JPS5615589B2 - - Google Patents

Info

Publication number
JPS5615589B2
JPS5615589B2 JP12464977A JP12464977A JPS5615589B2 JP S5615589 B2 JPS5615589 B2 JP S5615589B2 JP 12464977 A JP12464977 A JP 12464977A JP 12464977 A JP12464977 A JP 12464977A JP S5615589 B2 JPS5615589 B2 JP S5615589B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12464977A
Other languages
Japanese (ja)
Other versions
JPS5363874A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5363874A publication Critical patent/JPS5363874A/ja
Publication of JPS5615589B2 publication Critical patent/JPS5615589B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/63Combinations of vertical and lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/65Integrated injection logic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/038Diffusions-staged
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/106Masks, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/167Two diffusions in one hole

Landscapes

  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
JP12464977A 1976-11-16 1977-10-19 Bipolar transistor Granted JPS5363874A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2652103A DE2652103C2 (de) 1976-11-16 1976-11-16 Integrierte Halbleiteranordnung für ein logisches Schaltungskonzept und Verfahren zu ihrer Herstellung

Publications (2)

Publication Number Publication Date
JPS5363874A JPS5363874A (en) 1978-06-07
JPS5615589B2 true JPS5615589B2 (ref) 1981-04-10

Family

ID=5993241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12464977A Granted JPS5363874A (en) 1976-11-16 1977-10-19 Bipolar transistor

Country Status (15)

Country Link
US (1) US4158783A (ref)
JP (1) JPS5363874A (ref)
AT (1) AT382261B (ref)
BE (1) BE859759A (ref)
BR (1) BR7707519A (ref)
CA (1) CA1092722A (ref)
DD (1) DD137771A5 (ref)
DE (1) DE2652103C2 (ref)
ES (1) ES464138A1 (ref)
FR (1) FR2371063A1 (ref)
GB (1) GB1592334A (ref)
IT (1) IT1115741B (ref)
NL (1) NL7711778A (ref)
SE (1) SE7712741L (ref)
SU (1) SU912065A3 (ref)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4199776A (en) * 1978-08-24 1980-04-22 Rca Corporation Integrated injection logic with floating reinjectors
JPS55170895U (ref) * 1979-05-26 1980-12-08
US4338622A (en) * 1979-06-29 1982-07-06 International Business Machines Corporation Self-aligned semiconductor circuits and process therefor
US4794277A (en) * 1986-01-13 1988-12-27 Unitrode Corporation Integrated circuit under-voltage lockout
US5177029A (en) * 1989-03-28 1993-01-05 Matsushita Electric Works, Ltd. Method for manufacturing static induction type semiconductor device enhancement mode power

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7107040A (ref) * 1971-05-22 1972-11-24
NL7200294A (ref) * 1972-01-08 1973-07-10
US3919005A (en) * 1973-05-07 1975-11-11 Fairchild Camera Instr Co Method for fabricating double-diffused, lateral transistor
US3959809A (en) * 1974-05-10 1976-05-25 Signetics Corporation High inverse gain transistor
DE2446649A1 (de) * 1974-09-30 1976-04-15 Siemens Ag Bipolare logikschaltung
US3993513A (en) * 1974-10-29 1976-11-23 Fairchild Camera And Instrument Corporation Combined method for fabricating oxide-isolated vertical bipolar transistors and complementary oxide-isolated lateral bipolar transistors and the resulting structures
US4058419A (en) * 1974-12-27 1977-11-15 Tokyo Shibaura Electric, Co., Ltd. Method of manufacturing integrated injection logic semiconductor devices utilizing self-aligned double-diffusion techniques
DE2509530C2 (de) * 1975-03-05 1985-05-23 Ibm Deutschland Gmbh, 7000 Stuttgart Halbleiteranordnung für die Grundbausteine eines hochintegrierbaren logischen Halbleiterschaltungskonzepts basierend auf Mehrfachkollektor-Umkehrtransistoren

Also Published As

Publication number Publication date
FR2371063A1 (fr) 1978-06-09
FR2371063B1 (ref) 1980-08-01
JPS5363874A (en) 1978-06-07
NL7711778A (nl) 1978-05-18
CA1092722A (en) 1980-12-30
ES464138A1 (es) 1978-12-16
IT1115741B (it) 1986-02-03
DD137771A5 (de) 1979-09-19
DE2652103A1 (de) 1978-05-24
DE2652103C2 (de) 1982-10-28
SU912065A3 (ru) 1982-03-07
US4158783A (en) 1979-06-19
SE7712741L (sv) 1978-05-17
BR7707519A (pt) 1978-08-01
ATA470677A (de) 1986-06-15
GB1592334A (en) 1981-07-08
BE859759A (fr) 1978-02-01
AT382261B (de) 1987-02-10

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