JPS6482623A - Device for alignment - Google Patents

Device for alignment

Info

Publication number
JPS6482623A
JPS6482623A JP62241232A JP24123287A JPS6482623A JP S6482623 A JPS6482623 A JP S6482623A JP 62241232 A JP62241232 A JP 62241232A JP 24123287 A JP24123287 A JP 24123287A JP S6482623 A JPS6482623 A JP S6482623A
Authority
JP
Japan
Prior art keywords
grating
diffracted light
diffracted
optical system
light intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62241232A
Other languages
Japanese (ja)
Inventor
Shinichiro Aoki
Takeo Sato
Katsumasa Yamaguchi
Tadashi Kaneko
Noboru Nomura
Keisuke Koga
Kazuhiro Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62241232A priority Critical patent/JPS6482623A/en
Priority to US07/248,051 priority patent/US4870289A/en
Priority to EP88308878A priority patent/EP0309281B1/en
Priority to DE3853246T priority patent/DE3853246T2/en
Publication of JPS6482623A publication Critical patent/JPS6482623A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Transform (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To simplify the optical system by selectively transmitting a diffracted light from a reference grating, irradiating said diffracted light from a predefined specific direction to the reference grating to be aligned, and using a light intensity attenuation means, thereby enabling a high precision alignment. CONSTITUTION:After passing through an optical system for lighting, any one of the 0, + or - primary diffracted lights 3, 1, 2 from a reference grating 12 is cut, and other one diffracted light changes the diffracted light intensity by a light intensity attenuation means 50 is irradiated onto a second grating 15 and a third grating 17 at an angle defined by the NA of the optical system for lighting (Numerical Aperture NA=nAinOi, where n is the refractive index of a medium), forming an interference fringe in the neighborhood thereof. The diffracted lights from the reference grating are separated again at the second and third gratings into 0, + or - primary, + or - secondary... diffracted light beams. Of these, by synthesizing the diffracted light of a specified degree, the amount of the relative positional shift of the third grating 17 to the second grating 15 can be detected as the phase difference of optical beat signals. By moving a mask and a wafer mounting stages 19, 20 based on the phase difference detected from optical beat signals, alignment is performed.
JP62241232A 1987-09-25 1987-09-25 Device for alignment Pending JPS6482623A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62241232A JPS6482623A (en) 1987-09-25 1987-09-25 Device for alignment
US07/248,051 US4870289A (en) 1987-09-25 1988-09-23 Apparatus for controlling relation in position between a photomask and a wafer
EP88308878A EP0309281B1 (en) 1987-09-25 1988-09-23 Apparatus for controlling relation in position between a photomask and a wafer
DE3853246T DE3853246T2 (en) 1987-09-25 1988-09-23 Device for checking the positional relationship between a photomask and a plate.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62241232A JPS6482623A (en) 1987-09-25 1987-09-25 Device for alignment

Publications (1)

Publication Number Publication Date
JPS6482623A true JPS6482623A (en) 1989-03-28

Family

ID=17071166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62241232A Pending JPS6482623A (en) 1987-09-25 1987-09-25 Device for alignment

Country Status (1)

Country Link
JP (1) JPS6482623A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102419520A (en) * 2010-09-27 2012-04-18 上海微电子装备有限公司 Alignment signal simulating generator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102419520A (en) * 2010-09-27 2012-04-18 上海微电子装备有限公司 Alignment signal simulating generator

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