JPS5642341A - Sample setting device in electron beam drawing equipment - Google Patents
Sample setting device in electron beam drawing equipmentInfo
- Publication number
- JPS5642341A JPS5642341A JP11797379A JP11797379A JPS5642341A JP S5642341 A JPS5642341 A JP S5642341A JP 11797379 A JP11797379 A JP 11797379A JP 11797379 A JP11797379 A JP 11797379A JP S5642341 A JPS5642341 A JP S5642341A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- electron beam
- sample
- tip
- reticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11797379A JPS5642341A (en) | 1979-09-17 | 1979-09-17 | Sample setting device in electron beam drawing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11797379A JPS5642341A (en) | 1979-09-17 | 1979-09-17 | Sample setting device in electron beam drawing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5642341A true JPS5642341A (en) | 1981-04-20 |
JPS5722415B2 JPS5722415B2 (ja) | 1982-05-13 |
Family
ID=14724852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11797379A Granted JPS5642341A (en) | 1979-09-17 | 1979-09-17 | Sample setting device in electron beam drawing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5642341A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58122746A (ja) * | 1982-01-05 | 1983-07-21 | エテック・システムズ・インコーポレイテッド | 静電カセツトアセンブリ装置 |
JPS60213023A (ja) * | 1984-04-09 | 1985-10-25 | Fujitsu Ltd | 半導体基板の露光方法 |
US4705949A (en) * | 1985-11-25 | 1987-11-10 | The United States Of America As Represented By The Secretary Of Commerce | Method and apparatus relating to specimen cells for scanning electron microscopes |
KR100825573B1 (ko) | 2006-08-18 | 2008-04-25 | 주식회사 포스코 | 하이드로포밍용 프리포밍 튜브 보관장치 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62163413U (ja) * | 1986-04-08 | 1987-10-17 | ||
JPS62189222U (ja) * | 1986-05-24 | 1987-12-02 |
-
1979
- 1979-09-17 JP JP11797379A patent/JPS5642341A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58122746A (ja) * | 1982-01-05 | 1983-07-21 | エテック・システムズ・インコーポレイテッド | 静電カセツトアセンブリ装置 |
JPS60213023A (ja) * | 1984-04-09 | 1985-10-25 | Fujitsu Ltd | 半導体基板の露光方法 |
US4705949A (en) * | 1985-11-25 | 1987-11-10 | The United States Of America As Represented By The Secretary Of Commerce | Method and apparatus relating to specimen cells for scanning electron microscopes |
KR100825573B1 (ko) | 2006-08-18 | 2008-04-25 | 주식회사 포스코 | 하이드로포밍용 프리포밍 튜브 보관장치 |
Also Published As
Publication number | Publication date |
---|---|
JPS5722415B2 (ja) | 1982-05-13 |
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