JPS5633621A - Directional high cut space frequency filter - Google Patents

Directional high cut space frequency filter

Info

Publication number
JPS5633621A
JPS5633621A JP10864779A JP10864779A JPS5633621A JP S5633621 A JPS5633621 A JP S5633621A JP 10864779 A JP10864779 A JP 10864779A JP 10864779 A JP10864779 A JP 10864779A JP S5633621 A JPS5633621 A JP S5633621A
Authority
JP
Japan
Prior art keywords
filter
diffracted light
defect
fourier transform
order diffracted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10864779A
Other languages
Japanese (ja)
Other versions
JPS6027964B2 (en
Inventor
Yasuyoshi Mihashi
Shunsuke Mukasa
Junichi Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Dai Nippon Printing Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP10864779A priority Critical patent/JPS6027964B2/en
Priority to DE19803031816 priority patent/DE3031816A1/en
Priority to GB8027602A priority patent/GB2058395B/en
Priority to FR8018592A priority patent/FR2464495B1/en
Publication of JPS5633621A publication Critical patent/JPS5633621A/en
Publication of JPS6027964B2 publication Critical patent/JPS6027964B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46—Systems using spatial filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Processing (AREA)
  • Optical Head (AREA)

Abstract

PURPOSE: To obtain high S/N, high defect output, good quality images and stable mechanical accuracy, in defect inspection of industrial products, by using a directional high cut space filter.
CONSTITUTION: A laser beam 2 is irradiated to the object 5 to be examined via a collimator 5, and the diffracted light 6 goes through a Fourier transform lens 7 and a space filter 8 to have the spectra corresponding to defect patterns transmitted therethrough and is then supplied via a reverse Fourier transform lens 10 to a photodetector 11, by which the detection of the defect parts is accomplished. Here, a directional high cut filter 20 is added to the filter 8. The filter 20 masks the θ direction where higher-order diffracted light regions are not recorded down to the lower-order diffracted light regions where spectra are recorded, opens to a high pass tendency and is formed into a shape corresponding to the directional component ratios of optical Fourier transform spectrum intensity distributions of roughly two- dimensional grating fringes. Thereby, the higher-order diffracted light centering at the θ direction is mostly cut.
COPYRIGHT: (C)1981,JPO&Japio
JP10864779A 1979-08-28 1979-08-28 Directional high-cut spatial frequency filter Expired JPS6027964B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10864779A JPS6027964B2 (en) 1979-08-28 1979-08-28 Directional high-cut spatial frequency filter
DE19803031816 DE3031816A1 (en) 1979-08-28 1980-08-22 SPATIAL FREQUENCY FILTER
GB8027602A GB2058395B (en) 1979-08-28 1980-08-26 Directional high-cut spatial frequency filter
FR8018592A FR2464495B1 (en) 1979-08-28 1980-08-27 HIGH-CUT DIRECTIONAL SPATIAL FILTER FOR DEFECT INSPECTION APPARATUS

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10864779A JPS6027964B2 (en) 1979-08-28 1979-08-28 Directional high-cut spatial frequency filter

Publications (2)

Publication Number Publication Date
JPS5633621A true JPS5633621A (en) 1981-04-04
JPS6027964B2 JPS6027964B2 (en) 1985-07-02

Family

ID=14490098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10864779A Expired JPS6027964B2 (en) 1979-08-28 1979-08-28 Directional high-cut spatial frequency filter

Country Status (4)

Country Link
JP (1) JPS6027964B2 (en)
DE (1) DE3031816A1 (en)
FR (1) FR2464495B1 (en)
GB (1) GB2058395B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158921A (en) * 1982-03-16 1983-09-21 Dainippon Printing Co Ltd Defect inspection apparatus of regular pattern
JPS608823A (en) * 1983-06-29 1985-01-17 Hamamatsu Photonics Kk Spatial optical modulator
JPH04103393U (en) * 1991-01-25 1992-09-07 富士通テン株式会社 Floating lock mechanism of disc playback device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0827443B2 (en) * 1986-10-16 1996-03-21 オリンパス光学工業株式会社 Shuriren optical device
JPH0682102B2 (en) * 1987-02-27 1994-10-19 三菱電機株式会社 Pattern defect inspection device and pattern defect inspection method
FR2641928B1 (en) * 1989-01-17 1996-09-13 Thomson Csf IMAGE PROJECTION DEVICE

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614232A (en) * 1968-11-25 1971-10-19 Ibm Pattern defect sensing using error free blocking spacial filter
US4000949A (en) * 1969-09-15 1977-01-04 Western Electric Company, Inc. Photomask inspection by optical spatial filtering
US3790280A (en) * 1972-05-03 1974-02-05 Western Electric Co Spatial filtering system utilizing compensating elements
JPS5324301B2 (en) * 1974-09-09 1978-07-20
JPS5276088A (en) * 1975-12-22 1977-06-25 Toshiba Corp System for inspecting defects of pattern having directivity

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158921A (en) * 1982-03-16 1983-09-21 Dainippon Printing Co Ltd Defect inspection apparatus of regular pattern
JPS608823A (en) * 1983-06-29 1985-01-17 Hamamatsu Photonics Kk Spatial optical modulator
JPH04103393U (en) * 1991-01-25 1992-09-07 富士通テン株式会社 Floating lock mechanism of disc playback device

Also Published As

Publication number Publication date
JPS6027964B2 (en) 1985-07-02
GB2058395A (en) 1981-04-08
FR2464495A1 (en) 1981-03-06
FR2464495B1 (en) 1986-05-16
DE3031816A1 (en) 1981-03-19
GB2058395B (en) 1983-04-27
DE3031816C2 (en) 1990-06-28

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