JPS56155635A - Apparatus for oxide film growth in vacuum cvd process - Google Patents

Apparatus for oxide film growth in vacuum cvd process

Info

Publication number
JPS56155635A
JPS56155635A JP5970980A JP5970980A JPS56155635A JP S56155635 A JPS56155635 A JP S56155635A JP 5970980 A JP5970980 A JP 5970980A JP 5970980 A JP5970980 A JP 5970980A JP S56155635 A JPS56155635 A JP S56155635A
Authority
JP
Japan
Prior art keywords
feed nozzles
oxide film
reactive gas
oxygen
gas feed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5970980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6217852B2 (enrdf_load_html_response
Inventor
Hidetomo Doi
Masayuki Kitano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5970980A priority Critical patent/JPS56155635A/ja
Publication of JPS56155635A publication Critical patent/JPS56155635A/ja
Publication of JPS6217852B2 publication Critical patent/JPS6217852B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP5970980A 1980-05-06 1980-05-06 Apparatus for oxide film growth in vacuum cvd process Granted JPS56155635A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5970980A JPS56155635A (en) 1980-05-06 1980-05-06 Apparatus for oxide film growth in vacuum cvd process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5970980A JPS56155635A (en) 1980-05-06 1980-05-06 Apparatus for oxide film growth in vacuum cvd process

Publications (2)

Publication Number Publication Date
JPS56155635A true JPS56155635A (en) 1981-12-01
JPS6217852B2 JPS6217852B2 (enrdf_load_html_response) 1987-04-20

Family

ID=13121004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5970980A Granted JPS56155635A (en) 1980-05-06 1980-05-06 Apparatus for oxide film growth in vacuum cvd process

Country Status (1)

Country Link
JP (1) JPS56155635A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6186933U (enrdf_load_html_response) * 1984-11-13 1986-06-07
JP2005311301A (ja) * 2004-03-24 2005-11-04 Tokyo Electron Ltd 被処理体の酸化方法、酸化装置及び記憶媒体

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54125974A (en) * 1978-03-24 1979-09-29 Hitachi Ltd Low-tension cvd device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54125974A (en) * 1978-03-24 1979-09-29 Hitachi Ltd Low-tension cvd device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6186933U (enrdf_load_html_response) * 1984-11-13 1986-06-07
JP2005311301A (ja) * 2004-03-24 2005-11-04 Tokyo Electron Ltd 被処理体の酸化方法、酸化装置及び記憶媒体

Also Published As

Publication number Publication date
JPS6217852B2 (enrdf_load_html_response) 1987-04-20

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