JPS5595946A - Developer for o-quinone diazide type photosensitive material - Google Patents
Developer for o-quinone diazide type photosensitive materialInfo
- Publication number
- JPS5595946A JPS5595946A JP348979A JP348979A JPS5595946A JP S5595946 A JPS5595946 A JP S5595946A JP 348979 A JP348979 A JP 348979A JP 348979 A JP348979 A JP 348979A JP S5595946 A JPS5595946 A JP S5595946A
- Authority
- JP
- Japan
- Prior art keywords
- developer
- polymer
- type photosensitive
- quinone diazide
- water soluble
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Abstract
PURPOSE:To obtain a developer having high developing power and exhibiting superior stability in image reproduction even in high-temp. long-time development by blending a water soluble cationic polymer into an equeous solution of a specified alkali as a developer for an o-quinone diazide type photosensitive materal. CONSTITUTION:About 0.001-3wt% of a water soluble cationic polymer having an MW of about 1000-200000 is added to an aqueous solution containing an alkaline substance such caustic soda, caustic potash, tertiary sodium phosphate, tertiary postssium pbosphate or sodium silicate to prepare a developer. The solution has an alkali concentration of about 0.3-2.5wt% as Na2O and an SiO2 concentration of about 0.4-2.5wt%. The above-mentioned polymer used is usually of quaternary ammonium salt type, and it may be a polymer containing a quaternary compound of trialkylamine and vinylbenzyl chloride or a cyclized polymer of dialkyldiallylammonium halide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP348979A JPS5595946A (en) | 1979-01-16 | 1979-01-16 | Developer for o-quinone diazide type photosensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP348979A JPS5595946A (en) | 1979-01-16 | 1979-01-16 | Developer for o-quinone diazide type photosensitive material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5595946A true JPS5595946A (en) | 1980-07-21 |
JPS6113217B2 JPS6113217B2 (en) | 1986-04-12 |
Family
ID=11558742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP348979A Granted JPS5595946A (en) | 1979-01-16 | 1979-01-16 | Developer for o-quinone diazide type photosensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5595946A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60158442A (en) * | 1983-12-24 | 1985-08-19 | チバ―ガイギー アクチエンゲゼルシヤフト | Developer for positive type photoresist |
EP0732628A1 (en) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Aqueous alkaline solution for developing offset printing plate |
EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
EP1338415A2 (en) | 2002-02-21 | 2003-08-27 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
EP1584984A1 (en) | 2004-04-06 | 2005-10-12 | Fuji Photo Film Co., Ltd. | Method for replenishing developer in an automatic developing machine for photosensitive lithographic printing plate |
EP2354854A1 (en) | 2002-09-20 | 2011-08-10 | FUJIFILM Corporation | Method of making lithographic printing plate |
EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
-
1979
- 1979-01-16 JP JP348979A patent/JPS5595946A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60158442A (en) * | 1983-12-24 | 1985-08-19 | チバ―ガイギー アクチエンゲゼルシヤフト | Developer for positive type photoresist |
EP0732628A1 (en) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Aqueous alkaline solution for developing offset printing plate |
US5670294A (en) * | 1995-03-07 | 1997-09-23 | Imation Corp | Aqueous alkaline solution for developing offset printing plates |
EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
EP1338415A2 (en) | 2002-02-21 | 2003-08-27 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
EP2354854A1 (en) | 2002-09-20 | 2011-08-10 | FUJIFILM Corporation | Method of making lithographic printing plate |
EP1584984A1 (en) | 2004-04-06 | 2005-10-12 | Fuji Photo Film Co., Ltd. | Method for replenishing developer in an automatic developing machine for photosensitive lithographic printing plate |
Also Published As
Publication number | Publication date |
---|---|
JPS6113217B2 (en) | 1986-04-12 |
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