JPS6113217B2 - - Google Patents
Info
- Publication number
- JPS6113217B2 JPS6113217B2 JP348979A JP348979A JPS6113217B2 JP S6113217 B2 JPS6113217 B2 JP S6113217B2 JP 348979 A JP348979 A JP 348979A JP 348979 A JP348979 A JP 348979A JP S6113217 B2 JPS6113217 B2 JP S6113217B2
- Authority
- JP
- Japan
- Prior art keywords
- developer
- quinonediazide
- weight
- photosensitive
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 11
- 239000007864 aqueous solution Substances 0.000 claims description 10
- 229920006317 cationic polymer Polymers 0.000 claims description 7
- 239000004480 active ingredient Substances 0.000 claims description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 7
- 238000011161 development Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 229920001568 phenolic resin Polymers 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 4
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 4
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- GQOKIYDTHHZSCJ-UHFFFAOYSA-M dimethyl-bis(prop-2-enyl)azanium;chloride Chemical compound [Cl-].C=CC[N+](C)(C)CC=C GQOKIYDTHHZSCJ-UHFFFAOYSA-M 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229940050176 methyl chloride Drugs 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 125000005270 trialkylamine group Chemical group 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- MHOFGBJTSNWTDT-UHFFFAOYSA-M 2-[n-ethyl-4-[(6-methoxy-3-methyl-1,3-benzothiazol-3-ium-2-yl)diazenyl]anilino]ethanol;methyl sulfate Chemical compound COS([O-])(=O)=O.C1=CC(N(CCO)CC)=CC=C1N=NC1=[N+](C)C2=CC=C(OC)C=C2S1 MHOFGBJTSNWTDT-UHFFFAOYSA-M 0.000 description 1
- QLIBJPGWWSHWBF-UHFFFAOYSA-N 2-aminoethyl methacrylate Chemical compound CC(=C)C(=O)OCCN QLIBJPGWWSHWBF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000008394 flocculating agent Substances 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
本発明はＯ―キノンジアジド系感光材料の改良
された現像液に関するものである。
Ｏ―キノンジアジド系化合物を含有する感光材
料（以下Ｏ―キノンジアジド系感光材料という）
は、ポジ―ポジ型の感光材料としてフオトレジス
トや感光性印刷版に広く用いられている。Ｏ―キ
ノンジアジド系感光材料は、他の感光材料同様、
その溶液を基板上に塗布し感光層を形成させるこ
とにより用いられる。Ｏ―キノンジアジド系化合
物は単独では成膜性が悪く、また形成された感光
層の強度及び基板との接着性も十分でない。この
ため、Ｏ―キノンジアジド系化合物とフエノール
ホルムアルデヒドノボラツク樹脂、クレゾールホ
ルムアルデヒドノボラツク樹脂等のアルカリ可溶
性樹脂との混合物、または前記樹脂若しくは多価
のフエノール樹脂とＯ―キノンジアジド系化合物
とを反応させた高分子量Ｏ―キノンジアジド含有
ポリマーが、Ｏ―キノンジアジド系感光材料とし
て用いられる。このようなＯ―キノンジアジド系
感光材料の現像液としては、一般に苛性ソーダ、
第三燐酸ソーダ、ケイ酸ソーダ等のアルカリ性物
質を含むアルカリ水溶液が用いられている。しか
し、苛性ソーダ、第三リン酸ソーダ等を含むアル
カリ水溶液は緩衝作用に乏しく、現像液としての
繰返し使用に対する安定性が低い。また基板がア
ルミニウム等の金属の場合、その表面に悪影響を
与えるという欠点を有する。一方、ケイ酸ソーダ
