JPS56103440A - Apparatus for treating semiconductor substrate - Google Patents

Apparatus for treating semiconductor substrate

Info

Publication number
JPS56103440A
JPS56103440A JP657280A JP657280A JPS56103440A JP S56103440 A JPS56103440 A JP S56103440A JP 657280 A JP657280 A JP 657280A JP 657280 A JP657280 A JP 657280A JP S56103440 A JPS56103440 A JP S56103440A
Authority
JP
Japan
Prior art keywords
cassette
substrate
conveyor
pin
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP657280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6131611B2 (enrdf_load_stackoverflow
Inventor
Seiji Imanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP657280A priority Critical patent/JPS56103440A/ja
Publication of JPS56103440A publication Critical patent/JPS56103440A/ja
Publication of JPS6131611B2 publication Critical patent/JPS6131611B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chutes (AREA)
  • Feeding Of Articles To Conveyors (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP657280A 1980-01-21 1980-01-21 Apparatus for treating semiconductor substrate Granted JPS56103440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP657280A JPS56103440A (en) 1980-01-21 1980-01-21 Apparatus for treating semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP657280A JPS56103440A (en) 1980-01-21 1980-01-21 Apparatus for treating semiconductor substrate

Publications (2)

Publication Number Publication Date
JPS56103440A true JPS56103440A (en) 1981-08-18
JPS6131611B2 JPS6131611B2 (enrdf_load_stackoverflow) 1986-07-21

Family

ID=11642042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP657280A Granted JPS56103440A (en) 1980-01-21 1980-01-21 Apparatus for treating semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS56103440A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5850740A (ja) * 1981-09-21 1983-03-25 Hitachi Ltd 半導体処理装置
US4694527A (en) * 1983-07-06 1987-09-22 Fujitsu Limited Mask washing apparatus for production of integrated circuit
CN105157388A (zh) * 2015-10-12 2015-12-16 苏州达恩克精密机械有限公司 芯片组装机的芯片传送烘干装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5850740A (ja) * 1981-09-21 1983-03-25 Hitachi Ltd 半導体処理装置
US4694527A (en) * 1983-07-06 1987-09-22 Fujitsu Limited Mask washing apparatus for production of integrated circuit
CN105157388A (zh) * 2015-10-12 2015-12-16 苏州达恩克精密机械有限公司 芯片组装机的芯片传送烘干装置

Also Published As

Publication number Publication date
JPS6131611B2 (enrdf_load_stackoverflow) 1986-07-21

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