JPS56161654A - Semiconductor ic device and manufacture thereof - Google Patents

Semiconductor ic device and manufacture thereof

Info

Publication number
JPS56161654A
JPS56161654A JP6555680A JP6555680A JPS56161654A JP S56161654 A JPS56161654 A JP S56161654A JP 6555680 A JP6555680 A JP 6555680A JP 6555680 A JP6555680 A JP 6555680A JP S56161654 A JPS56161654 A JP S56161654A
Authority
JP
Japan
Prior art keywords
layers
injected
masks
oxide
resist masks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6555680A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0115147B2 (enrdf_load_stackoverflow
Inventor
Hiroyuki Sakai
Tsutomu Fujita
Toyoki Takemoto
Haruyasu Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6555680A priority Critical patent/JPS56161654A/ja
Publication of JPS56161654A publication Critical patent/JPS56161654A/ja
Publication of JPH0115147B2 publication Critical patent/JPH0115147B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
  • Bipolar Integrated Circuits (AREA)
JP6555680A 1980-05-16 1980-05-16 Semiconductor ic device and manufacture thereof Granted JPS56161654A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6555680A JPS56161654A (en) 1980-05-16 1980-05-16 Semiconductor ic device and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6555680A JPS56161654A (en) 1980-05-16 1980-05-16 Semiconductor ic device and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS56161654A true JPS56161654A (en) 1981-12-12
JPH0115147B2 JPH0115147B2 (enrdf_load_stackoverflow) 1989-03-15

Family

ID=13290387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6555680A Granted JPS56161654A (en) 1980-05-16 1980-05-16 Semiconductor ic device and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS56161654A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58110074A (ja) * 1981-12-23 1983-06-30 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法
JPS6252966A (ja) * 1985-09-02 1987-03-07 Toshiba Corp 半導体装置の製造方法
US4887130A (en) * 1985-10-07 1989-12-12 Minolta Camera Kabushiki Kaisha Electrostatic latent image developing apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54154283A (en) * 1978-05-25 1979-12-05 Ibm Lateral transistor structure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54154283A (en) * 1978-05-25 1979-12-05 Ibm Lateral transistor structure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58110074A (ja) * 1981-12-23 1983-06-30 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法
JPS6252966A (ja) * 1985-09-02 1987-03-07 Toshiba Corp 半導体装置の製造方法
US4887130A (en) * 1985-10-07 1989-12-12 Minolta Camera Kabushiki Kaisha Electrostatic latent image developing apparatus
US5044313A (en) * 1985-10-07 1991-09-03 Minolta Camera Kabushiki Kaisha Electrostatic latent image developing apparatus

Also Published As

Publication number Publication date
JPH0115147B2 (enrdf_load_stackoverflow) 1989-03-15

Similar Documents

Publication Publication Date Title
JPS56134757A (en) Complementary type mos semiconductor device and its manufacture
JPS577959A (en) Semiconductor device
JPS5643749A (en) Semiconductor device and its manufacture
JPS56161654A (en) Semiconductor ic device and manufacture thereof
JPS5736842A (en) Semiconductor integrated circuit device
JPS5650535A (en) Manufacture of semiconductor device
JPS57109365A (en) Semiconductor ic device
JPS56130960A (en) Manufacture of semiconductor integrated circuit
JPS56153769A (en) Manufacture of semiconductor device
JPS5633841A (en) Manufacture of semiconductor device
JPS6489457A (en) Manufacture of semiconductor device
JPS6455853A (en) Semiconductor device and manufacture thereof
JPS56157043A (en) Manufacture of semiconductor device
JPS5683061A (en) Semiconductor device
JPS6457673A (en) Manufacture of thin film transistor
JPS57164560A (en) Manufacture of semiconductor integrated circuit device
JPS56111264A (en) Manufacture of semiconductor device
JPS55138253A (en) Semiconductor device
JPS5789239A (en) Semiconductor integrated circuit
JPS5599777A (en) Manufacture of semiconductor device
JPS55157264A (en) Manufacturing method for semiconductor device
JPS55140226A (en) Manufacture of semiconductor device
JPS57117269A (en) Semiconductor device and manufacture thereof
JPS644059A (en) Manufacture of semiconductor integrated circuit device
JPS57153462A (en) Manufacture of semiconductor integrated circuit device