JPH022571A - Developing solution for photosensitive material - Google Patents
Developing solution for photosensitive materialInfo
- Publication number
- JPH022571A JPH022571A JP14848288A JP14848288A JPH022571A JP H022571 A JPH022571 A JP H022571A JP 14848288 A JP14848288 A JP 14848288A JP 14848288 A JP14848288 A JP 14848288A JP H022571 A JPH022571 A JP H022571A
- Authority
- JP
- Japan
- Prior art keywords
- developer
- carbonate
- silicate
- soln
- alkaline metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title description 8
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims abstract description 14
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 11
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- 229910052913 potassium silicate Inorganic materials 0.000 abstract description 13
- 235000019353 potassium silicate Nutrition 0.000 abstract description 13
- 239000004111 Potassium silicate Substances 0.000 abstract description 11
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 239000004115 Sodium Silicate Substances 0.000 abstract description 5
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052911 sodium silicate Inorganic materials 0.000 abstract description 5
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052912 lithium silicate Inorganic materials 0.000 abstract description 4
- 235000019795 sodium metasilicate Nutrition 0.000 abstract description 3
- 230000002378 acidificating effect Effects 0.000 abstract description 2
- 150000003863 ammonium salts Chemical class 0.000 abstract description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- 239000000203 mixture Substances 0.000 description 20
- 238000002360 preparation method Methods 0.000 description 18
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 10
- 239000002736 nonionic surfactant Substances 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- 230000006866 deterioration Effects 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 8
- -1 polyethylene Polymers 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000005711 Benzoic acid Substances 0.000 description 7
- 235000010233 benzoic acid Nutrition 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000003139 buffering effect Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- LXOFYPKXCSULTL-UHFFFAOYSA-N 2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound CC(C)CC(C)(O)C#CC(C)(O)CC(C)C LXOFYPKXCSULTL-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- ALKYHXVLJMQRLQ-UHFFFAOYSA-N 3-Hydroxy-2-naphthoate Chemical compound C1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 ALKYHXVLJMQRLQ-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 229920006317 cationic polymer Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PBRIXADXGMHVMW-UHFFFAOYSA-N formaldehyde;4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound O=C.CC(C)(C)CC(C)(C)C1=CC=C(O)C=C1 PBRIXADXGMHVMW-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 229940031993 lithium benzoate Drugs 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- LDJNSLOKTFFLSL-UHFFFAOYSA-M lithium;benzoate Chemical compound [Li+].[O-]C(=O)C1=CC=CC=C1 LDJNSLOKTFFLSL-UHFFFAOYSA-M 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002900 organolithium compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229940047670 sodium acrylate Drugs 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、画像露光によって画像様にアルカリ性水性溶
液に対する溶出性が変化する感光層を有する感光性平版
印刷版等の溶出型現像に用いられる、アルカリ金属ケイ
酸塩をアルカリ剤として用いたアルカリ性水性溶液から
なる現像液に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention is used for dissolution type development of photosensitive lithographic printing plates, etc., which have a photosensitive layer whose dissolution to an alkaline aqueous solution changes imagewise by imagewise exposure. , relates to a developer consisting of an alkaline aqueous solution using an alkali metal silicate as an alkaline agent.
従来、0−キノンジアジド化合物を感光性物質として含
有する感光層をアルミニウム支持体上に有するポジ型2
8版の現像液として、アルカリ金属ケイ酸塩の水溶液か
らなる現像液が、他のアルカリ剤を用いたものと比較し
て、アルミニウム支持体に対するエツチング作用が乏し
いこと及び5iOzとM、O(Mはアルカリ金属原子を
表す。以下の記載においても同じ)の濃度と比率によっ
て現像性の調整が可能である点から好ましいことが知ら
れている。Conventionally, positive type 2 has a photosensitive layer containing an 0-quinonediazide compound as a photosensitive substance on an aluminum support.
As a developer for the 8th plate, a developer consisting of an aqueous solution of an alkali metal silicate has a poor etching effect on the aluminum support compared to those using other alkaline agents, and 5iOz, M, O (M represents an alkali metal atom (the same applies in the following description), which is known to be preferable because the developability can be adjusted by adjusting the concentration and ratio.
