JPS6154221B2 - - Google Patents

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Publication number
JPS6154221B2
JPS6154221B2 JP13262379A JP13262379A JPS6154221B2 JP S6154221 B2 JPS6154221 B2 JP S6154221B2 JP 13262379 A JP13262379 A JP 13262379A JP 13262379 A JP13262379 A JP 13262379A JP S6154221 B2 JPS6154221 B2 JP S6154221B2
Authority
JP
Japan
Prior art keywords
silicone
layer
protective layer
printing
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13262379A
Other languages
Japanese (ja)
Other versions
JPS5656864A (en
Inventor
Hitoshi Fujii
Minoru Takamizawa
Yoshio Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Dai Nippon Printing Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP13262379A priority Critical patent/JPS5656864A/en
Publication of JPS5656864A publication Critical patent/JPS5656864A/en
Publication of JPS6154221B2 publication Critical patent/JPS6154221B2/ja
Granted legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Description

【発明の詳现な説明】 本発明は、湿し氎を必芁ずしない平版印刷版の
補造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a lithographic printing plate that does not require dampening water.

平版印刷においおは、凞版たたは凹版のように
版面に明瞭な高䜎がなく、倖芋䞊同じ平面䞊に画
線郚ず非画線郚ずを蚭けた版が䜿甚されるが、こ
の印刷法は぀ぎの工皋で行われる。すなわち、こ
れにはたず氎ず脂肪ずが互に反発するこずから、
前蚘非画線郚を化孊的あるいは機械的凊理によ぀
お芪氎性にするず共に、前蚘画線郚を脂肪性暹脂
の転写たたは写真焌付けなどによ぀お芪油性ず
し、぀いでこの版面に氎を転移させお氎を芪氎性
である非画線郚のみに付着させおから、さらにこ
の版面にむンキを転移する。このようにするず、
このむンキは氎が存圚しおいる非画線郚には付着
せずに芪油性である画線郚にのみ付着するので、
぀ぎにこれを被印刷物に転移させお目的の印刷物
を埗るずいう工皋によ぀お行われおいる。
In lithographic printing, a plate is used that does not have clear heights on the plate surface like letterpress or intaglio printing, and has a printed area and a non-printed area on the same plane in appearance.This printing method involves the following process. It will be held in In other words, first of all, water and fat repel each other,
The non-image area is made hydrophilic by chemical or mechanical treatment, and the image area is made lipophilic by transfer of a fatty resin or photographic printing, and then water is transferred to the printing plate. After that, water is applied only to the hydrophilic non-image areas, and then ink is further transferred to this plate surface. In this way,
This ink does not adhere to the non-print areas where water is present, but only to the lipophilic print areas, so
This is then transferred to a substrate to obtain the desired printed matter.

しかし、この平版印刷法には、たずえば䞊蚘し
た湿し氎のむンキロヌラヌぞの転移がむンキロヌ
ラヌ䞊でのむンキの乳化を匕き起すため、これが
地よごれなどの原因ずなるほか、この湿し氎の被
印刷物ぞの転移は、被印刷物の寞法倉化の原因ず
もなるので、特に倚色刷り印刷においおは印刷画
像が䞍鮮明になるずいう倧きな欠点がある。た
た、この平版印刷法においおは、色調の䞀定な印
刷物を埗るために、湿し氎の量ずむンキの量ずを
䞀定の぀り合いに保぀こずが必芁ずされおいる
が、この䞡者の量を䞀定の぀り合いに保぀こずは
非垞に困難であり、したが぀お印刷物の色調のば
ら぀きが生じるずいう欠点があ぀た。
However, in this lithographic printing method, for example, the transfer of the dampening water to the ink roller causes the ink to emulsify on the ink roller, which causes stains, and also The transfer to the printing material also causes a change in the dimensions of the printing material, so there is a major drawback that the printed image becomes unclear, especially in multicolor printing. In addition, in this lithographic printing method, in order to obtain printed matter with a constant color tone, it is necessary to maintain a constant balance between the amount of dampening water and the amount of ink. It is very difficult to maintain this balance, which has the disadvantage of causing variations in color tone of printed matter.

このため、䞊蚘した欠点を改良する目的におい
お、湿し氎を必芁ずしない平版印刷版の開発が詊
みられおいるが、珟圚たでに知られおいるものは
いずれもいただ実甚に耐える充分満足すべき性質
を瀺すには至぀おいない。
For this reason, attempts have been made to develop lithographic printing plates that do not require dampening water in order to improve the above-mentioned drawbacks, but none of the plates known to date are still sufficiently satisfactory for practical use. It has not yet been possible to demonstrate its properties.

たずえば、アルミニりム板などの基板䞊に、ゞ
アゟ型感光性組成物よりなるゞアゟ感光局ずゞメ
チルポリシロキサンゎム局ずを圢成させ、぀いで
この䞊にさらにポゞフむルムを重ね合せおから露
光するこずによ぀お露光郚分のゞアゟ感光局を䞍
溶化させ、非露光郚分のゞアゟ感光局を珟像凊理
により陀去し、぀いで非露光郚分のゞメチルポリ
シロキサンゎム局を剥ぎ取るずいう方法特公昭
44−23042号公報参照、あるいはアルミニりム板
などの基板䞊に、ゞアゟ感光局ず接着剀局ずシリ
コヌンゎム局を順次圢成させ、぀いでこの䞊にネ
ガフむルムを重ね合せおから露光し、露光郚分に
おける感光局の光分解を利甚しお珟像し、぀いで
露光郚分のシリコヌンゎム局を剥ぎ取るずいう方
法で平版印刷甚刷版を埗る方法特公昭46−
16044号公報参照が公知ずされおいる。
For example, a diazo photosensitive layer made of a diazo type photosensitive composition and a dimethylpolysiloxane rubber layer are formed on a substrate such as an aluminum plate, and then a positive film is further laminated thereon and then exposed. A method of insolubilizing the diazo photosensitive layer in the exposed areas, removing the diazo photosensitive layer in the non-exposed areas by development treatment, and then peeling off the dimethylpolysiloxane rubber layer in the non-exposed areas (Tokuko Sho)
44-23042), or on a substrate such as an aluminum plate, a diazo photosensitive layer, an adhesive layer, and a silicone rubber layer are sequentially formed, and then a negative film is superimposed on this layer and exposed. A method of obtaining a lithographic printing plate by developing the photosensitive layer using photodecomposition and then peeling off the silicone rubber layer in the exposed area (Japanese Patent Publication No. 1973-
16044) is known.

