JPS5655080A - Germanium avalanche photodiode - Google Patents
Germanium avalanche photodiodeInfo
- Publication number
- JPS5655080A JPS5655080A JP13085779A JP13085779A JPS5655080A JP S5655080 A JPS5655080 A JP S5655080A JP 13085779 A JP13085779 A JP 13085779A JP 13085779 A JP13085779 A JP 13085779A JP S5655080 A JPS5655080 A JP S5655080A
- Authority
- JP
- Japan
- Prior art keywords
- type layer
- density
- layer
- light
- detecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052732 germanium Inorganic materials 0.000 title abstract 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 title abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 230000003321 amplification Effects 0.000 abstract 1
- 238000003199 nucleic acid amplification method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To obtain a germanium avalanche photodiode which incorporates high quantum efficiency and low noise amplification by forming a part for detecting a light with a high density n type layer, a low density n type layer and a p type layer which forms junction detecting the low density n type layer and light. CONSTITUTION:A part for detecting a light is formed of a high density n type layer 1, a low density n type layer 14 and a p type layer 2 forming a junction 8 for detecting the low density n type layer 14 and the light along the incident light 7. For example, there are formed the high density layer 1 having 10<19>-10<20>/cm<3> of impurity density and 0.3-0.4mum of thickness, the layer 14 having 10<17>/cm<3> of impurity density and sequentially reducing in density in depth direction with a thickness of 2-3mum, the layer 3 of guard ring, and the layer 6 of preventing reflection of the light. A reverse voltage is applied to the junction 8 through the electrodes 4, 5 forming ohmic contact with the layers 1 and 2 respectively in operation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13085779A JPS5655080A (en) | 1979-10-12 | 1979-10-12 | Germanium avalanche photodiode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13085779A JPS5655080A (en) | 1979-10-12 | 1979-10-12 | Germanium avalanche photodiode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5655080A true JPS5655080A (en) | 1981-05-15 |
Family
ID=15044311
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13085779A Pending JPS5655080A (en) | 1979-10-12 | 1979-10-12 | Germanium avalanche photodiode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5655080A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0076143A2 (en) * | 1981-09-30 | 1983-04-06 | Fujitsu Limited | Avalanche photodiode |
-
1979
- 1979-10-12 JP JP13085779A patent/JPS5655080A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0076143A2 (en) * | 1981-09-30 | 1983-04-06 | Fujitsu Limited | Avalanche photodiode |
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