JPS623416B2 - - Google Patents

Info

Publication number
JPS623416B2
JPS623416B2 JP54089574A JP8957479A JPS623416B2 JP S623416 B2 JPS623416 B2 JP S623416B2 JP 54089574 A JP54089574 A JP 54089574A JP 8957479 A JP8957479 A JP 8957479A JP S623416 B2 JPS623416 B2 JP S623416B2
Authority
JP
Japan
Prior art keywords
plasma
layer
printing
mask
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54089574A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5614238A (en
Inventor
Satoshi Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP8957479A priority Critical patent/JPS5614238A/ja
Publication of JPS5614238A publication Critical patent/JPS5614238A/ja
Publication of JPS623416B2 publication Critical patent/JPS623416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP8957479A 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation Granted JPS5614238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8957479A JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8957479A JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Publications (2)

Publication Number Publication Date
JPS5614238A JPS5614238A (en) 1981-02-12
JPS623416B2 true JPS623416B2 (enrdf_load_stackoverflow) 1987-01-24

Family

ID=13974565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8957479A Granted JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Country Status (1)

Country Link
JP (1) JPS5614238A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007534012A (ja) * 2004-04-10 2007-11-22 イーストマン コダック カンパニー レリーフ画像の製造方法
US9799534B1 (en) 2017-01-04 2017-10-24 International Business Machines Corporation Application of titanium-oxide as a patterning hardmask

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408755B1 (en) * 1999-08-31 2002-06-25 Agfa-Gavaert Method for erasing a lithographic printing master
DE102005000891B4 (de) * 2005-01-07 2013-09-12 Robert Bosch Gmbh Verfahren zur Herstellung eines strukturierten Wafers

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1049312A (en) * 1974-01-17 1979-02-27 John O.H. Peterson Presensitized printing plate with in-situ, laser imageable mask
EP0001138A1 (en) * 1977-08-23 1979-03-21 Howard A. Fromson Method for making lithographic printing plates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007534012A (ja) * 2004-04-10 2007-11-22 イーストマン コダック カンパニー レリーフ画像の製造方法
US9799534B1 (en) 2017-01-04 2017-10-24 International Business Machines Corporation Application of titanium-oxide as a patterning hardmask

Also Published As

Publication number Publication date
JPS5614238A (en) 1981-02-12

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