この種の現像液において、MtOの濃度を高めると現像
力、処理能力が高まるが、現像安定性(現像時間に対す
る画像の安定性)が低下し、SiO□の濃度を高めると
、現像の安定性は高まるが、現像が抑制され、現像力と
現像安定性とを併せて高めることが離しいという問題が
あることも知られている。In this type of developer, increasing the concentration of MtO increases the developing power and processing capacity, but the development stability (stability of the image with respect to development time) decreases, and increasing the concentration of SiO□ decreases the stability of development. However, it is also known that there is a problem in that development is suppressed and it is difficult to increase both developing power and development stability.
特開昭54−62004号には、現像液とその補充液の
SiO,/Na02のモル比および現像液のSiO□濃
度をある範囲に限定することにより、現像液の交換頻度
および補充回数が減少できる旨が開示されてし・る。JP-A-54-62004 discloses that by limiting the molar ratio of SiO, /Na02 of the developer and its replenisher and the SiO□ concentration of the developer to a certain range, the frequency of replacing and replenishing the developer is reduced. It has been disclosed that it is possible.
また、特公昭57−7427号には、SiO□/M20
のモル比およびSiO2の濃度について、前者は1.0
〜1.5、後者は1〜4重i%が好ましい旨が記載され
ている。In addition, in Special Publication No. 57-7427, SiO□/M20
For the molar ratio of and the concentration of SiO2, the former is 1.0
~1.5, and the latter is preferably 1 to 4 times i%.
特開昭58−75152号公報には、塩基性物質として
メタケイ酸ナトリウムを用いた水性アルカリ性現像液に
、NaC(2やKCQのような中性塩を含有させること
により、現像安定性、現像速度、処理能力等が増大する
旨が開示されている。しかし、このような中性塩を含有
させても現像液の保存安定性は改良されない。JP-A-58-75152 discloses that by incorporating a neutral salt such as NaC(2) or KCQ into an aqueous alkaline developer using sodium metasilicate as a basic substance, development stability and development speed can be improved. , processing capacity, etc. are disclosed to be increased. However, even if such a neutral salt is included, the storage stability of the developer is not improved.
本発明者らは、アルカリ金属ケイ酸塩水溶液からなる現
像液において、SiJ/Mの量比をある値以下とし、か
つ炭酸塩を添加することにより、優れた現像速度と現像
安定性および保存安定性とを有する現像液が得られるこ
とを見い出し、本発明に到達したものである。The present inventors have achieved excellent development speed, development stability, and storage stability by keeping the SiJ/M ratio below a certain value and adding carbonate to a developer consisting of an aqueous alkali metal silicate solution. The inventors have discovered that it is possible to obtain a developer having the following properties, and have arrived at the present invention.
従って、本発明の目的は、アルカリ剤としてアルカリ金
属ケイ酸塩を含有する現像液であって、現像速度を低下
することなく、保存安定性及び現像安定性が改良された
現像液を提供することである。Therefore, an object of the present invention is to provide a developer containing an alkali metal silicate as an alkaline agent, which has improved storage stability and development stability without reducing the development speed. It is.
本発明の上記目的は、アルカリ金属のケイ酸塩の水溶液
であって、該現像液に含まれる[5iO21/ [Ml
([S1o□1はSin、をグラム分子単位で表したと
きの単位体積中の含有量を示し、[Mlはアルカリ金属
をグラム原子で表したときの単位体積中の含有量を示す
。)が0.75以下であり、さらに炭酸塩が添加されて
いる現像液によって達成される。The above object of the present invention is to provide an aqueous solution of an alkali metal silicate, wherein [5iO21/[Ml
([S1o□1 indicates the content of Sin in a unit volume when expressed in gram molecules, [Ml indicates the content in a unit volume when an alkali metal is expressed in gram atoms.) 0.75 or less, and is achieved by a developer to which carbonate is further added.
以下、本発明について詳述する。The present invention will be explained in detail below.
本発明の現像液に含有させるアルカリ金属珪酸塩として
は、例えば珪酸カリウム、珪酸ナトリウム、珪酸リチウ
ム、メタ珪酸カリウム、メタ珪酸ナトリウム、メタ珪酸
リチウム等が代表的なものとして挙げられる。Typical alkali metal silicates to be contained in the developer of the present invention include potassium silicate, sodium silicate, lithium silicate, potassium metasilicate, sodium metasilicate, lithium metasilicate, and the like.
