JPS5650525A - Semiconductor wafer - Google Patents

Semiconductor wafer

Info

Publication number
JPS5650525A
JPS5650525A JP12666679A JP12666679A JPS5650525A JP S5650525 A JPS5650525 A JP S5650525A JP 12666679 A JP12666679 A JP 12666679A JP 12666679 A JP12666679 A JP 12666679A JP S5650525 A JPS5650525 A JP S5650525A
Authority
JP
Japan
Prior art keywords
region
target
automatic
laser beam
stabilized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12666679A
Other languages
English (en)
Other versions
JPS6317226B2 (ja
Inventor
Sadao Matai
Teruo Iino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12666679A priority Critical patent/JPS5650525A/ja
Publication of JPS5650525A publication Critical patent/JPS5650525A/ja
Publication of JPS6317226B2 publication Critical patent/JPS6317226B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12666679A 1979-10-01 1979-10-01 Semiconductor wafer Granted JPS5650525A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12666679A JPS5650525A (en) 1979-10-01 1979-10-01 Semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12666679A JPS5650525A (en) 1979-10-01 1979-10-01 Semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS5650525A true JPS5650525A (en) 1981-05-07
JPS6317226B2 JPS6317226B2 (ja) 1988-04-13

Family

ID=14940858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12666679A Granted JPS5650525A (en) 1979-10-01 1979-10-01 Semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5650525A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61187343A (ja) * 1985-02-15 1986-08-21 Nec Corp 半導体基板

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474378A (en) * 1977-11-25 1979-06-14 Cho Lsi Gijutsu Kenkyu Kumiai Method of automatically centering mask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474378A (en) * 1977-11-25 1979-06-14 Cho Lsi Gijutsu Kenkyu Kumiai Method of automatically centering mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61187343A (ja) * 1985-02-15 1986-08-21 Nec Corp 半導体基板

Also Published As

Publication number Publication date
JPS6317226B2 (ja) 1988-04-13

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