を含むアルカリ水溶液は前記したような欠点を有
さないが、その廃液処理の際に多量のケイ酸ゲル
が生成するという問題がある。勿論、現像液中の
SiO2の濃度を低くすればこの問題は解決できる
が、この場合はこの現像液の特徴を犠牲にしなけ
ればならない。このため低SiO2の現像液に界面
活性剤を添加する方法も検討されているが、十分
な効果を得ていない。
本発明者らは前記したような欠点のない現像液
を開発するために鋭意研究した結果、公知のアル
カリ水溶液現像液に特定のポリマーを含有させれ
ばよいことを見出し本発明に到達した。
すなわち、本発明の要旨とするところは水溶性
カチオニツクポリマーを含有するアルカリ水溶液
を有効成分とするＯ―キノンジアジド系感光材料
の現像液に存する。
以下、本発明を詳細に説明するに、本発明現像
液は水溶性カチオンニツクポリマーを含有する。
カチオニツクポリマーとしては、一般に帯電防止
剤、低抵抗処理剤、高分子凝集剤等に使用されて
いるものがいずれも使用できる。通常、４級アン
モニウム塩型のものが使用される。具体的には、
例えば、トリアルキルアミンのビニルベンジルク
ロライド四級化物を含む重合体、例えばｐ―ジメ
チルアミノメチルポリスチレンのメチルクロライ
ド４級化物（ダウケミカル社製、ECR―34）；
ジアルキルジアリルアンモニウムハロゲン化物の
環化重合体、例えばジメチルジアリルアンモニウ
ムクロライドの環化重合体（メルク社製、261―
LVF）；ジアルキルジアリルアンモニウムハロ
ゲン化物と二酸化硫黄との環化共重合体例えばジ
メチルジアリルアンモニウムクロライドと二酸化
硫黄との環化共重合体（日東紡社製、PAS―Ａ―
5LまたはPAS―Ａ―120）；トリアルキルアミン
のエピクロルヒドリン四級化物を含む重合体（大
日本色材社製、ダンスタツト（商標）ET―50ま
たはET―80）；ポリジアルキルアミノエチルア
クリレート、ポリジアルキルアミノエチルメタク
リレート等のメチルクロライド４級化物；ジアル
キルアミノエチルアクリレート、ジアルキルアミ
ノエチルメタクリレート等とアクリル酸メチルと
の共重合体が挙げられる。水溶性カチオニツクポ
リマーの分子量はとくに制限されないが、普通
1000〜200000の範囲である。現像液中の水溶液カ
チオニツクポリマーの濃度は通常の0.001〜３重
量％の範囲内である。
前記水溶液カチオニツクポリマーを、Ｏ―キノ
ンジアジド系感光材料の現像液として公知のアル
カリ水溶液に添加すれば、本発明現像液が得られ
る。このようなアルカリ水溶液は、苛性ソーダ、
苛性カリ、第三燐酸ソーダ、第三燐酸カリウム、
ケイ酸ソーダ等のアルカリ性物質を少なくとも一
種以上含有するものである。最も好適なアルカリ
水溶液はケイ酸ソーダと他のアルカリ性物質とく
に苛性ソーダ、第三燐酸ソーダ等との両者を含有
する水溶液である。このような水溶液においてア
ルカリの濃度は、Na2O換算で、普通、0.3〜2.5重
量％、好ましくは0.5〜2.0重量％の範囲である。
これに対応するSiO2濃度としては、普通、0.4〜
2.5重量％、好ましくは0.6〜2.0重量％の範囲であ
る。このSiO2濃度において廃液処理の際の問題
はほとんどない。
勿論、本発明現像液は、前記成分以外に、公知
の現像液に使用される種々の添加剤を含んでいて
もよい。また、本発明現像液による現像は常法に
従つて行なうことができる。
以上、本発明現像液について詳細に説明した
が、本発明現像液は次のような特徴を有する。
(1) 現像力が大である。
(2) 高温、長時間の現像においても画像再現の安
定性が高い。
(3) 高SiO2濃度現像液の特徴を有する低SiO2濃
度の、すなわち、廃液処理の問題のない現像液
を提供する。
次に本発明を実施例により更に具体的に説明す
るが、本発明はその要旨をこえない限り以下の実
施例に限定されるものではない。
実施例 １
ノボラツク型フエノールホルムアルデヒド樹脂
とナフトキノン―１，２―ジアジド―５―スルホ
ニルクロライドとの反応生成物１重量部、ノボラ
ツク型フエノールホルムアルデヒド樹脂５重量
部、及びクリスタルバイオレツト0.001重量部を
30重量部のエチレングリコールモノエチルエーテ
ルに溶解して感光液を調製した。これを砂目立て
した厚さ0.30mmのアルミ板上に回転塗布機を用い
て塗布し、乾燥後の膜厚を約25Kg/dm2とした。
この感光板にイーストマン・コダツク社製ステツ
プタブレツトNo.２及び網点チヤートをあてて、真
空下で密着し、１ｍ上からウシオ電機製の高圧水
銀灯ユニパルスで１分間露光した。（なお、露光
条件は現像液を使用した際のクリヤー段数が３
となるような条件を選択した。）次に、表１に示
す組成の現像液〜を用いて温度25℃、時間45
秒でバツト現像処理を行ない、その後、水洗、現
像インキもりをした。現像結果を表２に示した。
The present invention relates to an improved developer for O-quinonediazide-based light-sensitive materials. Photosensitive material containing an O-quinonediazide compound (hereinafter referred to as O-quinonediazide photosensitive material)
is widely used as a positive-positive photosensitive material in photoresists and photosensitive printing plates. O-quinonediazide-based photosensitive materials, like other photosensitive materials,
