GB2058395B - Directional high-cut spatial frequency filter - Google Patents

Directional high-cut spatial frequency filter

Info

Publication number
GB2058395B
GB2058395B GB8027602A GB8027602A GB2058395B GB 2058395 B GB2058395 B GB 2058395B GB 8027602 A GB8027602 A GB 8027602A GB 8027602 A GB8027602 A GB 8027602A GB 2058395 B GB2058395 B GB 2058395B
Authority
GB
United Kingdom
Prior art keywords
spatial frequency
frequency filter
directional high
cut spatial
cut
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8027602A
Other versions
GB2058395A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Dai Nippon Printing Co Ltd filed Critical Agency of Industrial Science and Technology
Publication of GB2058395A publication Critical patent/GB2058395A/en
Application granted granted Critical
Publication of GB2058395B publication Critical patent/GB2058395B/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605Workpiece metrology
    • G03F7/70616Monitoring the printed patterns
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46Systems using spatial filters
GB8027602A 1979-08-28 1980-08-26 Directional high-cut spatial frequency filter Expired GB2058395B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10864779A JPS6027964B2 (en) 1979-08-28 1979-08-28 Directional high-cut spatial frequency filter

Publications (2)

Publication Number Publication Date
GB2058395A GB2058395A (en) 1981-04-08
GB2058395B true GB2058395B (en) 1983-04-27

Family

ID=14490098

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8027602A Expired GB2058395B (en) 1979-08-28 1980-08-26 Directional high-cut spatial frequency filter

Country Status (4)

Country Link
JP (1) JPS6027964B2 (en)
DE (1) DE3031816A1 (en)
FR (1) FR2464495B1 (en)
GB (1) GB2058395B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158921A (en) * 1982-03-16 1983-09-21 Dainippon Printing Co Ltd Defect inspection apparatus of regular pattern
JPS608823A (en) * 1983-06-29 1985-01-17 Hamamatsu Photonics Kk Spatial optical modulator
JPH0827443B2 (en) * 1986-10-16 1996-03-21 オリンパス光学工業株式会社 Shuriren optical device
JPH0682102B2 (en) * 1987-02-27 1994-10-19 三菱電機株式会社 Pattern defect inspection device and pattern defect inspection method
FR2641928B1 (en) * 1989-01-17 1996-09-13 Thomson Csf IMAGE PROJECTION DEVICE
JPH0755741Y2 (en) * 1991-01-25 1995-12-20 富士通テン株式会社 Floating lock mechanism for disc player

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614232A (en) * 1968-11-25 1971-10-19 Ibm Pattern defect sensing using error free blocking spacial filter
US4000949A (en) * 1969-09-15 1977-01-04 Western Electric Company, Inc. Photomask inspection by optical spatial filtering
US3790280A (en) * 1972-05-03 1974-02-05 Western Electric Co Spatial filtering system utilizing compensating elements
JPS5324301B2 (en) * 1974-09-09 1978-07-20
JPS5276088A (en) * 1975-12-22 1977-06-25 Toshiba Corp System for inspecting defects of pattern having directivity

Also Published As

Publication number Publication date
GB2058395A (en) 1981-04-08
FR2464495B1 (en) 1986-05-16
DE3031816C2 (en) 1990-06-28
JPS5633621A (en) 1981-04-04
DE3031816A1 (en) 1981-03-19
JPS6027964B2 (en) 1985-07-02
FR2464495A1 (en) 1981-03-06

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20000825