本発明の現像液における[5iOz]/ [Mlは、0
.75以下であるが、好ましくは0.1〜0.5である
。[5iOz]/[Ml in the developer of the present invention is 0
.. It is 75 or less, preferably 0.1 to 0.5.
本発明の現像液は、アルカリ剤としてアルカリ金属ケイ
酸塩を用いた水性現像液に炭酸塩を含有させることによ
り、[5iO21/ [Mlを0.75以下に低下させ
たときに顕著になる緩衝能の減少を防止できるので、保
存安定性および現像安定性を低下させることなく、現像
速度を高めることができる。[SiO2]/[Mlは、
緩衝能の点から通常は0.1以上が良い。The developing solution of the present invention is made by incorporating a carbonate into an aqueous developing solution using an alkali metal silicate as an alkaline agent, thereby reducing the buffering that becomes noticeable when [5iO21/[Ml] is lowered to 0.75 or less. Since a decrease in performance can be prevented, the development speed can be increased without reducing storage stability and development stability. [SiO2]/[Ml is
From the viewpoint of buffering capacity, it is usually better to set it to 0.1 or more.
本発明の現像液に添加する炭酸塩としては、アルカリ金
属の炭酸塩(例えば、炭酸ナトリウム、炭酸カリウム等
)および酸性炭酸塩(例えば、炭酸水素ナトリウム)、
アンモニウム塩(例えば、炭酸アンモニウム)等が代表
的なものとして挙げられる。Carbonates added to the developer of the present invention include alkali metal carbonates (e.g., sodium carbonate, potassium carbonate, etc.) and acidic carbonates (e.g., sodium hydrogen carbonate),
Representative examples include ammonium salts (eg, ammonium carbonate).
その添加量は0.1〜5重量%の範囲が好ましい。The amount added is preferably in the range of 0.1 to 5% by weight.
アルカリ金属ケイ酸塩を含有するアルカリ性水溶液は、
空気と接触した状態での保存中に空気中の炭酸ガスを吸
収して、炭酸塩を生成するが、本発明の現像液は、調製
時にあらかじめ炭酸塩を添加し含有させておくことによ
り、緩衝能が増大し、保存安定性および現像安定性が顕
著に改良される。An alkaline aqueous solution containing an alkali metal silicate is
During storage in contact with air, carbon dioxide gas in the air is absorbed and carbonate is produced, but the developer of the present invention has a buffering effect by adding carbonate in advance during preparation. The storage stability and development stability are significantly improved.
本発明の現像液には、上記以外のアルカリ剤を本発明の
効果を阻害しない範囲で含有させることができ、また使
用目的によって、上記以外の成分を添加剤として含有さ
せることは任意である。The developing solution of the present invention may contain alkaline agents other than those mentioned above within a range that does not impede the effects of the present invention, and depending on the purpose of use, components other than those mentioned above may optionally be included as additives.
本発明の現像液には以下のような添加剤を加えることが
できる。例えば、特開昭58−75152号記載のNa
CQ、 KCQ、 KBr等の中性塩、特開昭58−1
90952号記載のEDTA、 NTA等のキレート剤
、特開昭59−121336号記載の[C0(NHりl
]CQ3. C0C(22・6H20等の錯体、特開昭
50−51324号記載のアルキルナフタレンスルホン
酸ナトリウム、N−テトラデシル−N。The following additives can be added to the developer of the present invention. For example, Na described in JP-A No. 58-75152
Neutral salts such as CQ, KCQ, KBr, etc., JP-A-58-1
Chelating agents such as EDTA and NTA described in JP-A-59-121336;
]CQ3. C0C (complexes such as 22.6H20, sodium alkylnaphthalenesulfonate, N-tetradecyl-N, described in JP-A-50-51324).