It is used by coating the solution on a substrate to form a photosensitive layer. O-quinonediazide compounds alone have poor film-forming properties, and the formed photosensitive layer does not have sufficient strength or adhesion to the substrate. For this reason, mixtures of O-quinonediazide-based compounds and alkali-soluble resins such as phenol formaldehyde novolak resins and cresol formaldehyde novolak resins, or mixtures of O-quinonediazide-based compounds made by reacting the above resins or polyvalent phenolic resins with O-quinonediazide-based compounds are available. A polymer containing molecular weight O-quinonediazide is used as an O-quinonediazide-based photosensitive material. Developers for such O-quinonediazide-based photosensitive materials generally include caustic soda,
An alkaline aqueous solution containing an alkaline substance such as sodium phosphate and sodium silicate is used. However, alkaline aqueous solutions containing caustic soda, tribasic sodium phosphate, etc. have poor buffering effect and have low stability for repeated use as a developer. Furthermore, when the substrate is made of metal such as aluminum, it has the disadvantage of adversely affecting its surface. On the other hand, alkaline aqueous solutions containing sodium silicate do not have the above-mentioned drawbacks, but there is a problem in that a large amount of silicic acid gel is produced when the waste liquid is treated. Of course, in the developer
Lowering the concentration of SiO 2 can solve this problem, but at the cost of sacrificing the characteristics of the developer. For this reason, a method of adding a surfactant to a low-SiO 2 developer has been considered, but it has not been sufficiently effective. The present inventors conducted intensive research to develop a developing solution free from the above-mentioned drawbacks, and as a result, they discovered that it is sufficient to incorporate a specific polymer into a known alkaline aqueous developer, and have arrived at the present invention. That is, the gist of the present invention resides in a developing solution for O-quinonediazide-based light-sensitive materials whose active ingredient is an alkaline aqueous solution containing a water-soluble cationic polymer. The present invention will be explained in detail below. The developer of the present invention contains a water-soluble cationic polymer.