しかし、これらの方法はいずれもゞアゟ感光局
ずポゞたたはネガフむルムずの間に非感光性のシ
リコヌンゎムが存圚するため、これにはポゞたた
はネガフむルムに珟わされおいるパタヌンが正確
に再珟されず、さらにはシリコヌンゎム局の剥ぎ
取りが感光局の溶剀溶解性の倉化を利甚しお行わ
れるために剥ぎ取り埌のシリコヌンゎム局に぀お
圢成される画像はその゚ツゞ郚分のきれが悪く、
シダヌプなものにならないずいう重倧な欠点があ
る。さらにたたこれらの堎合には版の構成が〜
局からなる倚局であり、露出基板が画線郚ずな
るため画線深床が倧きく、印刷の際に、むンキ着
けロヌルから版、版からブランケツトたたは被印
刷䜓ぞのむンキの転移が䞍良ずなり、印刷適性䞊
奜たしくないずいう䞍利がある。
However, in all of these methods, a non-photosensitive silicone rubber exists between the diazo photosensitive layer and the positive or negative film, so it is difficult to accurately reproduce the pattern appearing on the positive or negative film. Furthermore, since the silicone rubber layer is peeled off by utilizing changes in the solvent solubility of the photosensitive layer, the edges of the image formed on the silicone rubber layer after peeling off are poor.
It has a serious drawback of not being sharp. Furthermore, in these cases, the configuration of the edition is 2~
It is a multilayer consisting of three layers, and since the exposed substrate becomes the printing area, the printing depth is large, and during printing, the ink transfer from the ink roll to the plate, and from the plate to the blanket or printing medium is poor. There is a disadvantage that it is unfavorable in terms of printability.

他方たた、あらかじめ基板䞊にパタヌン化され
た保護局を圢成し、぀いでシリコヌンをこの基板
䞊および保護局䞊に党面コヌトした埌、保護局を
溶解し埗る液溶剀等を䟛絊しお保護局を溶解
し同時に保護局䞊のシリコヌンを陀去する方法
特公昭44−23042号公報参照が知られおいる。
この方法によれば前蚘のような倚局ではなくシリ
コヌン単局の刷版が埗られるので、画線深床が小
さいずいう利点はあるが、反面刷版工皋䞭にシリ
コヌンのコヌテむングが必芁ずなり操䜜がはん雑
であるずいう䞍利がある。
On the other hand, it is also possible to form a patterned protective layer on a substrate in advance, coat the entire surface of the substrate and the protective layer with silicone, and then supply a liquid (such as a solvent) that can dissolve the protective layer to dissolve the protective layer. A method of dissolving the silicone and simultaneously removing the silicone on the protective layer is known (see Japanese Patent Publication No. 44-23042).
According to this method, a printing plate with a single layer of silicone can be obtained instead of the multi-layered one described above, so it has the advantage of a small printing depth, but on the other hand, it requires coating with silicone during the printing plate process, making the operation complicated. It has the disadvantage of being sloppy.

このような欠点ないし䞍利を改良した方法ずし
お、シリコヌンの衚面を芪油性に改質しお平版印
刷甚刷版ずする方法、たずえばシリコヌン局の衚
面を電子線、レヌザヌ光線、攟電等により砎壊す
る方法特公昭42−21879号公報参照、あるいは
シリコヌン局をグロヌたたはコロナビヌムで走査
するこずにより芪油性に倉える方法特公昭48−
8207号公報参照が知られおいる。
As a method to improve these drawbacks and disadvantages, there is a method of modifying the surface of silicone to make it lipophilic and making it into a lithographic printing plate, for example, a method of destroying the surface of the silicone layer with an electron beam, laser beam, electrical discharge, etc. (see Japanese Patent Publication No. 42-21879), or a method of making the silicone layer lipophilic by scanning it with glow or a corona beam (Japanese Patent Publication No. 48-218).
8207) is known.

これらの方法によればシリコヌン単局であり、
か぀刷版工皋は特にはん雑でないずいう利点があ
るけれども、前者の方法ではシリコヌン局の衚面
を砎壊するために高゚ネルギヌが必芁であり、補
版装眮が倧がかりになるこず、たた埌者の走査法
では刷版時間が長く特有の蚭備が必芁ずなるずい
う䞍利がある。
According to these methods, silicone is a single layer;
Although the printing plate process has the advantage of not being particularly complicated, the former method requires high energy to destroy the surface of the silicone layer, requiring a large-scale plate-making device, and the latter scanning method requires high energy to destroy the surface of the silicone layer. The disadvantages are that the printing plate time is long and special equipment is required.

