JPS5655043A - Device for irradiating light - Google Patents
Device for irradiating lightInfo
- Publication number
- JPS5655043A JPS5655043A JP13075979A JP13075979A JPS5655043A JP S5655043 A JPS5655043 A JP S5655043A JP 13075979 A JP13075979 A JP 13075979A JP 13075979 A JP13075979 A JP 13075979A JP S5655043 A JPS5655043 A JP S5655043A
- Authority
- JP
- Japan
- Prior art keywords
- light
- center
- irradiated
- irradiating
- periphery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microscoopes, Condenser (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To uniformly expose by a device for irradiating a light when fabricating an IC by composing the device of an optical mechanism including an integrator for irradiating a light and a light source, an illumination correcting filter along the optical axis. CONSTITUTION:A light from a light source 1 is condensed by a condensing mirror 2, and the condensed light is irradiated by an integrator 3. An illumination correcting filter 5 is inserted to the optical path, and is freely moved along an optical axis L by a supporting mechanism. The filter is of a shape such as a circular shape at the front, of a shpae like a center low transmission type where the light transmissiblility becomes higher from the center toward the periphery or a center hight transmission type where the light transmissibility becomes lower from the center towad the periphery. Thus, the illumination of the surface to be irradiated can be equalized by suppressing the light transmission at the center by the filter when irradiating the light in such a manner that the light irradiation at the periphery of the area to be irradiated on the surface 4 to be irradiated becomes low. Then, the light utility ration is improved, and the device can be consequently utilized as an exposure light source for photoetching an IC.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13075979A JPS5655043A (en) | 1979-10-12 | 1979-10-12 | Device for irradiating light |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13075979A JPS5655043A (en) | 1979-10-12 | 1979-10-12 | Device for irradiating light |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5655043A true JPS5655043A (en) | 1981-05-15 |
Family
ID=15041965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13075979A Pending JPS5655043A (en) | 1979-10-12 | 1979-10-12 | Device for irradiating light |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5655043A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6169132A (en) * | 1984-09-13 | 1986-04-09 | Nippon Kogaku Kk <Nikon> | Exposing device |
JPH0249417A (en) * | 1988-08-11 | 1990-02-19 | Fuji Electric Co Ltd | Formation of photoresist pattern |
JPH07183188A (en) * | 1993-12-22 | 1995-07-21 | Nikon Corp | Scanning type aligner |
-
1979
- 1979-10-12 JP JP13075979A patent/JPS5655043A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6169132A (en) * | 1984-09-13 | 1986-04-09 | Nippon Kogaku Kk <Nikon> | Exposing device |
JPH0249417A (en) * | 1988-08-11 | 1990-02-19 | Fuji Electric Co Ltd | Formation of photoresist pattern |
JPH07183188A (en) * | 1993-12-22 | 1995-07-21 | Nikon Corp | Scanning type aligner |
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