N−ジヒドロキシエチルベタイン等のアニオンまたは両
性界面活性剤、米国特許第4.374,920号記載の
テトラメチルデシンジオール等の非イオン性界面活性剤
、特開昭55−95946号記載のp−ジメチルアミノ
メチルポリスチレンのメチルクロライド4級化物等のカ
チオニツクポリマー、特開昭56゜142528号記載
のビニルベンゼントリメチルアンモニウムクロライドと
アクリル酸ナトリウムの共重合体等の両性高分子電解質
、特開昭57−192952号記載の亜硫酸ナトリウム
等の還元性無機塩、特開昭58−59444号記載の塩
化リチウム等の無機リチウム化合物、特公昭50−34
442号記載の安息香酸リチラム等の有機リチウム化合
物、特開昭59−75255号記載のSi、 Ti等を
含む有機金属界面活性剤、特開昭59−84241号記
載の有機硼素化合物、ヨーロンパ特許第101010号
記載のテトラアルキルアンモニウムオキサイド等の4級
アンモニウム塩、ベンジルアルコール、エチレングリコ
ールモノフェニルエーテル等の有機溶剤等が挙げられる
。さらに本発明に用いる現像液には消泡剤を含有させる
ことができる。好ましい消泡剤としては、米国特許第3
゜250.727号、同第3,545,970号、英国
特許筒1,382゜901号、同第1.387,713
号等に記載された化合物が挙げられる。Anionic or amphoteric surfactants such as N-dihydroxyethyl betaine, nonionic surfactants such as tetramethyldecynediol described in U.S. Pat. No. 4,374,920, and p-dimethyl as described in JP-A-55-95946. Cationic polymers such as the quaternized methyl chloride of aminomethyl polystyrene; ampholytic polymer electrolytes such as the copolymer of vinylbenzenetrimethylammonium chloride and sodium acrylate described in JP-A-56-142528; JP-A-57-192952; Reducing inorganic salts such as sodium sulfite described in JP-A No. 58-59444, inorganic lithium compounds such as lithium chloride described in JP-A No. 58-59444, JP-B No. 50-34
Organolithium compounds such as lithium benzoate described in No. 442, organometallic surfactants containing Si, Ti, etc. described in JP-A-59-75255, organoboron compounds described in JP-A-59-84241, European Patent No. Examples include quaternary ammonium salts such as tetraalkylammonium oxide described in No. 101010, organic solvents such as benzyl alcohol, and ethylene glycol monophenyl ether. Furthermore, the developer used in the present invention can contain an antifoaming agent. Preferred antifoaming agents include U.S. Pat.
No. ゜250.727, No. 3,545,970, British Patent No. 1,382゜901, No. 1.387,713
Examples include compounds described in No. 1, etc.
本発明の現像液が適用される感光材料は、水を主成分と
してアルカリ剤を含む現像液で現像処理できるものであ
り、光照射によって溶解性の変化する感光層が支持体上
に塗布されているもの例えば感光性平版印刷版やカラー
プルーフ用感光材料、まt;は電子写真方式等によって
画像様レジスト層を設は得る溶解性層が支持体上に設け
られているものである。The photosensitive material to which the developer of the present invention is applied can be developed with a developer containing water as a main component and an alkaline agent, and a photosensitive layer whose solubility changes upon irradiation with light is coated on a support. For example, photosensitive lithographic printing plates, color proof photosensitive materials, etc. are those in which a soluble layer is provided on a support to form an image-like resist layer by an electrophotographic method or the like.
前記の感光性平版印刷版に使用される支持体としては、
紙、プラスチック (例えばポリエチレン、ポリプロピ
レン、ポリスチレンなと)ラミネート紙、アルミニウム
(アルミニウム合金も含む)、亜鉛、銅などのような
金属の板、二酢酸セルロース、三酢酸セルロース、プロ
ピオン酸セルロース、ポリエチレンテレフタレート、ポ
リエチレン、ポリプロピレン、ポリカーボネート、ポリ
ビニルアセタールなどのようなプラスチックのフィルム
、上記の如き金属がラミネートもしくは蒸着された紙も
しくはプラスチックフィルム、アルミニウムもしくはク
ロームメツキが施された銅板などが挙げられ、これらの
うち特にアルミニウムおよびアルミニウム被覆された複
合支持体を有する感光材料に対して本発明が好ましく適
用される。The support used in the photosensitive lithographic printing plate is as follows:
Paper, plastics (e.g. polyethylene, polypropylene, polystyrene), laminated paper, aluminum (including aluminum alloys), metal plates such as zinc, copper, etc., cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate, Examples include plastic films such as polyethylene, polypropylene, polycarbonate, polyvinyl acetal, etc., paper or plastic films laminated or vapor-deposited with metals such as those mentioned above, aluminum or chrome-plated copper plates, etc. Among these, especially aluminum The present invention is preferably applied to photosensitive materials having aluminum-coated composite supports.
