JPS56112469A - Sputtering device - Google Patents
Sputtering deviceInfo
- Publication number
- JPS56112469A JPS56112469A JP1331280A JP1331280A JPS56112469A JP S56112469 A JPS56112469 A JP S56112469A JP 1331280 A JP1331280 A JP 1331280A JP 1331280 A JP1331280 A JP 1331280A JP S56112469 A JPS56112469 A JP S56112469A
- Authority
- JP
- Japan
- Prior art keywords
- tray
- thin film
- objects
- treated
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1331280A JPS56112469A (en) | 1980-02-06 | 1980-02-06 | Sputtering device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1331280A JPS56112469A (en) | 1980-02-06 | 1980-02-06 | Sputtering device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56112469A true JPS56112469A (en) | 1981-09-04 |
Family
ID=11829646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1331280A Pending JPS56112469A (en) | 1980-02-06 | 1980-02-06 | Sputtering device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56112469A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014173166A (ja) * | 2013-03-12 | 2014-09-22 | Panasonic Corp | スパッタ装置および太陽電池の製造方法 |
JP2019167618A (ja) * | 2018-03-22 | 2019-10-03 | 芝浦メカトロニクス株式会社 | 真空処理装置及びトレイ |
-
1980
- 1980-02-06 JP JP1331280A patent/JPS56112469A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014173166A (ja) * | 2013-03-12 | 2014-09-22 | Panasonic Corp | スパッタ装置および太陽電池の製造方法 |
JP2019167618A (ja) * | 2018-03-22 | 2019-10-03 | 芝浦メカトロニクス株式会社 | 真空処理装置及びトレイ |
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