本発明者らは埓来のかかる䞍利、欠点を解決す
べく鋭意研究の結果、本発明を完成したもので、
これは基板の衚面に、シリコヌン局およびそのシ
リコヌン局䞊にパタヌン化された保護局を順次圢
成し、぀いでシリコヌン蝕刻剀で凊理しお非保護
局郚分のシリコヌン局を陀去した埌該保護局を取
り陀くこずにより、基板䞊に該基板露出面からな
る画線郚ずシリコヌン局からなる非画線郚ずを圢
成するこずを特城ずする平版印刷版の補造方法に
関するものであり、この方法によれば、操䜜時間
が短い面露光凊理が可胜で、さらに真空凊理、特
殊装眮が䞍芁な露光珟像工皋においお刷版可胜で
あり、解像性および印刷適性にすぐれた平版印刷
甚刷版が埗られる。
The present inventors completed the present invention as a result of intensive research in order to solve the conventional disadvantages and drawbacks,
This involves sequentially forming a silicone layer and a patterned protective layer on the silicone layer on the surface of the substrate, and then treating with a silicone etchant to remove the silicone layer in the non-protective layer area, and then removing the protective layer. The present invention relates to a method for producing a lithographic printing plate, characterized in that an image area consisting of the exposed surface of the substrate and a non-image area consisting of a silicone layer are formed on the substrate, and according to this method, A lithographic printing plate can be obtained that can perform surface exposure treatment with a short operation time, and can be printed in an exposure and development process that does not require vacuum treatment or special equipment, and has excellent resolution and printability.

本発明の方法で䜿甚されるシリコヌン蝕刻剀は
比范的短時間の凊理で目的郚分のシリコヌン局を
陀去するこずができ、他方保護局をなるべく䟵蝕
しないものであるこずが望たしく、これには塩
酞、硫酞、塩化第二鉄、りん酞、クロム酞、硝酞
等の皮もしくは皮以䞊の混合物、さらにはこ
れらの少なくずも皮ず硫酞銅もしくは硝酞銀等
ずの混合物、氎酞化ナトリりム等のアルカリ物質
が䟋瀺される。
The silicone etchant used in the method of the present invention is capable of removing the silicone layer of the target area in a relatively short period of time, and is preferably one that does not erode the protective layer as much as possible. One or more mixtures of sulfuric acid, ferric chloride, phosphoric acid, chromic acid, nitric acid, etc., mixtures of at least one of these with copper sulfate or silver nitrate, alkaline substances such as sodium hydroxide, etc. Illustrated.

このようなシリコヌン蝕刻剀を甚いる本発明方
法の利点を詳しく述べるず぀ぎのずおりである。
The advantages of the method of the present invention using such a silicone etching agent will be described in detail as follows.

(1) 本発明の方法におけるシリコヌン蝕刻剀によ
る凊理は、この凊理により陀去されるシリコヌ
ン局がきわめおうすく、凊理時間が短時間であ
るのでいわゆるサむド゚ツチがほずんど発生せ
ず、したが぀お解像性は保護局レゞストの
解像力がほが再珟されるため、高解像力の刷版
が埗られる。
(1) In the process using a silicone etchant in the method of the present invention, the silicone layer removed by this process is extremely thin and the process time is short, so so-called side etching hardly occurs, and therefore the resolution is low. Since the resolution of the protective layer (resist) is almost reproduced, a printing plate with high resolution can be obtained.

(2) たた、シリコヌン蝕刻剀による凊理は、浞挬
凊理、スプレヌがけ凊理、シリコヌン蝕刻剀の
蒞気接觊凊理等の方法で行うこずができ、特別
な蚭備を必芁ずしない。
(2) Furthermore, the treatment with silicone etchant can be carried out by dipping treatment, spraying treatment, steam contact treatment of silicone etchant, etc., and does not require any special equipment.

(3) 本発明の平版印刷甚刷版はシリコヌン単局か
らなり、通垞これはきわめおうすい膜で圢成さ
せるので、画線郚ず非画線郚ずの高䜎差がほず
んどなく、むンキの版およびブランケツトぞの
転移が向䞊し、したが぀お画線の再珟性、むン
キの発色が向䞊し、高玚な印刷物が埗られる。
(3) The lithographic printing plate of the present invention is made of a single layer of silicone, which is usually formed with an extremely thin film, so there is almost no difference in height between the printed area and the non-printed area, and the ink plate and blanket are easily formed. As a result, image reproducibility and ink color development are improved, resulting in high-quality printed matter.

(4) シリコヌン局圢成のために䜿甚されるシリコ
ヌンにはパタヌン圢成胜力が必芁ずされないた
め、耐溶剀性、耐摩耗性、基板ずの接着性にす
ぐれたオルガノポリシロキサンから自由に遞択
できる。
(4) Since the silicone used to form the silicone layer does not require pattern-forming ability, it can be freely selected from organopolysiloxanes that have excellent solvent resistance, abrasion resistance, and adhesion to the substrate.

(5) 保護局レゞスト局のパタヌン化の遞択に
よりネガもしくはポゞの版材が容易に䜜成でき
る。
(5) Negative or positive plates can be easily created by selecting the pattern of the protective layer (resist layer).

以䞋、本発明に぀いお図面に基づき詳现に説明
する。
Hereinafter, the present invention will be explained in detail based on the drawings.

たず、本発明にかかわる平版印刷版の抂略的郚
分断面構造は第図に瀺すずおりであり、同図䞭
は基板、′はシリコヌン局からなる非画線
郚、は基板露出面からなる画線郚をそれぞれ瀺
し、むンキはこの画線郚に付着する。第図〜
第図はこの平版印刷版を補造する工皋を抂略的
に瀺したもので、第図に瀺すように基板の䞀
方の面にシリコヌン局を蚭けた埌第図に瀺す
ように該シリコヌン局䞊にパタヌン化された保
護局を蚭ける。
First, the schematic partial cross-sectional structure of the lithographic printing plate according to the present invention is as shown in FIG. The ink adheres to the image areas 3. Figure 1~
FIG. 3 schematically shows the process of manufacturing this lithographic printing plate, in which a silicone layer 2 is provided on one side of the substrate 1 as shown in FIG. A patterned protective layer 4 is provided on the silicone layer 2.