アルミニウム材の表面は、保水性を高め感光層と密着性
を向上させる目的で粗面化処理されていることが望まし
い。The surface of the aluminum material is preferably roughened for the purpose of increasing water retention and adhesion to the photosensitive layer.
前記光照射によって溶解性の変化する感光層は必須成分
として感光性物質を含んでおり、感光性物質として露光
またはその後の現像処理により、その物理的、化学的性
質が変化するもので、例えば露光により現像液に対する
溶解性に差が生じるもの、露光の前後で分子間の接着力
に差が生じるもの、露光またはその後の現像処理により
水および油に対する親和性に差が生じるもの等が使用で
きる。The photosensitive layer whose solubility changes upon irradiation with light contains a photosensitive substance as an essential component, and the physical and chemical properties of the photosensitive substance change upon exposure or subsequent development treatment. Examples of usable materials include those that cause a difference in solubility in a developing solution depending on the composition, those that exhibit a difference in intermolecular adhesive strength before and after exposure, and those that exhibit a difference in affinity for water and oil due to exposure or subsequent development treatment.
感光性物質の代表的なものとしては、例えば感光性ジア
ゾ化合物、感光性アジド化合物、エチレン性不飽和二重
結合を有する化合物、酸触媒で重合を起こすエポキシ化
合物、酸で分解するシリルエーテルポリマーやC−0−
C−基を有する化合物と光酸発生剤との組合せ等が挙げ
られる。感光性ジアゾ化合物としては、露光によりアル
カリ可溶性に変化するポジ型のものとして。−キノンジ
アジド化合物、露光により溶解性が減少するネガ型のも
のとして芳香族ジアゾニウム塩等が挙げられる。Typical photosensitive substances include, for example, photosensitive diazo compounds, photosensitive azide compounds, compounds with ethylenically unsaturated double bonds, epoxy compounds that polymerize with acid catalysts, silyl ether polymers that decompose with acids, and C-0-
Examples include a combination of a compound having a C-group and a photoacid generator. As a photosensitive diazo compound, it is a positive-type compound that becomes alkali-soluble when exposed to light. - Quinonediazide compounds, aromatic diazonium salts, etc. are examples of negative-type compounds whose solubility decreases upon exposure to light.
以下、実施例をもって本発明の詳細な説明する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
実施例1
厚さ(L24mmのJIS 1050アルミニウム板を
2%の水酸化ナトリウム水溶液中に浸漬し、脱脂処理を
行った後に、希硝酸液中で電気化学的に粗面化し、よく
洗浄した後に希硝酸液中で陽極酸化処理を行って2.5
g/m”の酸化皮膜を上記アルミニウム板表面上に形成
させた。このように処理されたアルミニウム板を水洗、
乾燥後、下記組成の感光液Aを乾燥型i2.5g/m”
となるように塗布し、乾燥してポジ型感光性平版印刷版
Aを得た。Example 1 A JIS 1050 aluminum plate with a thickness of 24 mm (L) was immersed in a 2% sodium hydroxide aqueous solution, degreased, electrochemically roughened in a dilute nitric acid solution, thoroughly washed, and then diluted. 2.5 by anodizing in nitric acid solution
g/m" oxide film was formed on the surface of the aluminum plate. The aluminum plate thus treated was washed with water,
After drying, photosensitive liquid A with the following composition was applied to dry type i2.5g/m"
A positive photosensitive lithographic printing plate A was obtained by coating and drying.
