JPS549919A - Photoresist coating device - Google Patents
Photoresist coating deviceInfo
- Publication number
- JPS549919A JPS549919A JP7434277A JP7434277A JPS549919A JP S549919 A JPS549919 A JP S549919A JP 7434277 A JP7434277 A JP 7434277A JP 7434277 A JP7434277 A JP 7434277A JP S549919 A JPS549919 A JP S549919A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- coating device
- photoresist coating
- collector
- rotary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To install a photoresist collector for preventing rescattering of photoresist near the circumferences of the cover and the rotary stand of a rotary coating device, to exhaust the air through the collector out of the device, to effectively prevent reattaching of the photoresist and attaching of dust, and thereby to obtain a photoresist film of high quality.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7434277A JPS549919A (en) | 1977-06-24 | 1977-06-24 | Photoresist coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7434277A JPS549919A (en) | 1977-06-24 | 1977-06-24 | Photoresist coating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS549919A true JPS549919A (en) | 1979-01-25 |
Family
ID=13544344
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7434277A Pending JPS549919A (en) | 1977-06-24 | 1977-06-24 | Photoresist coating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS549919A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5461868A (en) * | 1977-10-13 | 1979-05-18 | Fsi Corp | Ic substrate and wafer cleaning and drying device |
JPS58103132A (en) * | 1981-12-16 | 1983-06-20 | Konishiroku Photo Ind Co Ltd | Spinner device |
JPS61236543A (en) * | 1985-04-12 | 1986-10-21 | Internatl Rectifier Corp Japan Ltd | Photoresist coating apparatus |
JPS6227779U (en) * | 1985-08-02 | 1987-02-19 | ||
JPH01254277A (en) * | 1988-03-31 | 1989-10-11 | Matsushita Electric Ind Co Ltd | Spinner rotation treatment apparatus |
US4888200A (en) * | 1988-04-21 | 1989-12-19 | W. R. Grace & Co.,-Conn. | Process and machine for electrostatic coating |
JPH029476A (en) * | 1988-06-27 | 1990-01-12 | Teru Kyushu Kk | Spin coating device |
JP2013140302A (en) * | 2012-01-06 | 2013-07-18 | Hoya Corp | Spectacle lens coating liquid coating device |
-
1977
- 1977-06-24 JP JP7434277A patent/JPS549919A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5461868A (en) * | 1977-10-13 | 1979-05-18 | Fsi Corp | Ic substrate and wafer cleaning and drying device |
JPS6038021B2 (en) * | 1977-10-13 | 1985-08-29 | エフエスアイ・コ−ポレ−シヨン | Cleaning/drying equipment for integrated circuit substrates and wafers |
JPS58103132A (en) * | 1981-12-16 | 1983-06-20 | Konishiroku Photo Ind Co Ltd | Spinner device |
JPS61236543A (en) * | 1985-04-12 | 1986-10-21 | Internatl Rectifier Corp Japan Ltd | Photoresist coating apparatus |
JPS6227779U (en) * | 1985-08-02 | 1987-02-19 | ||
JPH01254277A (en) * | 1988-03-31 | 1989-10-11 | Matsushita Electric Ind Co Ltd | Spinner rotation treatment apparatus |
US4888200A (en) * | 1988-04-21 | 1989-12-19 | W. R. Grace & Co.,-Conn. | Process and machine for electrostatic coating |
JPH029476A (en) * | 1988-06-27 | 1990-01-12 | Teru Kyushu Kk | Spin coating device |
JP2013140302A (en) * | 2012-01-06 | 2013-07-18 | Hoya Corp | Spectacle lens coating liquid coating device |
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