JPS5595946A - Developer for o-quinone diazide type photosensitive material - Google Patents

Developer for o-quinone diazide type photosensitive material

Info

Publication number
JPS5595946A
JPS5595946A JP348979A JP348979A JPS5595946A JP S5595946 A JPS5595946 A JP S5595946A JP 348979 A JP348979 A JP 348979A JP 348979 A JP348979 A JP 348979A JP S5595946 A JPS5595946 A JP S5595946A
Authority
JP
Japan
Prior art keywords
developer
polymer
type photosensitive
quinone diazide
water soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP348979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6113217B2 (enrdf_load_stackoverflow
Inventor
Yoshihiro Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP348979A priority Critical patent/JPS5595946A/ja
Publication of JPS5595946A publication Critical patent/JPS5595946A/ja
Publication of JPS6113217B2 publication Critical patent/JPS6113217B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP348979A 1979-01-16 1979-01-16 Developer for o-quinone diazide type photosensitive material Granted JPS5595946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP348979A JPS5595946A (en) 1979-01-16 1979-01-16 Developer for o-quinone diazide type photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP348979A JPS5595946A (en) 1979-01-16 1979-01-16 Developer for o-quinone diazide type photosensitive material

Publications (2)

Publication Number Publication Date
JPS5595946A true JPS5595946A (en) 1980-07-21
JPS6113217B2 JPS6113217B2 (enrdf_load_stackoverflow) 1986-04-12

Family

ID=11558742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP348979A Granted JPS5595946A (en) 1979-01-16 1979-01-16 Developer for o-quinone diazide type photosensitive material

Country Status (1)

Country Link
JP (1) JPS5595946A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60158442A (ja) * 1983-12-24 1985-08-19 チバ―ガイギー　アクチエンゲゼルシヤフト ポジ型フオトレジスト用現像剤
EP0732628A1 (en) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition
EP1338415A2 (en) 2002-02-21 2003-08-27 Fuji Photo Film Co., Ltd. Method for preparing lithographic printing plate
EP1584984A1 (en) 2004-04-06 2005-10-12 Fuji Photo Film Co., Ltd. Method for replenishing developer in an automatic developing machine for photosensitive lithographic printing plate
EP2354854A1 (en) 2002-09-20 2011-08-10 FUJIFILM Corporation Method of making lithographic printing plate
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60158442A (ja) * 1983-12-24 1985-08-19 チバ―ガイギー　アクチエンゲゼルシヤフト ポジ型フオトレジスト用現像剤
EP0732628A1 (en) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate
US5670294A (en) * 1995-03-07 1997-09-23 Imation Corp Aqueous alkaline solution for developing offset printing plates
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP1338415A2 (en) 2002-02-21 2003-08-27 Fuji Photo Film Co., Ltd. Method for preparing lithographic printing plate
EP2354854A1 (en) 2002-09-20 2011-08-10 FUJIFILM Corporation Method of making lithographic printing plate
EP1584984A1 (en) 2004-04-06 2005-10-12 Fuji Photo Film Co., Ltd. Method for replenishing developer in an automatic developing machine for photosensitive lithographic printing plate

Also Published As

Publication number Publication date
JPS6113217B2 (enrdf_load_stackoverflow) 1986-04-12

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