As the cationic polymer, any of those generally used as antistatic agents, low resistance treatment agents, polymer flocculants, etc. can be used. Usually, a quaternary ammonium salt type is used. in particular,
For example, a polymer containing a vinylbenzyl chloride quaternized product of trialkylamine, such as a methyl chloride quaternized product of p-dimethylaminomethyl polystyrene (manufactured by Dow Chemical Company, ECR-34);
A cyclized polymer of dialkyldiallylammonium halide, such as a cyclized polymer of dimethyldiallylammonium chloride (manufactured by Merck & Co., Ltd., 261-
LVF); cyclized copolymer of dialkyldiallylammonium halide and sulfur dioxide; for example, cyclized copolymer of dimethyldiallylammonium chloride and sulfur dioxide (manufactured by Nittobo Co., Ltd., PAS-A-
5L or PAS-A-120); Polymer containing epichlorohydrin quaternized product of trialkylamine (manufactured by Dainippon Shikizai Co., Ltd., Danstat (trademark) ET-50 or ET-80); Polydialkylaminoethyl acrylate, polydialkyl Examples include quaternized methyl chloride products such as aminoethyl methacrylate; copolymers of dialkylaminoethyl acrylate, dialkylaminoethyl methacrylate, and methyl acrylate. The molecular weight of water-soluble cationic polymers is not particularly limited, but is usually
It ranges from 1000 to 200000. The concentration of aqueous cationic polymer in the developer solution is typically within the range of 0.001 to 3% by weight. The developer of the present invention can be obtained by adding the aqueous cationic polymer to an alkaline aqueous solution known as a developer for O-quinonediazide-based light-sensitive materials. Such alkaline aqueous solutions include caustic soda,
Caustic potash, tribasic sodium phosphate, tribasic potassium phosphate,
It contains at least one alkaline substance such as sodium silicate. The most preferred alkaline aqueous solution is an aqueous solution containing both sodium silicate and other alkaline substances, particularly caustic soda, tribasic sodium phosphate, and the like. The concentration of alkali in such an aqueous solution is usually in the range of 0.3 to 2.5% by weight, preferably 0.5 to 2.0% by weight, calculated as Na2O .
The corresponding SiO 2 concentration is usually 0.4~
2.5% by weight, preferably in the range 0.6-2.0% by weight. At this SiO 2 concentration, there are almost no problems in waste liquid treatment. Of course, the developer of the present invention may contain, in addition to the above-mentioned components, various additives used in known developers. Further, development using the developer of the present invention can be carried out according to a conventional method. The developer of the present invention has been described in detail above, and the developer of the present invention has the following characteristics. (1) High developing power. (2) High stability of image reproduction even during long-term development at high temperatures. (3) To provide a developer with a low SiO 2 concentration that has the characteristics of a high SiO 2 concentration developer, that is, without problems in waste liquid treatment. Next, the present invention will be explained in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist thereof. Example 1 1 part by weight of the reaction product of novolak type phenol formaldehyde resin and naphthoquinone-1,2-diazide-5-sulfonyl chloride, 5 parts by weight of novolak type phenol formaldehyde resin, and 0.001 part by weight of crystal violet.
A photosensitive solution was prepared by dissolving it in 30 parts by weight of ethylene glycol monoethyl ether. This was applied onto a grained aluminum plate with a thickness of 0.30 mm using a rotary coating machine, and the film thickness after drying was approximately 25 Kg/dm 2 .
A Step Tablet No. 2 manufactured by Eastman Kodak Co. and a halftone dot chart were applied to this photosensitive plate, and the plate was brought into close contact with the plate under vacuum, and exposed for 1 minute from 1 m above with a high-pressure mercury lamp Unipulse manufactured by Ushio Inc. (The exposure condition is that the number of clear steps when using a developer is 3.
We selected conditions such that ) Next, using a developer having the composition shown in Table 1, the temperature was 25°C and the time was 45°C.
A butt development process was performed in seconds, followed by washing with water and smearing the developing ink. The development results are shown in Table 2.
【表】【table】
【表】【table】
【表】
次に現像液〜の処理能力を比較したが、現
像液は安定に使える処理能力としては２m2/
であつた。これに対し現像液〜は、全て、３
m2/以上の処理能力を有していた。又、現像液
〜のいずれも処理後に塩酸で中和廃液処理を
したがSiO2のゲルは全く出なかつた。
実施例 ２
実施例１と同様に作製し、露光した感光性印刷
版を表３に示す組成の現像液〜で温度30℃、
時間90秒でバツト現像し、水洗、現像インキもり
した。その結果を表４に示した。[Table] Next, we compared the processing capacity of the developer ~, but the processing capacity of the developer that can be stably used is 2 m 2 /
It was hot. On the other hand, the developer ~ is all 3
It had a processing capacity of more than m 2 /. In addition, although all of the developing solutions ~ were treated with neutralized waste liquid with hydrochloric acid, no SiO 2 gel was produced at all. Example 2 A photosensitive printing plate prepared and exposed in the same manner as in Example 1 was treated with a developer having the composition shown in Table 3 at a temperature of 30°C.
