JPS5642229A - New photooresist composition - Google Patents

New photooresist composition

Info

Publication number
JPS5642229A
JPS5642229A JP8527780A JP8527780A JPS5642229A JP S5642229 A JPS5642229 A JP S5642229A JP 8527780 A JP8527780 A JP 8527780A JP 8527780 A JP8527780 A JP 8527780A JP S5642229 A JPS5642229 A JP S5642229A
Authority
JP
Japan
Prior art keywords
photooresist
composition
new
photooresist composition
new photooresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8527780A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0348500B2 (enrdf_load_stackoverflow
Inventor
Furanku Giyaritou Ansonii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University Patents Inc
Original Assignee
University Patents Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University Patents Inc filed Critical University Patents Inc
Publication of JPS5642229A publication Critical patent/JPS5642229A/ja
Publication of JPH0348500B2 publication Critical patent/JPH0348500B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP8527780A 1979-06-25 1980-06-25 New photooresist composition Granted JPS5642229A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5200779A 1979-06-25 1979-06-25

Publications (2)

Publication Number Publication Date
JPS5642229A true JPS5642229A (en) 1981-04-20
JPH0348500B2 JPH0348500B2 (enrdf_load_stackoverflow) 1991-07-24

Family

ID=21974808

Family Applications (2)

Application Number Title Priority Date Filing Date
JP8527880A Pending JPS5643220A (en) 1979-06-25 1980-06-25 Method of using novel nonlinear optical substance and diacetylenes
JP8527780A Granted JPS5642229A (en) 1979-06-25 1980-06-25 New photooresist composition

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP8527880A Pending JPS5643220A (en) 1979-06-25 1980-06-25 Method of using novel nonlinear optical substance and diacetylenes

Country Status (1)

Country Link
JP (2) JPS5643220A (enrdf_load_stackoverflow)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5962608A (ja) * 1982-10-02 1984-04-10 Agency Of Ind Science & Technol 薄膜状ポリジアセチレンの製造方法
JPS60239712A (ja) * 1984-05-15 1985-11-28 Canon Inc 表示媒体
JPS6194042A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd 分子構築体およびその製造方法
JPS6194041A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61180437A (ja) * 1985-02-05 1986-08-13 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61203448A (ja) * 1985-03-05 1986-09-09 Mitsubishi Petrochem Co Ltd 光記録媒体
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS62229240A (ja) * 1986-03-31 1987-10-08 Canon Inc 重合性薄膜
JPS62262867A (ja) * 1986-05-09 1987-11-14 Matsushita Electric Ind Co Ltd 単分子累積膜パタ−ン形成方法
JPS62293242A (ja) * 1986-06-12 1987-12-19 Matsushita Electric Ind Co Ltd パターン形成方法およびパターン形成材料
JPS6381424A (ja) * 1986-09-26 1988-04-12 Sumitomo Chem Co Ltd レジスト材料
JPS6396655A (ja) * 1986-10-14 1988-04-27 Matsushita Electric Ind Co Ltd パタ−ン形成方法
US4804613A (en) * 1983-10-14 1989-02-14 Canon Kabushiki Kaisha Optical recording medium and optical recording process using such medium
JPH03103075A (ja) * 1989-09-14 1991-04-30 Hitachi Ltd 電源装置及び加速器
WO1993004406A1 (en) * 1991-08-13 1993-03-04 Toray Industries, Inc. Double-layer resist and method of and device for making said resist
JP2006063045A (ja) * 2004-08-30 2006-03-09 National Institute Of Advanced Industrial & Technology ジアセチレンジアミド化合物
JP2011510920A (ja) * 2008-01-25 2011-04-07 データレース リミテッド 多色材料およびその用途

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61148432A (ja) * 1984-12-21 1986-07-07 Agency Of Ind Science & Technol 光処理方法
JPS622175A (ja) * 1985-06-28 1987-01-08 Nippon Telegr & Teleph Corp <Ntt> ケ−ブル試験器
JPH0670697B2 (ja) * 1989-09-11 1994-09-07 理化学研究所 有機非線形光学材料
EP1431266B1 (en) 2001-08-27 2006-07-19 Japan Science and Technology Agency Photoresponsive polymer, built-up type diacetylene polymer, crystals of ammonium carboxylates, and processes for production of them
JP7238698B2 (ja) * 2019-08-28 2023-03-14 セイコーエプソン株式会社 量子干渉装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1525738A (fr) * 1966-06-06 1968-05-17 Battelle Development Corp élément photosensible et procédé de formation d'image au moyen de cet élément
DE1940690A1 (de) * 1969-08-09 1971-02-25 Basf Ag Verfahren zur Herstellung von bildmaessigen Aufzeichnungen
US4125534A (en) * 1977-02-25 1978-11-14 Allied Chemical Corporation Carbazolyl diacetylenic compounds

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1525738A (fr) * 1966-06-06 1968-05-17 Battelle Development Corp élément photosensible et procédé de formation d'image au moyen de cet élément
DE1940690A1 (de) * 1969-08-09 1971-02-25 Basf Ag Verfahren zur Herstellung von bildmaessigen Aufzeichnungen
US4125534A (en) * 1977-02-25 1978-11-14 Allied Chemical Corporation Carbazolyl diacetylenic compounds

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5962608A (ja) * 1982-10-02 1984-04-10 Agency Of Ind Science & Technol 薄膜状ポリジアセチレンの製造方法
US4804613A (en) * 1983-10-14 1989-02-14 Canon Kabushiki Kaisha Optical recording medium and optical recording process using such medium
JPS60239712A (ja) * 1984-05-15 1985-11-28 Canon Inc 表示媒体
JPS6194042A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd 分子構築体およびその製造方法
JPS6194041A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61180437A (ja) * 1985-02-05 1986-08-13 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61203448A (ja) * 1985-03-05 1986-09-09 Mitsubishi Petrochem Co Ltd 光記録媒体
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS62229240A (ja) * 1986-03-31 1987-10-08 Canon Inc 重合性薄膜
JPS62262867A (ja) * 1986-05-09 1987-11-14 Matsushita Electric Ind Co Ltd 単分子累積膜パタ−ン形成方法
JPS62293242A (ja) * 1986-06-12 1987-12-19 Matsushita Electric Ind Co Ltd パターン形成方法およびパターン形成材料
JPS6381424A (ja) * 1986-09-26 1988-04-12 Sumitomo Chem Co Ltd レジスト材料
JPS6396655A (ja) * 1986-10-14 1988-04-27 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPH03103075A (ja) * 1989-09-14 1991-04-30 Hitachi Ltd 電源装置及び加速器
WO1993004406A1 (en) * 1991-08-13 1993-03-04 Toray Industries, Inc. Double-layer resist and method of and device for making said resist
JP2006063045A (ja) * 2004-08-30 2006-03-09 National Institute Of Advanced Industrial & Technology ジアセチレンジアミド化合物
JP2011510920A (ja) * 2008-01-25 2011-04-07 データレース リミテッド 多色材料およびその用途

Also Published As

Publication number Publication date
JPS5643220A (en) 1981-04-21
JPH0348500B2 (enrdf_load_stackoverflow) 1991-07-24

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