JPS6489323A - Alignment device - Google Patents

Alignment device

Info

Publication number
JPS6489323A
JPS6489323A JP62245210A JP24521087A JPS6489323A JP S6489323 A JPS6489323 A JP S6489323A JP 62245210 A JP62245210 A JP 62245210A JP 24521087 A JP24521087 A JP 24521087A JP S6489323 A JPS6489323 A JP S6489323A
Authority
JP
Japan
Prior art keywords
gratings
lights
grating
lens
diffracted light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62245210A
Other languages
Japanese (ja)
Inventor
Kazuhiro Yamashita
Noboru Nomura
Keisuke Koga
Shinichiro Aoki
Takeo Sato
Katsumasa Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62245210A priority Critical patent/JPS6489323A/en
Publication of JPS6489323A publication Critical patent/JPS6489323A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To isolate an unnecessary diffracted light, to improve S/N ratio of a detection signal and to accurately align a reference grating by selectively passing a diffracted light from the lattice by an illumination optical system, and irradiating it from a specific direction specified by the numerical aperture of the optical system to the reference lattice to be aligned. CONSTITUTION:Laser lights of two wavelengths perpendicularly crossing each other are incident from a Zeeman laser 11 to a reference grating 12, and +1,-2 and 0-th diffracted lights from reference diffraction gratings are irradiated to a both-side telecentric lens 14. The lights are radiated through the lens 14, a diffraction grating 15 on a mask and a photomask 16 to a wafer 18. A specific diffracted light from the grating 12 is selected by the lens 14, and interference fringes are generated on second and third gratings 15 on the mask 16 and wafer 18. The lights from the second and third gratings are combined, and relative positions between the fringes and the second, third gratings are detected by photodetectors 35, 36 as light beat signals.
JP62245210A 1987-09-29 1987-09-29 Alignment device Pending JPS6489323A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62245210A JPS6489323A (en) 1987-09-29 1987-09-29 Alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62245210A JPS6489323A (en) 1987-09-29 1987-09-29 Alignment device

Publications (1)

Publication Number Publication Date
JPS6489323A true JPS6489323A (en) 1989-04-03

Family

ID=17130266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62245210A Pending JPS6489323A (en) 1987-09-29 1987-09-29 Alignment device

Country Status (1)

Country Link
JP (1) JPS6489323A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02297005A (en) * 1989-05-12 1990-12-07 Matsushita Electric Ind Co Ltd Aligning device
US5182610A (en) * 1990-04-19 1993-01-26 Sortec Corporation Position detecting method and device therefor as well as aligning device
US5440394A (en) * 1991-05-01 1995-08-08 Canon Kabushiki Kaisha Length-measuring device and exposure apparatus
JPH07123108B2 (en) * 1990-10-31 1995-12-25 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Proximity alignment system using polarized light and double conjugate projection lens

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02297005A (en) * 1989-05-12 1990-12-07 Matsushita Electric Ind Co Ltd Aligning device
US5182610A (en) * 1990-04-19 1993-01-26 Sortec Corporation Position detecting method and device therefor as well as aligning device
JPH07123108B2 (en) * 1990-10-31 1995-12-25 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Proximity alignment system using polarized light and double conjugate projection lens
US5440394A (en) * 1991-05-01 1995-08-08 Canon Kabushiki Kaisha Length-measuring device and exposure apparatus

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