JPS56160035A - Applying device of liquid - Google Patents

Applying device of liquid

Info

Publication number
JPS56160035A
JPS56160035A JP6360980A JP6360980A JPS56160035A JP S56160035 A JPS56160035 A JP S56160035A JP 6360980 A JP6360980 A JP 6360980A JP 6360980 A JP6360980 A JP 6360980A JP S56160035 A JPS56160035 A JP S56160035A
Authority
JP
Japan
Prior art keywords
circumference
air current
water
developer
applying device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6360980A
Other languages
English (en)
Inventor
Hiroshi Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6360980A priority Critical patent/JPS56160035A/ja
Publication of JPS56160035A publication Critical patent/JPS56160035A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Weting (AREA)
JP6360980A 1980-05-13 1980-05-13 Applying device of liquid Pending JPS56160035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6360980A JPS56160035A (en) 1980-05-13 1980-05-13 Applying device of liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6360980A JPS56160035A (en) 1980-05-13 1980-05-13 Applying device of liquid

Publications (1)

Publication Number Publication Date
JPS56160035A true JPS56160035A (en) 1981-12-09

Family

ID=13234199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6360980A Pending JPS56160035A (en) 1980-05-13 1980-05-13 Applying device of liquid

Country Status (1)

Country Link
JP (1) JPS56160035A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197068A (en) * 1981-05-28 1982-12-03 Oki Electric Ind Co Ltd Apparatus for coating resist
JPS60110118A (ja) * 1983-11-18 1985-06-15 Toshiba Corp レジスト塗布方法および装置
JPS60189937A (ja) * 1984-03-12 1985-09-27 Fujitsu Ltd レジスト塗布装置
JP2004274028A (ja) * 2003-02-20 2004-09-30 Tokyo Ohka Kogyo Co Ltd 現像装置および現像方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197068A (en) * 1981-05-28 1982-12-03 Oki Electric Ind Co Ltd Apparatus for coating resist
JPS60110118A (ja) * 1983-11-18 1985-06-15 Toshiba Corp レジスト塗布方法および装置
JPS60189937A (ja) * 1984-03-12 1985-09-27 Fujitsu Ltd レジスト塗布装置
JP2004274028A (ja) * 2003-02-20 2004-09-30 Tokyo Ohka Kogyo Co Ltd 現像装置および現像方法
US6893172B2 (en) 2003-02-20 2005-05-17 Tokyo Ohka Kogyo Co., Ltd. Developing apparatus and developing method

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