JPS56165322A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56165322A
JPS56165322A JP6923580A JP6923580A JPS56165322A JP S56165322 A JPS56165322 A JP S56165322A JP 6923580 A JP6923580 A JP 6923580A JP 6923580 A JP6923580 A JP 6923580A JP S56165322 A JPS56165322 A JP S56165322A
Authority
JP
Japan
Prior art keywords
patterns
treated
film
constant
resin layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6923580A
Other languages
Japanese (ja)
Inventor
Shigeo Uotani
Hisao Yakushiji
Hideo Kotani
Masahiko Denda
Shinichi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6923580A priority Critical patent/JPS56165322A/en
Publication of JPS56165322A publication Critical patent/JPS56165322A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To shorten manufacturing time by a method wherein a plural number of different patterns of different depth are formed in a photosensitive resin layer placed on a film to be treated and then a constant-speed processing is performed in which the patterns are treated in the order from deep ones to less deep ones. CONSTITUTION:An Si oxide film 2 is sandwiched between a polysilicon film 3 to be treated and an Si semiconductor substrate 1. On the Si resin film 3 is a photosensitive resin layer 4 in which a plural number of patterns of various depth 5 and 6 are formed. In the course of a constant-speed processing that follows, polysilicon in the patterns 5 is removed for ion injection. The etching work continues and etches away polysilion in the pattern 6. This enables plural works of removal by selective etching and of impurity injection to be accomplished in a single pattern forming process, thereby reducing manufacturing time.
JP6923580A 1980-05-23 1980-05-23 Manufacture of semiconductor device Pending JPS56165322A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6923580A JPS56165322A (en) 1980-05-23 1980-05-23 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6923580A JPS56165322A (en) 1980-05-23 1980-05-23 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS56165322A true JPS56165322A (en) 1981-12-18

Family

ID=13396868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6923580A Pending JPS56165322A (en) 1980-05-23 1980-05-23 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56165322A (en)

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