Date Title
EP0157573A3 (en) Vacuum coating apparatus
AU3873385A (en) Making electrophotographic devices
GB1294025A (en) Rf sputtering
JPS57106513A (en) Formation of carbon film
AU556673B2 (en) Apparatus for manufacture of photovoltaic devices
EP0359567A3 (en) Plasma processing method and apparatus
JPS565974A (en) Film forming method
JPS5591968A (en) Film forming method by glow discharge
JPS565972A (en) Film forming method
JPS565975A (en) Film forming method
JPS56130466A (en) Film forming method
JPS565973A (en) Film forming method
JPS5745339A (en) Production of deposited film
JPS5667925A (en) Plasma etching method
JPS5538919A (en) Sputtering apparatus
JPS5789217A (en) Manufacturing device of semiconductor
JPS56169116A (en) Manufacture of amorphous silicon film
JPS57140875A (en) Continuous sputtering method
JPS55141561A (en) Surface treatment of metallic material
JPS5435178A (en) Ultrafine particle depositing apparatus
JPS56163262A (en) Method and apparatus for forming oxidation and weather resistant film after surface treatment
JPS5582943A (en) Novel replica thin-film for specimen of electron microscope and its preparation
JPS52122284A (en) Sputtering device having bias electrode
JPS5249990A (en) Method for vacuum evaporation of multi layr film
JPS56169770A (en) Ionic plating device