JPS56111481A - Measuring device for electron beam diameter - Google Patents
Measuring device for electron beam diameterInfo
- Publication number
- JPS56111481A JPS56111481A JP642980A JP642980A JPS56111481A JP S56111481 A JPS56111481 A JP S56111481A JP 642980 A JP642980 A JP 642980A JP 642980 A JP642980 A JP 642980A JP S56111481 A JPS56111481 A JP S56111481A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- reflection coefficient
- beam diameter
- beryllium
- constitution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To enable to measure an electron beam diameter in safety and with high precision and excellent reproducibility by coating a beryllium substrate having a low electron beam reflection coefficient and by laminating a part of a thin aluminum layer with a heavy metal. CONSTITUTION:Circular beryllium substrate 1 low in electron beam reflection coefficient is coated with thin aluminum layer 2 having the same reflection coefficient. On part of this layer 2, heavy metal 52 high in electron beam reflection coefficient providing knife-edge action upon a moving electron beam in a measurement is laminated. In this constitution, beryllium which is a harmful substance is controlled in safety and the measurement is made posible for the electron beam diameter with high precision caused by a great difference in reflection coefficient and with excellent reproducibility by a knife edge having no flank change.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP642980A JPS56111481A (en) | 1980-01-23 | 1980-01-23 | Measuring device for electron beam diameter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP642980A JPS56111481A (en) | 1980-01-23 | 1980-01-23 | Measuring device for electron beam diameter |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56111481A true JPS56111481A (en) | 1981-09-03 |
Family
ID=11638141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP642980A Pending JPS56111481A (en) | 1980-01-23 | 1980-01-23 | Measuring device for electron beam diameter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56111481A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5821581A (en) * | 1981-07-31 | 1983-02-08 | Toshiba Corp | Measurement of electron beam diameter |
CN104267426A (en) * | 2014-09-04 | 2015-01-07 | 北京大学 | Electronic beam spot measuring method and device |
-
1980
- 1980-01-23 JP JP642980A patent/JPS56111481A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5821581A (en) * | 1981-07-31 | 1983-02-08 | Toshiba Corp | Measurement of electron beam diameter |
CN104267426A (en) * | 2014-09-04 | 2015-01-07 | 北京大学 | Electronic beam spot measuring method and device |
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