JPS56111224A - X ray exposuring device - Google Patents
X ray exposuring deviceInfo
- Publication number
- JPS56111224A JPS56111224A JP1122580A JP1122580A JPS56111224A JP S56111224 A JPS56111224 A JP S56111224A JP 1122580 A JP1122580 A JP 1122580A JP 1122580 A JP1122580 A JP 1122580A JP S56111224 A JPS56111224 A JP S56111224A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- positioning
- mask
- marks
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To make it possible to copy a very fine pattern below a micron with high precision in an X ray exposure, by detecting X rays amount radiated by bridge type detector and positioning. CONSTITUTION:Positioning marks 34 on a wafer 33 correspond to positioning marks 32 on a mask 31. Output pulses 36, 36' output proportionally with radiated X rays by proportional counters 35, 35' are input 39, 39' through capacity 37, 37' to bridge circuit by resistances R1-R4. When positioning is not matched, a galvanometer 40 runs to return the pulses to the driving system of the wafer for rectifying. With such an arrangement, such thicker positioning marks as have been hitherto employed for higher resolution and greater contrast can be spared. Further, the precision of positions of the positioning marks on both the mask and wafer is not requested, because this is the method where the X rays penetrating the marks on both of the mask and the wafer is compared. Because the X ray source, the positions where the mask and wafer are mounted and the positioning part in this device are fixed in a series of exposure, copying of fine pattern below a micron can be made possible.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1122580A JPS56111224A (en) | 1980-02-01 | 1980-02-01 | X ray exposuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1122580A JPS56111224A (en) | 1980-02-01 | 1980-02-01 | X ray exposuring device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56111224A true JPS56111224A (en) | 1981-09-02 |
Family
ID=11772008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1122580A Pending JPS56111224A (en) | 1980-02-01 | 1980-02-01 | X ray exposuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56111224A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53144681A (en) * | 1977-05-20 | 1978-12-16 | Siemens Ag | Method of relatively positioning projecting mask and semiconductor wafer |
-
1980
- 1980-02-01 JP JP1122580A patent/JPS56111224A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53144681A (en) * | 1977-05-20 | 1978-12-16 | Siemens Ag | Method of relatively positioning projecting mask and semiconductor wafer |
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