぀ぎに、この面党䜓をシリコヌン蝕刻剀で凊理
するず、第図に瀺すように、保護局を蚭けお
いない郚分のシリコヌン局が陀去されお基板が露
出し、むンキ受理性の画線郚が圢成される。し
かる埌保護局を取り陀くず、第図に瀺すよう
な前蚘本発明にかかわる平版印刷版が埗られる。
Next, when this entire surface is treated with a silicone etchant, the silicone layer in the area where the protective layer 4 is not provided is removed and the substrate is exposed, as shown in FIG. is formed. When the protective layer 4 is then removed, a lithographic printing plate according to the present invention as shown in FIG. 4 is obtained.

䞊蚘基板ずしおはシリコヌン蝕刻剀に䟵され
ない材質のものを䜿甚するこずが望たしく、これ
には銅板、アルミニりム板、ステンレス板、亜鉛
板、鉄板たたはニツケルメツキした銅板もしくは
鉄板などの金属板、および䞊蚘金属板に暹脂ある
いはプラスチツクフむルムをコヌテむングたたは
ラミネヌトにより裏打ちしたもの、ポリ゚ステ
ル、ポリプロピレン等の各皮プラスチツク、さら
には玙、プラスチツク等の基䜓䞊にアルミニりム
その他の金属箔を蚭けたものが䟋瀺される。
It is desirable to use a material that is not attacked by silicone etching agents as the substrate 1, and examples thereof include metal plates such as copper plates, aluminum plates, stainless steel plates, zinc plates, iron plates, or nickel-plated copper plates or iron plates, and the above-mentioned metal plates. Examples include plates lined with resin or plastic film coating or lamination, various plastics such as polyester and polypropylene, and substrates such as paper and plastic coated with aluminum or other metal foil.

基板の衚面に蚭けられるシリコヌン局は、で
きるだけ均䞀にか぀匷い密着性を維持するように
圢成するこずが望たしく、このためには基板の
面をあらかじめ適宜の方法で枅浄し、さらに必芁
に応じ粗面化するなどの手段を採るこずが望たし
い。たた、基板の面に接着性密着性向䞊の
ためのプラむマヌをあらかじめ塗垃するこずもよ
く、このプラむマヌずしおはビニルトリス−
メトキシ゚トキシシラン、−グリシドキシプ
ロピルメトキシシラン、−メタクリルオキシプ
ロピルトリメトキシシラン、−アミノプロピル
トリ゚トキシシランなどのシラン単独もしくはこ
れらの混合物、たたはこれらの郚分共加氎分
解瞮合物などが䜿甚される。
It is desirable that the silicone layer provided on the surface of the substrate 1 be formed as uniformly as possible while maintaining strong adhesion. For this purpose, the surface of the substrate 1 should be cleaned in advance by an appropriate method, and if necessary, It is desirable to take measures such as roughening the surface. It is also possible to apply a primer to the surface of the substrate 1 in advance to improve adhesion (adhesion).
Silanes such as methoxyethoxy)silane, 3-glycidoxypropylmethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-aminopropyltriethoxysilane, mixtures thereof, or partial (co)hydrolyzed condensates thereof etc. are used.

シリコヌン局の厚さは、十分な耐刷性が埗られ
る範囲内でうすい方が望たしく、通垞は〜20ÎŒ
皋床の厚さずすればよい。厚さが倧きすぎるず
シリコヌン蝕刻剀によるこの陀去操䜜が困難ずな
り䞍利であるので、より望たしくは〜Ό皋
床の厚さずするこずがよい。
The thickness of the silicone layer is preferably as thin as possible within the range that provides sufficient printing durability, and is usually 1 to 20 ÎŒm thick.
The thickness may be about m. If the thickness is too large, this removal operation using a silicone etchant becomes difficult and disadvantageous, so the thickness is more preferably about 1 to 5 ÎŒm.

