JPS56148828A - Positioning method in electron-beam exposing device - Google Patents

Positioning method in electron-beam exposing device

Info

Publication number
JPS56148828A
JPS56148828A JP5227480A JP5227480A JPS56148828A JP S56148828 A JPS56148828 A JP S56148828A JP 5227480 A JP5227480 A JP 5227480A JP 5227480 A JP5227480 A JP 5227480A JP S56148828 A JPS56148828 A JP S56148828A
Authority
JP
Japan
Prior art keywords
sample
mark signals
electron
amplifier
dimensions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5227480A
Other languages
Japanese (ja)
Inventor
Takayuki Miyazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5227480A priority Critical patent/JPS56148828A/en
Publication of JPS56148828A publication Critical patent/JPS56148828A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Abstract

PURPOSE:To improve operation efficiency without requiring hands by a method wherein the gains of the amplification of mark signals obtained by the initial scanning of a sample are adjusted on the basis of the dimensions of the mark signals, and the sample is positioned. CONSTITUTION:Electron rays 3 from an electron gun 6 are irradiated to a sample 16 on a sample base 14 through a focussing coil 8 and a deflection coil 10 for initial scanning, mark signals are detected by means of a secondary electron detector 12, the output is inputted to a wave-form memory storage 22 through a variable gain amplifier 18 and an AD transducer 20, the maximum level and the minimum level of wave-forms are obtained by means of a central processing unit 24, the optimum amplification rate of the amplifier 18 is decided, a switch-unit 182 is changed over and scanning for positioning is conducted. Thus, operation efficiency is improved because the dimensions of the mark signals are detected automatically and the optimum amplification rate of the amplifier is automatically computed and set.
JP5227480A 1980-04-22 1980-04-22 Positioning method in electron-beam exposing device Pending JPS56148828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5227480A JPS56148828A (en) 1980-04-22 1980-04-22 Positioning method in electron-beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5227480A JPS56148828A (en) 1980-04-22 1980-04-22 Positioning method in electron-beam exposing device

Publications (1)

Publication Number Publication Date
JPS56148828A true JPS56148828A (en) 1981-11-18

Family

ID=12910197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5227480A Pending JPS56148828A (en) 1980-04-22 1980-04-22 Positioning method in electron-beam exposing device

Country Status (1)

Country Link
JP (1) JPS56148828A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018113371A (en) * 2017-01-12 2018-07-19 株式会社ニューフレアテクノロジー Charged particle beam lithography apparatus and charged particle beam lithography method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018113371A (en) * 2017-01-12 2018-07-19 株式会社ニューフレアテクノロジー Charged particle beam lithography apparatus and charged particle beam lithography method

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