JPS5656864A - Preparation of lithographic printing form - Google Patents
Preparation of lithographic printing formInfo
- Publication number
- JPS5656864A JPS5656864A JP13262379A JP13262379A JPS5656864A JP S5656864 A JPS5656864 A JP S5656864A JP 13262379 A JP13262379 A JP 13262379A JP 13262379 A JP13262379 A JP 13262379A JP S5656864 A JPS5656864 A JP S5656864A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- layer
- base
- silicon layer
- utilizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To obtain a lithographic printing form requiring no dampening water and providing a printed matter excellent in a resolving power thereof by a method wherein a silicon layer and a patternized protecting layer are formed sequentially on a surface of a base, thereafter, the nonprotected silicon layer is removed by an etching agent.
CONSTITUTION: A primer such as a silane series or the like is coated on a base 1 of a metallic plate or the like, subsequently, a silicon layer 2 (preferably a high polymeric organopolysiloxane or the like capable of forming an ink repellent silicon rubber elastic body after crosslinked setting) is provided thereon preferably in a thickness of 1W5μ. A patterning of a protecting layer 4 of diadidoquinone or the like is effected thereon by means of form making method utilizing a photoregisting, for example. Subsequently, silicon in a nonprotected layer part is removed by utilizing a silicon etching agent, thereafter, the protecting layer 4 is removed by utilizing solvent or the like and a printing area 3 consisting of an exposed surface of the base as well as a nonprinting area 2' consisting of the silicon layer are formed.
EFFECT: Emulsification of ink due to dampening water may be avoided and the base may not be spoiled.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13262379A JPS5656864A (en) | 1979-10-15 | 1979-10-15 | Preparation of lithographic printing form |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13262379A JPS5656864A (en) | 1979-10-15 | 1979-10-15 | Preparation of lithographic printing form |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5656864A true JPS5656864A (en) | 1981-05-19 |
JPS6154221B2 JPS6154221B2 (en) | 1986-11-21 |
Family
ID=15085643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13262379A Granted JPS5656864A (en) | 1979-10-15 | 1979-10-15 | Preparation of lithographic printing form |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5656864A (en) |
-
1979
- 1979-10-15 JP JP13262379A patent/JPS5656864A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6154221B2 (en) | 1986-11-21 |
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