感光液A
ピロガロールアセトン樹脂のナフトキノン−1,2ジア
ジド(2)−5−スルホン酸エステル(特公昭43−2
8403号の実施例1に記載の方法で合成したもの。)
・・・1重量部
m + p−タレゾール−ホルムアルデヒド樹脂・・・
2重量部
Lert−ブチルフェノール−ホルムアルデヒド樹脂・
・・0.3重量部
ビクトリアピュアーブルーBOH(商品名、保土谷化学
工業(株)製、染料) ・・・0.3重量部クリス
タルバイオレット(B、A、S、F、社製、染料)・・
・0.01重量部
エチレンジグリコール七ノエチルエーテル・・・20重
量部
上記感光液Aを下記感光液Bに変えたほかは上記ポジ型
感光性平版印刷版Aと同様にしてポジ型感光性平版印刷
版Bを得た。Photosensitive liquid A Naphthoquinone-1,2diazide(2)-5-sulfonic acid ester of pyrogallol acetone resin (Japanese Patent Publication No. 43-2
Synthesized by the method described in Example 1 of No. 8403. )...1 part by weight m + p-talesol-formaldehyde resin...
2 parts by weight Lert-butylphenol-formaldehyde resin
...0.3 parts by weight Victoria Pure Blue BOH (trade name, manufactured by Hodogaya Chemical Co., Ltd., dye) ...0.3 parts by weight Crystal Violet (B, A, S, F, manufactured by Hodogaya Chemical Co., Ltd., dye)・・・
・0.01 part by weight Ethylene diglycol 7-ethyl ether...20 parts by weight Positive-working photosensitive material was prepared in the same manner as the above-mentioned positive-working photosensitive lithographic printing plate A except that the above photosensitive liquid A was changed to the following photosensitive liquid B. A lithographic printing plate B was obtained.
感光液B
2.3.4−1−リヒドロキシベンゾフェノンと1.2
−ナフトキノンジアジド−5−スルホン酸クロライドと
のエステル化合物 ・・・20重量部p−ヒ
ドロキシメタクリルアニリドとアクリロニニトリルとア
クリル酸エチルとメタクリル酸メチルの共重合高分子化
合物 ・・・80重量部2−トIJクロロメチル−
5−Cβ−(2’−ベンゾフリル)ビニル)−1,3,
4−オキサジアゾール・・・2重量部ビクトリアブルー
BOH・・・1重量部p−tert−オクチルフェノー
ル・ホルムアルデヒドノボラック樹脂(Mw= 130
0)と1.2−す7トキノンジアジドー5−スルホン酸
クロライドとのエステル化物 ・
・・1重量部無水グルタル酸 ・・・3
重量部メチルセロソルブ ・・・2001
i W。Photosensitive solution B 2.3.4-1-lyhydroxybenzophenone and 1.2
-Ester compound with naphthoquinone diazide-5-sulfonic acid chloride...20 parts by weight Copolymerized polymer compound of p-hydroxymethacrylanilide, acrylonitrile, ethyl acrylate, and methyl methacrylate...80 parts by weight2- IJ chloromethyl-
5-Cβ-(2'-benzofuryl)vinyl)-1,3,
4-Oxadiazole...2 parts by weight Victoria Blue BOH...1 part by weight p-tert-octylphenol formaldehyde novolak resin (Mw=130
Esterified product of 0) and 1.2-su7toquinone diazido 5-sulfonic acid chloride ・
...1 part by weight glutaric anhydride ...3
Part by weight Methyl cellosolve...2001
iW.
エチルセロソルブ ・・・500重J1
部上記2種のポジ型感光性平版印刷版を透明ポジチイブ
フイルムを密着させて2kWのメタルハライドランプで
70cmの距離から60秒間露光し、露光済み感光性平
版印刷版を第1図に示す自動現像機で30°Cl2O秒
間現像した。Ethyl cellosolve...500 weight J1
The above two types of positive-working photosensitive planographic printing plates were placed in close contact with a transparent positive film and exposed for 60 seconds from a distance of 70 cm using a 2kW metal halide lamp. It was developed using a developing machine for 30°C12O seconds.
使用した現像液は下記の通りである。The developer used was as follows.
現像液
下記組成の濃厚現像液を作製し、次いでこの濃厚現像液
を水で6倍に希釈して現像液を作製した。Developer A concentrated developer having the following composition was prepared, and then this concentrated developer was diluted 6 times with water to prepare a developer.
該現像液中の[SiO2]/ [M]は0.44、pH
は13.02であっIこ 。[SiO2]/[M] in the developer is 0.44, pH
It was 13.02.