It was developed in 90 seconds, washed with water, and the developing ink was removed. The results are shown in Table 4.
【表】【table】
【表】
次に現像液〜の現像処理能力を比較した結
果、、及びは３m2/以上の処理能力があ
つたが、は２m2/程度であつた。
また現像液〜を塩酸で中和処理をしたとこ
ろ、は大量のSiO2のゲルが生成したが、
及びは全く生成しなかつた。
実施例 ３
実施例１において、アセトンとピロガロールの
重縮合により得られるポリヒドロキシフエニルの
ナフトキノン１，２―ジアジド―５スルホン酸エ
ステル１重量部と、ノボラツク型フエノールホル
ムアルデヒド樹脂４重量部及びベーシツクブルー
0.001重量部をメチルセロソルブ40重量部に溶か
した感光液を用いた以外は実施例１及び２と全く
同様の実験を行い全く同様の結果を得た。
比較例
実施例１において、現像液として下記表５に示
す組成の現像液を用いた以外は全く同様にして現
像を行なつた。その結果を表６に示した。[Table] Next, as a result of comparing the development processing capacity of the developer solution ~, and had a processing capacity of 3 m 2 / or more, but it was about 2 m 2 /. Furthermore, when the developer was neutralized with hydrochloric acid, a large amount of SiO 2 gel was generated.
and were not produced at all. Example 3 In Example 1, 1 part by weight of naphthoquinone 1,2-diazide-5 sulfonic acid ester of polyhydroxyphenyl obtained by polycondensation of acetone and pyrogallol, 4 parts by weight of novolak type phenol formaldehyde resin, and Basic Blue
Exactly the same experiment as in Examples 1 and 2 was carried out, except that a photosensitive solution in which 0.001 part by weight was dissolved in 40 parts by weight of methyl cellosolve was used, and exactly the same results were obtained. Comparative Example Development was carried out in exactly the same manner as in Example 1, except that a developer having the composition shown in Table 5 below was used as the developer. The results are shown in Table 6.
【表】【table】
Claims (1)
カリ水溶液を有効成分とするＯ―キノンジアジド
系感光材料の現像液。1. A developer for O-quinonediazide-based photosensitive materials whose active ingredient is an alkaline aqueous solution containing a water-soluble cationic polymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP348979A JPS5595946A (en) | 1979-01-16 | 1979-01-16 | Developer for o-quinone diazide type photosensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP348979A JPS5595946A (en) | 1979-01-16 | 1979-01-16 | Developer for o-quinone diazide type photosensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5595946A JPS5595946A (en) | 1980-07-21 |
| JPS6113217B2 true JPS6113217B2 (en) | 1986-04-12 |
Family
ID=11558742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP348979A Granted JPS5595946A (en) | 1979-01-16 | 1979-01-16 | Developer for o-quinone diazide type photosensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5595946A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3346979A1 (en) * | 1983-12-24 | 1985-07-04 | Merck Patent Gmbh, 6100 Darmstadt | DEVELOPER FOR POSITIVE PHOTO RESISTS |
| EP0732628A1 (en) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Aqueous alkaline solution for developing offset printing plate |
| DE69941227D1 (en) | 1998-04-06 | 2009-09-17 | Fujifilm Corp | Photosensitive resin composition |
| US6511790B2 (en) | 2000-08-25 | 2003-01-28 | Fuji Photo Film Co., Ltd. | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
| JP2003315987A (en) | 2002-02-21 | 2003-11-06 | Fuji Photo Film Co Ltd | Method for making lithographic printing plate |
| US7081330B2 (en) | 2002-09-20 | 2006-07-25 | Fuji Photo Film Co., Ltd. | Method of making lithographic printing plate |
| JP2005321763A (en) | 2004-04-06 | 2005-11-17 | Fuji Photo Film Co Ltd | Method for replenishing developer for automatic developing machine for photosensitive planographic printing plate |
-
1979
- 1979-01-16 JP JP348979A patent/JPS5595946A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5595946A (en) | 1980-07-21 |
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