JPS5624354A - Electrophotographic receptor - Google Patents

Abstract

PURPOSE: To enhance heat stability and mechanical strength, by laminating an inorganic photosensitive layer made of amorphous silicon containing H and at least one element among B, O, C, and halogen, and having a specified property, and a charge blocking layer or a charge transfer layer.

CONSTITUTION: Charge blocking layer 204 of a silica film is formed on a conductive substrate consisting of conductive layer 203 and substrate 202, or substrate 202 alone, when substrate 202 is conductive. Silicon is sputtered at high frequency with a gas mixture containing an inert gas and H₂ and one or more among B, O, C, and 4 kinds of halogens to form a photosensitive layer of amorphous silicon layer 205 having localization level state density ≤10¹⁸cm^-3 in the energy gap, and dark resistivity ≥10¹²Ωcm. Another charge blocking layer may be formed on layer 205, and a charge transfer layer may be formed on layer 205. Thus, photoreceptor 200 superior in light decay performance of surface potential to be formed without using a problematic material in terms of environmental pollution, such as selenium.

COPYRIGHT: (C)1981,JPO&Japio