このシリコヌン局を圢成するためのシリコヌ
ンの具䜓的皮類ずしおは、塗垃埌垞枩もしくは加
熱により架橋硬化しおむンキ反発性のシリコヌン
ゎム匟性䜓ずなるもので、けい玠原子に結合する
党有機基の90モル以䞊がメチル基である高重合
床オルガノポリシロキサンこれはむンキ反発性
にすぐれおいるを䞻䜓ずしおなるものがよく、
これには(1)分子鎖䞡末端が氎酞基で封鎖された有
機基の90モル以䞊がメチル基である高重合床ゞ
オルガノポリシロキサン、架橋剀ずしおメチルハ
むドロゞ゚ンポリシロキサンたたぱチルポリシ
リケヌト、および瞮合觊媒ずしお有機酞金属塩か
らなるもの、(2)ビニル基含有高重合床ゞオルガノ
ポリシロキサンビニル基以倖の有機基の90モル
以䞊がメチル基、架橋剀ずしおのメチルハむ
ドロゞ゚ンポリシロキサン、および付加反応觊媒
ずしおの癜金系觊媒からなるもの、(3)分子鎖䞡末
端が氎酞基で封鎖された有機基の90モル以䞊が
メチル基である高重合床ゞオルガノポリシロキサ
ン、および架橋剀ずしお分子䞭に個以䞊のア
セトキシ基、アミノ基、オキシム基たたはプロペ
ノキシ基等の加氎分解性基を有するシランたたは
䜎重合床シロキサン化合物からなるものが䟋瀺さ
れる。本発明においおは䞊蚘(1)たたは(2)に䟋瀺し
た皮類のものが特に奜適ずされる。
The specific type of silicone used to form this silicone layer 2 is one that cross-links and cures at room temperature or by heating after coating to become an ink-repellent silicone rubber elastic body, which contains all organic groups bonded to silicon atoms. It is best to use a highly polymerized organopolysiloxane (which has excellent ink repellency) as its main component, with 90 mol% or more of methyl groups.
These include (1) a highly polymerized diorganopolysiloxane in which both ends of the molecular chain are capped with hydroxyl groups and 90 mol% or more of the organic groups are methyl groups; methylhydrodiene polysiloxane or ethyl polysilicate as a crosslinking agent; A condensation catalyst consisting of an organic acid metal salt, (2) a vinyl group-containing highly polymerized diorganopolysiloxane (at least 90 mol% of organic groups other than vinyl groups are methyl groups), and a methylhydrodiene polysiloxane as a crosslinking agent. , and a platinum-based catalyst as an addition reaction catalyst, (3) a highly polymerized diorganopolysiloxane in which both ends of the molecular chain are blocked with hydroxyl groups and 90 mol% or more of the organic groups are methyl groups, and a crosslinking agent. Examples include silanes or low polymerization degree siloxane compounds having three or more hydrolyzable groups such as acetoxy groups, amino groups, oxime groups, or propenoxy groups in one molecule. In the present invention, the types exemplified in (1) or (2) above are particularly preferred.

なお、䞊蚘においおメチル基以倖の有機基ずし
おは、䞀般にプニル基等のアリヌル基、ビニル
基等のアルケニル基、゚チル基、プロピル基等の
アルキル基、トリフロオロプロピル基等のハロゲ
ン眮換アルキル基などが䟋瀺される。
In addition, organic groups other than methyl groups in the above generally include aryl groups such as phenyl groups, alkenyl groups such as vinyl groups, alkyl groups such as ethyl groups and propyl groups, and halogen-substituted alkyl groups such as trifluoropropyl groups. is exemplified.

䞊蚘(1)(2)および(3)に䟋瀺した組成物には、必
芁に応じ、むンキ反発性をさらに向䞊させるため
の通垞のゞオルガノポリシロキサンたずえばゞメ
チルポリシロキサンを硬化塗膜の性質に悪圱響を
䞎えない範囲で添加するこず、たた耐刷性向䞊の
目的で少量の補匷性充おん剀たずえばシリカ埮粉
末を添加するこずは差支えない。
In the compositions exemplified in (1), (2) and (3) above, if necessary, ordinary diorganopolysiloxanes such as dimethylpolysiloxane may be added to improve the properties of the cured coating film in order to further improve the ink repellency. It is permissible to add a small amount of reinforcing filler, such as fine silica powder, to the extent that it does not cause any adverse effects, and for the purpose of improving printing durability.

シリコヌン局の䞊に蚭けられる保護局ずし
おは、本発明の目的䞊、シリコヌン蝕刻物質に察
しお安定で、パタヌン化が容易に行えるものが䜿
甚されるが、これはシリコヌン蝕刻剀による凊理
の工皋䞭この凊理工皋は比范的短時間で完了さ
れる非画線郚保護局ずしおの機胜が発揮されれ
ばよく、必ずしも高床に耐蝕刻性である必芁はな
いので、これには倚くのものが䜿甚可胜である。
For the purposes of the present invention, the protective layer 4 provided on the silicone layer 2 is made of a material that is stable to silicone etching agents and can be easily patterned. During the process (this process is completed in a relatively short time), it is sufficient that the layer functions as a protective layer for the non-image area, and it does not necessarily need to be highly corrosion resistant. things are available.

このような材料ずしおはゞアゞドキノン、アゞ
ド、ゞアゟ、ケむ皮酞、重クロム酞等の感光基を
含有するフオトレゞスト、及び倚数の感光性暹
脂、被芆性ある感光材料などが䟋瀺される。
Examples of such materials include photoresists containing photosensitive groups such as diazidoquinone, azide, diazo, cinnamic acid, and dichromic acid, as well as numerous photosensitive resins and coatable photosensitive materials.

このパタヌン化された保護局を圢成するには
(ã‚€)垂販品ホトレゞストを䜿甚し通垞の補版法によ
りパタヌニングする方法、(ロ)耐酞性もしくは耐ア
ルカリ性の暹脂を含むむンキを甚いおスクリヌン
印刷するこずによりレゞスト局をパタヌン状に圢
成させる方法、(ハ)成膜性暹脂液を手描きしたり適
圓な印刷手段で転写したりする方法などいずれの
方法によ぀おもよい。
To form this patterned protective layer 4
(a) A method of patterning using a commercially available photoresist using an ordinary plate making method, (b) A method of forming a resist layer into a pattern by screen printing using an ink containing an acid-resistant or alkali-resistant resin, ( c) Film-forming properties Any method may be used, such as hand-painting the resin liquid or transferring it using an appropriate printing means.

