JPS56142662A - Manufacture of semiconductor integrated circuit - Google Patents
Manufacture of semiconductor integrated circuitInfo
- Publication number
- JPS56142662A JPS56142662A JP4593580A JP4593580A JPS56142662A JP S56142662 A JPS56142662 A JP S56142662A JP 4593580 A JP4593580 A JP 4593580A JP 4593580 A JP4593580 A JP 4593580A JP S56142662 A JPS56142662 A JP S56142662A
- Authority
- JP
- Japan
- Prior art keywords
- regions
- chip
- step checking
- check
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To limit the area occupying the step checking element to the minimum limit by dispersing a plurality of different step checking elements in the respective chips. CONSTITUTION:Chip regions 3-1-3-4 are disposed on a semiconductor substrate 2, and each chip region has equal function element regions 4-1-4-4 and equal arranged regions 20-1-20-4. Different step checking elements 16, 17, 18, 19 are dispersed in the check regions 20-1-20-4. The check steps can be simplified by disposing the check regions at the same chip regions, and the mask can also be readily formed. Thus, the area occupying the step checking elements can be limited to the minimum limit, the degree of freedom on the layout can be increased, and the mask can be readily manufactured, and the chip can be made to small sizes.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4593580A JPS56142662A (en) | 1980-04-08 | 1980-04-08 | Manufacture of semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4593580A JPS56142662A (en) | 1980-04-08 | 1980-04-08 | Manufacture of semiconductor integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56142662A true JPS56142662A (en) | 1981-11-07 |
JPS6212664B2 JPS6212664B2 (en) | 1987-03-19 |
Family
ID=12733119
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4593580A Granted JPS56142662A (en) | 1980-04-08 | 1980-04-08 | Manufacture of semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56142662A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63278242A (en) * | 1987-05-09 | 1988-11-15 | Fujitsu Ltd | Semiconductor device and method of testing flatness of surface thereof |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0685456U (en) * | 1993-05-25 | 1994-12-06 | 新キャタピラー三菱株式会社 | Fixing mechanism in rotary operation lever device |
-
1980
- 1980-04-08 JP JP4593580A patent/JPS56142662A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63278242A (en) * | 1987-05-09 | 1988-11-15 | Fujitsu Ltd | Semiconductor device and method of testing flatness of surface thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS6212664B2 (en) | 1987-03-19 |
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