JPS549919A - Photoresist coating device - Google Patents

Photoresist coating device

Info

Publication number
JPS549919A
JPS549919A JP7434277A JP7434277A JPS549919A JP S549919 A JPS549919 A JP S549919A JP 7434277 A JP7434277 A JP 7434277A JP 7434277 A JP7434277 A JP 7434277A JP S549919 A JPS549919 A JP S549919A
Authority
JP
Japan
Prior art keywords
photoresist
coating device
photoresist coating
collector
rotary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7434277A
Other languages
Japanese (ja)
Inventor
Yoshiharu Mori
Nobuo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7434277A priority Critical patent/JPS549919A/en
Publication of JPS549919A publication Critical patent/JPS549919A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To install a photoresist collector for preventing rescattering of photoresist near the circumferences of the cover and the rotary stand of a rotary coating device, to exhaust the air through the collector out of the device, to effectively prevent reattaching of the photoresist and attaching of dust, and thereby to obtain a photoresist film of high quality.
JP7434277A 1977-06-24 1977-06-24 Photoresist coating device Pending JPS549919A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7434277A JPS549919A (en) 1977-06-24 1977-06-24 Photoresist coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7434277A JPS549919A (en) 1977-06-24 1977-06-24 Photoresist coating device

Publications (1)

Publication Number Publication Date
JPS549919A true JPS549919A (en) 1979-01-25

Family

ID=13544344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7434277A Pending JPS549919A (en) 1977-06-24 1977-06-24 Photoresist coating device

Country Status (1)

Country Link
JP (1) JPS549919A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5461868A (en) * 1977-10-13 1979-05-18 Fsi Corp Ic substrate and wafer cleaning and drying device
JPS58103132A (en) * 1981-12-16 1983-06-20 Konishiroku Photo Ind Co Ltd Spinner device
JPS61236543A (en) * 1985-04-12 1986-10-21 Internatl Rectifier Corp Japan Ltd Photoresist coating apparatus
JPS6227779U (en) * 1985-08-02 1987-02-19
JPH01254277A (en) * 1988-03-31 1989-10-11 Matsushita Electric Ind Co Ltd Spinner rotation treatment apparatus
US4888200A (en) * 1988-04-21 1989-12-19 W. R. Grace & Co.,-Conn. Process and machine for electrostatic coating
JPH029476A (en) * 1988-06-27 1990-01-12 Teru Kyushu Kk Spin coating device
JP2013140302A (en) * 2012-01-06 2013-07-18 Hoya Corp Spectacle lens coating liquid coating device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5461868A (en) * 1977-10-13 1979-05-18 Fsi Corp Ic substrate and wafer cleaning and drying device
JPS6038021B2 (en) * 1977-10-13 1985-08-29 エフエスアイ・コ−ポレ−シヨン Cleaning/drying equipment for integrated circuit substrates and wafers
JPS58103132A (en) * 1981-12-16 1983-06-20 Konishiroku Photo Ind Co Ltd Spinner device
JPS61236543A (en) * 1985-04-12 1986-10-21 Internatl Rectifier Corp Japan Ltd Photoresist coating apparatus
JPS6227779U (en) * 1985-08-02 1987-02-19
JPH01254277A (en) * 1988-03-31 1989-10-11 Matsushita Electric Ind Co Ltd Spinner rotation treatment apparatus
US4888200A (en) * 1988-04-21 1989-12-19 W. R. Grace & Co.,-Conn. Process and machine for electrostatic coating
JPH029476A (en) * 1988-06-27 1990-01-12 Teru Kyushu Kk Spin coating device
JP2013140302A (en) * 2012-01-06 2013-07-18 Hoya Corp Spectacle lens coating liquid coating device

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