JPS5625220A - Manufacture of thih-film magnetic head - Google Patents

Manufacture of thih-film magnetic head

Info

Publication number
JPS5625220A
JPS5625220A JP10045579A JP10045579A JPS5625220A JP S5625220 A JPS5625220 A JP S5625220A JP 10045579 A JP10045579 A JP 10045579A JP 10045579 A JP10045579 A JP 10045579A JP S5625220 A JPS5625220 A JP S5625220A
Authority
JP
Japan
Prior art keywords
film
fusion
low
glass
point glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10045579A
Other languages
Japanese (ja)
Inventor
Seiji Yoneoka
Toshio Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10045579A priority Critical patent/JPS5625220A/en
Publication of JPS5625220A publication Critical patent/JPS5625220A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To prevent an SiO2 film from peeling off by eliminating the generation of bubbles of low-fusion-point glass in baking by providing a chromium-reaction- preventive film between the low-fusion-point glass, used for cover-glass bonding, and an insulating layer SiO2 film. CONSTITUTION:On substrate 1, lower magnetic film 2, insulating layer SiO25', conductor layer 3, insulating layer SiO25'', upper magnetic layer 4, and protective layer SiO25 are formed successively by sputtering, vapor-deposition, etc. On protective film SiO2, chromium-reaction-preventive film 9 is formed by sputtering, vapor-deposition, etc., and on it, cover glass 7 is bonded by low-fusion-point glass 6'. Next, this body is cut into a wafer, which is stuck to a slider by low-fusion- point glass and lapped to form a gap. In this method, providing the chromium film eliminates the generation of bubbles in low-fusion-point glass 6' due to reaction, and cover glass 7 can be bonded with high reliability.
JP10045579A 1979-08-07 1979-08-07 Manufacture of thih-film magnetic head Pending JPS5625220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10045579A JPS5625220A (en) 1979-08-07 1979-08-07 Manufacture of thih-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10045579A JPS5625220A (en) 1979-08-07 1979-08-07 Manufacture of thih-film magnetic head

Publications (1)

Publication Number Publication Date
JPS5625220A true JPS5625220A (en) 1981-03-11

Family

ID=14274380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10045579A Pending JPS5625220A (en) 1979-08-07 1979-08-07 Manufacture of thih-film magnetic head

Country Status (1)

Country Link
JP (1) JPS5625220A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817614U (en) * 1981-07-24 1983-02-03 ソニー株式会社 thin film magnetic head
JPS62162206A (en) * 1986-01-10 1987-07-18 Hitachi Ltd Magnetic head
US5158801A (en) * 1988-04-01 1992-10-27 The United States Of America As Represented By The United States Administrator Of The National Aeronautics And Space Administration Method of forming a multiple layer dielectric and a hot film sensor therewith

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817614U (en) * 1981-07-24 1983-02-03 ソニー株式会社 thin film magnetic head
JPS62162206A (en) * 1986-01-10 1987-07-18 Hitachi Ltd Magnetic head
US5158801A (en) * 1988-04-01 1992-10-27 The United States Of America As Represented By The United States Administrator Of The National Aeronautics And Space Administration Method of forming a multiple layer dielectric and a hot film sensor therewith

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