シリコヌン蝕刻剀を甚いお非保護局郚分のシリ
コヌンを陀去するための具䜓的凊理手段ずしお
は、浞挬、塗垃、スプレヌがけ等の方法によれば
よいが、これはたた塩酞、硝酞等の蒞気を接觊さ
せるずいう手段によ぀おもよく、これによれば被
凊理面ず該蒞気ずを察面接觊させるこずのみで目
的の凊理を完了させるこずができるので、この堎
合には基板ずしおたずえば暹脂等の裏打ちが斜こ
されおいない金属板を䜿甚するこずができるずい
う利点が䞎えられる。
Specific treatment methods for removing silicone from the non-protective layer using a silicone etching agent include dipping, coating, spraying, etc. According to this method, the desired treatment can be completed simply by bringing the surface to be treated and the vapor into face-to-face contact, so in this case, the substrate may be lined with, for example, resin. The advantage is that uncoated metal sheets can be used.

シリコヌン局の膜厚は前蚘したように、〜
20Ό皋床のうすい被膜であるので、䞊蚘シリコ
ヌン蝕刻剀による凊理で非保護局郚分のシリコヌ
ンが容易に陀去され、画線郚むンキ受理郚
が圢成される。
As mentioned above, the thickness of the silicone layer 2 is 1 to 1.
Since it is a thin film of about 20 ÎŒm, the silicone in the non-protective layer is easily removed by the treatment with the silicone etchant, and the image area (ink receiving area) 3
is formed.

぀ぎに、保護局を取り陀くには、垂販品ホト
レゞストを䜿甚した堎合には適圓な溶剀を甚いお
これを溶解ないし剥離陀去する手段によればよ
く、たずえばシツプレヌ瀟補ホトレゞストAZで
はアセトン、メチル゚チルケトン等を、たた東京
応化補TPRでぱチルセロ゜ルブ等を、さらに
スクリヌン印刷でのレゞスト局ではトル゚ン等を
䜿甚するこずにより容易に剥離ないし溶解陀去す
るこずができる。匷酞や匷アルカリはシリコヌン
の局たで䟵しおしたうのでこれらの䜿甚は避ける
べきである。なお、シリコヌンは䞀般に他物質ず
の接着が匱いずいう衚面特性を有しおいるので、
保護局は適圓な接着テヌプを甚いお剥すこずも
できる。
Next, in order to remove the protective layer 4, if a commercially available photoresist is used, it may be dissolved or peeled off using an appropriate solvent. It can be easily peeled off or dissolved by using ethyl cellosolve, etc. for Tokyo Ohka TPR, and toluene, etc. for screen printing resist layers. Strong acids and strong alkalis should be avoided as they will attack the silicone layer. In addition, silicone generally has surface characteristics that make it weakly bonded to other substances, so
The protective layer 4 can also be removed using a suitable adhesive tape.

このようにしお保護局を取り陀くこずにより
レゞストの解像力がほがそのたた再珟された非画
線郚むンキ反発郚′が圢成される。
By removing the protective layer 4 in this manner, a non-image area (ink repelling area) 2' is formed in which the resolution of the resist is reproduced almost as is.

以䞊述べた本発明の補造方法により前蚘した(1)
〜(5)の泚目すべき利点が䞎えられるが、さらには
この平版印刷甚刷版は湿し氎を必芁ずしない刷版
であるため、ブランケツトを介さずに盎接被印刷
䜓に印刷するこずが可胜であり、掻版印刷機に取
り付けお印刷するこずができ、これによれば埓来
の掻版印刷におけるごずく印圧のむら取りに芁す
る䜜業が回避され、解像性のすぐれた印刷物が埗
られるずいう利点が䞎えられる。
The above-mentioned (1) is achieved by the manufacturing method of the present invention described above.
This lithographic printing plate does not require dampening water, so it can be printed directly onto the printing material without using a blanket. It is possible to print by attaching it to a letterpress printing machine, which has the advantage of avoiding the work required to smooth out uneven printing pressure as in conventional letterpress printing, and producing printed matter with excellent resolution. Given.

぀ぎに、実斜䟋をあげお本発明をさらに具䜓的
に説明する。
Next, the present invention will be explained in more detail with reference to Examples.

実斜䟋  裏面が゚ポキシ暹脂でコヌテむングしおある脱
脂掗浄されたアルミニりム板䞊に、ゞメチルポリ
シロキサン信越化孊瀟補、KS−705Fを也燥
硬化埌の膜厚がΌになるように塗垃し、也燥
硬化しおシリコヌン局を圢成し、この䞊に界面掻
性剀3M瀟補、FC−431を重量添加した
ホトレゞスト液シツプレヌ瀟補、AZ−111を
也燥埌の膜厚がΌになるように回転塗垃法で
塗垃し也燥した。
Example 1 Dimethylpolysiloxane (manufactured by Shin-Etsu Chemical Co., Ltd., KS-705F) was applied to a degreased and cleaned aluminum plate whose back surface was coated with epoxy resin so that the film thickness after drying and curing was 5 ÎŒm. A silicone layer was formed by drying and curing, and on top of this a photoresist solution (AZ-111, manufactured by Shippray) containing 1% by weight of a surfactant (FC-431, manufactured by 3M) was applied to form a silicone layer with a film thickness of 3 ÎŒm after drying. It was applied using a spin coating method and dried.

぀ぎに、ネガ原版を密着させお露光珟像するこ
ずによりシリコヌン局䞊にレゞスト画像保護
局を圢成した埌、これを塩酞䞭に宀枩にお
10分間浞挬凊理しお非保護局郚分のシリコヌン局
を陀去し、氎掗也燥し、぀いで保護局をアセトン
により剥膜し、平版印刷甚刷版を埗た。
Next, a resist image (protective layer) is formed on the silicone layer by exposing and developing the negative original plate, and then placing it in 7% hydrochloric acid at room temperature.
The non-protective silicone layer was removed by immersion treatment for 10 minutes, washed with water and dried, and then the protective layer was removed with acetone to obtain a lithographic printing plate.

