JPS56107556A - Setting device of exposure position - Google Patents

Setting device of exposure position

Info

Publication number
JPS56107556A
JPS56107556A JP982780A JP982780A JPS56107556A JP S56107556 A JPS56107556 A JP S56107556A JP 982780 A JP982780 A JP 982780A JP 982780 A JP982780 A JP 982780A JP S56107556 A JPS56107556 A JP S56107556A
Authority
JP
Japan
Prior art keywords
mask
wafer
amount
substrate
print gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP982780A
Other languages
Japanese (ja)
Inventor
Shinichi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP982780A priority Critical patent/JPS56107556A/en
Publication of JPS56107556A publication Critical patent/JPS56107556A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To provide exposure with high resolving power by a method wherein, in connection with a mechanism for setting the amount of a print gap during the process of manufacturing a semiconductor, parallel beams are applied in between a substrate coated with photoresist and a mask, and the change of the volume of beams is detected by moving the substrate or the mask in order to set the most suitable amount of a print gap, allowing the mechanism to maintain the value. CONSTITUTION:In a proximity exposure device for setting the amount of a print gap between a semiconductor substrate and a photomask, a beam generating means 1 is arranged on one side of a mask provided in the direction opposite to a wafer 5 coated with photoresist 6. A beam 2 is applied to the portion in almost nearly parallel with that between the wafer 5 and the mask 4 to move the wafer or the mask and detect the amount of light of the beam with a detecting means 3, and the wafer or the mask is stopped where the most suitable amount of the gap has been set. By so doing, a proximate condition becomes available, while definition is improved, so that minute processing can be carried out.
JP982780A 1980-01-29 1980-01-29 Setting device of exposure position Pending JPS56107556A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP982780A JPS56107556A (en) 1980-01-29 1980-01-29 Setting device of exposure position

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP982780A JPS56107556A (en) 1980-01-29 1980-01-29 Setting device of exposure position

Publications (1)

Publication Number Publication Date
JPS56107556A true JPS56107556A (en) 1981-08-26

Family

ID=11730959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP982780A Pending JPS56107556A (en) 1980-01-29 1980-01-29 Setting device of exposure position

Country Status (1)

Country Link
JP (1) JPS56107556A (en)

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