JPS56137624A - Forming of cross pattern electrode - Google Patents
Forming of cross pattern electrodeInfo
- Publication number
- JPS56137624A JPS56137624A JP4089480A JP4089480A JPS56137624A JP S56137624 A JPS56137624 A JP S56137624A JP 4089480 A JP4089480 A JP 4089480A JP 4089480 A JP4089480 A JP 4089480A JP S56137624 A JPS56137624 A JP S56137624A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- line
- pattern electrode
- cross pattern
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4089480A JPS56137624A (en) | 1980-03-28 | 1980-03-28 | Forming of cross pattern electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4089480A JPS56137624A (en) | 1980-03-28 | 1980-03-28 | Forming of cross pattern electrode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56137624A true JPS56137624A (en) | 1981-10-27 |
| JPH0222537B2 JPH0222537B2 (enrdf_load_stackoverflow) | 1990-05-18 |
Family
ID=12593209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4089480A Granted JPS56137624A (en) | 1980-03-28 | 1980-03-28 | Forming of cross pattern electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56137624A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03502748A (ja) * | 1987-12-23 | 1991-06-20 | ブリテツシユ・テレコミユニケイシヨンズ・パブリツク・リミテツド・カンパニー | 光学装置用の支持桟構 |
-
1980
- 1980-03-28 JP JP4089480A patent/JPS56137624A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03502748A (ja) * | 1987-12-23 | 1991-06-20 | ブリテツシユ・テレコミユニケイシヨンズ・パブリツク・リミテツド・カンパニー | 光学装置用の支持桟構 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0222537B2 (enrdf_load_stackoverflow) | 1990-05-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE43028T1 (de) | Verfahren zum herstellen einer schichtstruktur. | |
| GB2000197B (en) | Method of producing a solderable conductive layer on a substrate | |
| GB1537634A (en) | Method of making a negative mask on a substrate | |
| JPS53133236A (en) | Method of forming multiicoating layers on substrate surface | |
| JPS51136538A (en) | Method of forming thin film having desired pattern on substrate | |
| GB1522580A (en) | Metallizing a substrate | |
| DK0664016T3 (da) | Fremgangsmåde til fremstilling og anvendelse af en serigrafiskabelon med ophøjede kanter | |
| GB2034526B (en) | Method for forming an electrode pattern on a substrate | |
| JPS52116738A (en) | Method of depositing metal on surface of nonnelectroconductive substrate | |
| DE3063170D1 (en) | Lithographic resist composition for use in a method of forming a film on a substrate | |
| MX146945A (es) | Metodo mejorado para revestir un subestrato metalico | |
| DE3268140D1 (en) | A method of forming a patterned photoresist layer | |
| DE3064426D1 (en) | A method of applying a layer in accordance with a pattern on a substrate | |
| JPS56137624A (en) | Forming of cross pattern electrode | |
| JPS54122878A (en) | Method of forming pattern on substrate | |
| JPS52153673A (en) | Method of manufacturing mask for xxray lithography | |
| GB2088412B (en) | Method of fabricating a metallic pattern on a substrate | |
| JPS53147531A (en) | Forming method for thin film pattern | |
| JPS56137623A (en) | Forming of cross pattern electrode | |
| JPS56137622A (en) | Forming of cross pattern electrode | |
| JPS57116344A (en) | Exposure mask for thin layer engineering | |
| GB1554739A (en) | Method for the application of a layer onto a surface | |
| JPS57118641A (en) | Lifting-off method | |
| JPS5779166A (en) | Method for forming copper alloy layer and pattern on substrate and article made by said method | |
| JPS5421272A (en) | Metal photo mask |