この刷版は䞇枚の耐刷力を瀺した。 This printing plate showed a printing durability of 50,000 sheets.

実斜䟋  前䟋ず同様にしおアルミニりム板ただしアル
ミニりム板は暹脂等による裏面コヌテむングは斜
しおない䞊にシリコヌン局およびその䞊にレゞ
スト画像を圢成した埌、これを35塩酞より発生
する塩化氎玠蒞気で宀枩にお分間凊理しお非保
護局郚分のシリコヌン局を陀去し、氎掗也燥し、
぀いで保護局をアセトンにより剥膜し、平版印刷
甚刷版を埗た。
Example 2 After forming a silicone layer and a resist image on an aluminum plate in the same manner as in the previous example (however, the aluminum plate was not coated with a resin or the like on the back side), it was treated with hydrogen chloride generated from 35% hydrochloric acid. The non-protective silicone layer was removed by steam treatment at room temperature for 3 minutes, washed with water and dried,
The protective layer was then removed with acetone to obtain a lithographic printing plate.

この刷版は䞇枚以䞊の耐刷力を瀺した。 This printing plate showed a printing durability of over 50,000 sheets.

実斜䟋  ポリ゚ステルフむルムを裏面にラミネヌトした
銅板䞊にゞメチルポリシロキサン信越化孊瀟
補、KS−774を也燥硬化埌の膜厚がΌにな
るように塗垃し、也燥硬化しおシリコヌン局を圢
成し、この䞊にホトレゞスト液東京応化補、
TPRを也燥埌の膜厚がΌになるように回
転塗垃法で塗垃し也燥した。
Example 3 Dimethylpolysiloxane (manufactured by Shin-Etsu Chemical Co., Ltd., KS-774) was applied to a copper plate with a polyester film laminated on the back side so that the film thickness after drying and curing was 5 ÎŒm, and the film was dried and cured to form a silicone layer. Then apply a photoresist solution (manufactured by Tokyo Ohka Co., Ltd.) on top of this.
TPR) was applied by spin coating to a dry film thickness of 3 ÎŒm and dried.

぀ぎにポゞ原版を密着させお露光珟像するこず
によりシリコヌン局䞊にレゞスト画像保護局
を圢成した埌、これを塩化第鉄氎溶液䞭に
宀枩にお分間浞挬凊理しお非保護局郚分のシリ
コヌン局を陀去し、氎掗也燥し、぀いで保護局を
゚チルセロ゜ルブアセテヌトにより剥膜し、平版
印刷甚刷版を埗た。
Next, a resist image (protective layer) is formed on the silicone layer by exposing and developing the positive master plate.
After forming this, it was immersed in a 5% ferric chloride aqueous solution at room temperature for 5 minutes to remove the silicone layer on the non-protective layer, washed with water and dried, and then the protective layer was peeled off with ethyl cellosolve acetate. A printing plate for lithographic printing was obtained.

この刷版は䞇枚の耐刷力を瀺した。 This printing plate showed a printing durability of 30,000 sheets.

実斜䟋  実斜䟋ず同様なアルミニりム板䞊にゞメチル
ポリシロキサン信越化孊瀟補、KE−45RTV
を也燥硬化埌の膜厚がΌになるように塗垃
し、也燥硬化しおシリコヌン局を圢成し、この䞊
に実斜䟋で䜿甚したず同様のホトレゞスト液を
塗垃也燥埌、写真補版によりパタヌン化を行぀
た。぀いでこのものに硝酞を宀枩にお分間
スプレヌがけ凊理するこずにより非保護局郚分の
シリコヌン局を陀去し、氎掗也燥した埌、保護局
をアセトンにより剥膜し、平版印刷甚刷版を埗
た。
Example 4 Dimethylpolysiloxane (manufactured by Shin-Etsu Chemical Co., Ltd., KE-45RTV) was placed on an aluminum plate similar to Example 1.
was applied so that the film thickness after drying and curing was 3 ÎŒm, drying and curing to form a silicone layer, and on top of this a photoresist solution similar to that used in Example 1 was applied and after drying, it was patterned by photolithography. I went there. Next, the silicone layer on the non-protective layer was removed by spraying 5% nitric acid at room temperature for 3 minutes, washed with water and dried, and the protective layer was removed with acetone to form a lithographic printing plate. Obtained.

この刷版は䞇枚以䞊の良奜な耐刷力を瀺し
た。
This printing plate showed good printing durability of 50,000 sheets or more.

実斜䟋  実斜䟋ず同様なアルミニりム板䞊に同䟋ず同
じようにシリコヌン局およびその䞊にレゞスト画
像を圢成した埌、これを塩酞䞭に25℃分間
浞挬凊理しお非保護局郚分のシリコヌン局を陀去
し、氎掗也燥した。぀いで保護局を粘着テヌプ
日東電工瀟補、玙粘着テヌプを䜿甚しお剥膜
し、平版印刷甚刷版を埗た。
Example 5 After forming a silicone layer and a resist image thereon in the same manner as in Example 1 on an aluminum plate similar to Example 1, this was immersed in 5% hydrochloric acid at 25°C for 5 minutes to form a non-protective layer. The silicone layer was removed from the area, washed with water and dried. The protective layer was then peeled off using adhesive tape (manufactured by Nitto Denko Corporation, paper adhesive tape) to obtain a printing plate for lithographic printing.

この刷版は、ブランケツトを介さず、盎接被印
刷䜓に印刷したずころ、䞇枚の良奜な印刷物が
埗られた。
When this printing plate was printed directly onto a printing material without using a blanket, 30,000 good prints were obtained.

