JPS56169770A - Ionic plating device - Google Patents

Ionic plating device

Info

Publication number
JPS56169770A
JPS56169770A JP7141680A JP7141680A JPS56169770A JP S56169770 A JPS56169770 A JP S56169770A JP 7141680 A JP7141680 A JP 7141680A JP 7141680 A JP7141680 A JP 7141680A JP S56169770 A JPS56169770 A JP S56169770A
Authority
JP
Japan
Prior art keywords
substrates
substrate holder
vapor source
ionic
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7141680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS639013B2 (enrdf_load_stackoverflow
Inventor
Toyomitsu Takatsuka
Koichi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP7141680A priority Critical patent/JPS56169770A/ja
Publication of JPS56169770A publication Critical patent/JPS56169770A/ja
Publication of JPS639013B2 publication Critical patent/JPS639013B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP7141680A 1980-05-30 1980-05-30 Ionic plating device Granted JPS56169770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7141680A JPS56169770A (en) 1980-05-30 1980-05-30 Ionic plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7141680A JPS56169770A (en) 1980-05-30 1980-05-30 Ionic plating device

Publications (2)

Publication Number Publication Date
JPS56169770A true JPS56169770A (en) 1981-12-26
JPS639013B2 JPS639013B2 (enrdf_load_stackoverflow) 1988-02-25

Family

ID=13459884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7141680A Granted JPS56169770A (en) 1980-05-30 1980-05-30 Ionic plating device

Country Status (1)

Country Link
JP (1) JPS56169770A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6167766A (ja) * 1984-09-11 1986-04-07 Canon Inc イオンプレ−テイング装置
KR100449570B1 (ko) * 2001-12-28 2004-09-22 (주)인텍 진공도금장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06280026A (ja) * 1993-03-24 1994-10-04 Semiconductor Energy Lab Co Ltd 成膜装置及び成膜方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49120877A (enrdf_load_stackoverflow) * 1973-03-20 1974-11-19
JPS5278776A (en) * 1975-12-26 1977-07-02 Youichi Murayama Apparatus for high frequency ionic plating
JPS5345097U (enrdf_load_stackoverflow) * 1976-09-21 1978-04-17

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49120877A (enrdf_load_stackoverflow) * 1973-03-20 1974-11-19
JPS5278776A (en) * 1975-12-26 1977-07-02 Youichi Murayama Apparatus for high frequency ionic plating
JPS5345097U (enrdf_load_stackoverflow) * 1976-09-21 1978-04-17

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6167766A (ja) * 1984-09-11 1986-04-07 Canon Inc イオンプレ−テイング装置
KR100449570B1 (ko) * 2001-12-28 2004-09-22 (주)인텍 진공도금장치

Also Published As

Publication number Publication date
JPS639013B2 (enrdf_load_stackoverflow) 1988-02-25

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