JPS5614238A - Lithographic plate preparation and material for its preparation - Google Patents

Lithographic plate preparation and material for its preparation

Info

Publication number
JPS5614238A
JPS5614238A JP8957479A JP8957479A JPS5614238A JP S5614238 A JPS5614238 A JP S5614238A JP 8957479 A JP8957479 A JP 8957479A JP 8957479 A JP8957479 A JP 8957479A JP S5614238 A JPS5614238 A JP S5614238A
Authority
JP
Japan
Prior art keywords
mask
hydrophilic
lithographic plate
preparation
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8957479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS623416B2 (enrdf_load_stackoverflow
Inventor
Satoshi Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP8957479A priority Critical patent/JPS5614238A/ja
Publication of JPS5614238A publication Critical patent/JPS5614238A/ja
Publication of JPS623416B2 publication Critical patent/JPS623416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP8957479A 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation Granted JPS5614238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8957479A JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8957479A JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Publications (2)

Publication Number Publication Date
JPS5614238A true JPS5614238A (en) 1981-02-12
JPS623416B2 JPS623416B2 (enrdf_load_stackoverflow) 1987-01-24

Family

ID=13974565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8957479A Granted JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Country Status (1)

Country Link
JP (1) JPS5614238A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408755B1 (en) * 1999-08-31 2002-06-25 Agfa-Gavaert Method for erasing a lithographic printing master
DE102005000891B4 (de) * 2005-01-07 2013-09-12 Robert Bosch Gmbh Verfahren zur Herstellung eines strukturierten Wafers

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8142987B2 (en) * 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
US9799534B1 (en) 2017-01-04 2017-10-24 International Business Machines Corporation Application of titanium-oxide as a patterning hardmask

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50102401A (enrdf_load_stackoverflow) * 1974-01-17 1975-08-13
JPS5444904A (en) * 1977-08-23 1979-04-09 Fromson H A Method of making flat printing plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50102401A (enrdf_load_stackoverflow) * 1974-01-17 1975-08-13
JPS5444904A (en) * 1977-08-23 1979-04-09 Fromson H A Method of making flat printing plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408755B1 (en) * 1999-08-31 2002-06-25 Agfa-Gavaert Method for erasing a lithographic printing master
DE102005000891B4 (de) * 2005-01-07 2013-09-12 Robert Bosch Gmbh Verfahren zur Herstellung eines strukturierten Wafers

Also Published As

Publication number Publication date
JPS623416B2 (enrdf_load_stackoverflow) 1987-01-24

Similar Documents

Publication Publication Date Title
JPS561533A (en) Method of photoetching
CA2013245A1 (en) X-ray lithography mask and devices made therewith
JPS5614238A (en) Lithographic plate preparation and material for its preparation
JPS5646753A (en) Preparation of gravure lithographic plate
EP0030642A3 (en) Lithographic printing plate and method for producing the same
EP0304077A3 (en) Method of forming a fine pattern
EP0385480A3 (en) Aperture pattern printing plate for shadow mask and method of manufacturing the same
EP0098922A3 (en) Process for selectively generating positive and negative resist patterns from a single exposure pattern
CA2441802A1 (en) Thermosensitive plate material for lithographic plate formation, process for producing the same, coating liquid, and lithographic plate
JPS6413536A (en) Pattern forming method
JPS5795053A (en) X-ray window
JPS5544813A (en) Printing method
JPS57198632A (en) Fine pattern formation
JPS5568655A (en) Manufacturing method of wiring
WO1997043694A3 (de) Verfahren zur herstellung einer stencil-maske
JPS57177973A (en) Formation of simulated etching pattern
JPS569736A (en) Photosensitive image forming material
JPS5570904A (en) Nanufacture for cunti-lever for pickup
JPS5656864A (en) Preparation of lithographic printing form
JPS57141924A (en) Pattern forming method
JPS64903A (en) Antidazzle filter
JPS6413727A (en) Manufacture of semiconductor device
JPS56130751A (en) Manufacture of mask
JPS55124233A (en) Manufacturing method of semiconductor device
JPS55105331A (en) Method for forming electronic-beam resist pattern on electrical insulating material