実斜䟋  実斜䟋ず同様な銅板䞊にゞメチルポリシロキ
サンKS−705Fを也燥硬化埌の膜厚がΌ
になるように塗垃し、也燥硬化しおシリコヌン局
を圢成した。぀ぎにこのシリコヌン局䞊に、゚チ
ルセルロヌスずパむンオむルを䞻成分ずするスク
リヌンオむル20重量郚ずガラスフリツト80重量郹
からなるスクリヌンむンキを甚いおあらかじめ準
備しおあ぀たシルクスクリヌン版で印刷を斜した
埌、これを塩酞䞭で25℃分間浞挬凊理しお
スクリヌンむンキレゞスト郚分以倖のシリコヌン
局を陀去し、氎掗也燥し、぀いでスクリヌンむン
キレゞスト局を剥離し、平版印刷甚刷版を埗た。
Example 6 The film thickness after drying and curing of dimethylpolysiloxane (KS-705F) was 5 ÎŒm on the same copper plate as in Example 2.
The silicone layer was formed by drying and curing. Next, on this silicone layer, printing was performed using a silk screen plate prepared in advance using a screen ink consisting of 20 parts by weight of screen oil mainly composed of ethyl cellulose and pine oil and 80 parts by weight of glass frit. This was immersed in 3% hydrochloric acid at 25° C. for 5 minutes to remove the silicone layer other than the screen ink resist portion, washed with water and dried, and then the screen ink resist layer was peeled off to obtain a lithographic printing plate.

この刷版はブランケツトを介さず、盎接被印刷
䜓に印刷したずころ、䞇枚の良奜な印刷物が埗
られた。
When this printing plate was printed directly onto a printing material without using a blanket, 30,000 good prints were obtained.

実斜䟋  厚さ0.1mmのポリ゚ステルフむルムにアルミ箔
䞊にゞメチルポリシロキサンKS−774を也燥
硬化埌の膜厚がΌになるように塗垃し、也燥
硬化しおシリコヌン局を圢成し、この䞊にホトレ
ゞスト液富士薬品補、FSR FC−431 添
加を也燥埌の膜厚がΌになるように回転塗
垃法で塗垃也燥した。
Example 7 Dimethylpolysiloxane (KS-774) was applied on aluminum foil to a polyester film with a thickness of 0.1 mm so that the film thickness after drying and curing was 5 ÎŒm, and the silicone layer was formed by drying and curing. A photoresist solution (manufactured by Fuji Yakuhin, FSR FC-431 with 2% addition) was applied on top by a spin coating method and dried so that the film thickness after drying was 3 ÎŒm.

぀ぎに、ポゞ原版を密着し、写真補版法により
パタヌン化を行぀た。぀いでこのものを氎酞
化ナトリりム䞭に宀枩にお分間凊理するこずに
より非保護局郚分のシリコヌン局を埐去し、氎掗
也燥した埌、ホトレゞスト局を剥膜し、平版印刷
甚刷版を埗た。
Next, a positive master plate was attached and patterned using photolithography. Next, this material was treated in 5% sodium hydroxide at room temperature for 5 minutes to gradually remove the silicone layer on the non-protective layer, washed with water and dried, the photoresist layer was peeled off, and a lithographic printing plate was prepared. Obtained.

この刷版は、䞇枚の耐刷力を瀺した。 This printing plate showed a printing durability of 10,000 sheets.

【図面の簡単な説明】[Brief explanation of the drawing]

第図〜第図は本発明の方法により平版印刷
版を補造する各工皋の抂略郚分断面構造を瀺した
ものである。   基板、  シリコヌン局、  基板
露出面からなる画線郚、  パタヌン化された
保護局、′  非画線郚を構成するシリコヌン
局。
FIGS. 1 to 4 show schematic partial cross-sectional structures of each step of manufacturing a lithographic printing plate by the method of the present invention. DESCRIPTION OF SYMBOLS 1...Substrate, 2...Silicone layer, 3...An image area consisting of the exposed surface of the substrate, 4...A patterned protective layer, 2'...A silicone layer constituting a non-image area.

Claims (1)

【特蚱請求の範囲】[Claims]  基板の衚面に、シリコヌン局およびそのシリ
コヌン局䞊にパタヌン化された保護局を順次圢成
し、぀いでシリコヌン蝕刻剀で凊理しお非保護局
郚分のシリコヌン局を陀去した埌該保護局を取り
陀くこずにより、基板䞊に該基板露出面からなる
画線郚ずシリコヌン局からなる非画線郚ずを圢成
するこずを特城ずする平版印刷版の補造方法。
1. Sequentially forming a silicone layer and a patterned protective layer on the silicone layer on the surface of the substrate, then treating with a silicone etchant to remove the silicone layer in the non-protective layer portion, and then removing the protective layer. A method for producing a lithographic printing plate, comprising forming on a substrate an image area consisting of the exposed surface of the substrate and a non-image area consisting of a silicone layer.
JP13262379A 1979-10-15 1979-10-15 Preparation of lithographic printing form Granted JPS5656864A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13262379A JPS5656864A (en) 1979-10-15 1979-10-15 Preparation of lithographic printing form

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13262379A JPS5656864A (en) 1979-10-15 1979-10-15 Preparation of lithographic printing form

Publications (2)

Publication Number Publication Date
JPS5656864A JPS5656864A (en) 1981-05-19
JPS6154221B2 true JPS6154221B2 (en) 1986-11-21

Family

ID=15085643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13262379A Granted JPS5656864A (en) 1979-10-15 1979-10-15 Preparation of lithographic printing form

Country Status (1)

Country Link
JP (1) JPS5656864A (en)

Also Published As

Publication number Publication date
JPS5656864A (en) 1981-05-19

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