濃厚現像液組成
水
・・・610g安息香酸
・・・122g50% KOH・=
250g
250gノニオン界(エマルゲン147、花王(株)製
)・・・5g
Aケイ酸カリウム ・・・150
g炭酸カリウム ・・・61
g現像液は、調製した直後のものと、IH入りの容器に
入れ、蓋(30mn+))を外したまま1箇月間保存し
たものとの両者を用いてそれぞれ現像を行った。現像結
果、両者間に差異は認められなかった。Concentrated developer composition water
...610g benzoic acid
...122g50% KOH・=
250g 250g Nonionic world (Emulgen 147, manufactured by Kao Corporation)...5g Potassium silicate A...150
g Potassium carbonate...61
Development was carried out using both the developer immediately after preparation and the developer stored in an IH container with the lid (30 m+) removed for one month. As a result of development, no difference was observed between the two.
また、上記現像液(上記濃厚現像液を6@に希釈したも
の)を空気にふれたまま24時間放置させたが、pHの
変動はなかった。Furthermore, when the above developer (the above concentrated developer was diluted to 6@) was left exposed to air for 24 hours, there was no change in pH.
比較例1
濃厚現像液として下記組成のものを使用したほかは実施
例1と同様の実験を行った。Comparative Example 1 An experiment similar to Example 1 was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
・・・610g安息香酸
・・・122g50% KOII
−250gノニオン界
面活性剤(エマルゲンI47、花王(株)製)・・・5
g
Aケイ酸カリウム ・・・150
gこの濃厚現像液を水で6倍に希釈した現像液の[S1
0□1/[M]は0.44であった。Concentrated developer composition water
...610g benzoic acid
...122g50% KOII
-250g nonionic surfactant (Emulgen I47, manufactured by Kao Corporation)...5
g Potassium silicate...150
gThis concentrated developer was diluted 6 times with water [S1
0□1/[M] was 0.44.
0現像結果は、調製した直後に使用したものと、調製の
1箇月後に使用したものとの間に現像速度の差異が認め
られた。0 development results showed that there was a difference in development speed between those used immediately after preparation and those used one month after preparation.
上記現像液を実施例1と同一条件で強制劣化を行った結
果、pHの変動は−0,07であった。As a result of forced deterioration of the above developer under the same conditions as in Example 1, the pH fluctuation was -0.07.
実施例2
濃厚現像液として下記組成のものを使用したほかは、実
施例1と同様の実験を行った。Example 2 An experiment similar to Example 1 was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
・・・426gβ−アニリノエタノール
・・・25gプロピレングリコール
・・・25g2−ヒドロキシ−3−
ナフトエ酸 ・・・50gp−tert−
ブチル安息香酸 ・・・99g50%K
OH・・・250g
ノニオン界面活性剤(エマルゲン147、花王(株)製
)・・・2.5g
Aケイ酸カリウム ・・・178
g亜硫酸カリウム ・・・60g
炭酸カリウム ・・・60g
この濃厚現像液を水で6倍に希釈しIQ現像液の[5i
Oz]/ [Ml ハ0.43、pHハ13.oOテあ
ツタ。Concentrated developer composition water
...426g β-anilinoethanol ...25g propylene glycol ...25g 2-hydroxy-3-
Naphthoic acid...50gp-tert-
Butylbenzoic acid...99g50%K
OH...250g Nonionic surfactant (Emulgen 147, manufactured by Kao Corporation)...2.5g Potassium silicate A...178
g Potassium sulfite...60g
Potassium carbonate...60g
This concentrated developer was diluted 6 times with water, and the IQ developer [5i] was diluted with water.
Oz]/[Ml Ha 0.43, pH Ha 13. oO Te Atsuta.
現像結果は、調製した直後に使用したものと、調製の1
箇月後に使用したものとの間に現像速度の差異が認めら
れなかった。The development results are for the one used immediately after preparation and the one used immediately after preparation.
No difference in development speed was observed between the two and those used after several months.
また、上記現像液を実施例1と同一条件で強制劣化を行
ったが、pt+の変動はなかった。Further, the above developer was subjected to forced deterioration under the same conditions as in Example 1, but there was no change in pt+.
比較例2
濃厚現像液として下記組成のものを使用したほかは実施
例1と同様の実験を行った。Comparative Example 2 An experiment similar to Example 1 was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
・・・426gβ−アニリノエタノール
・・・25gプロピレングリコール
・・・25g3−ヒドロキシ−2−す
7トエ酸 ・・・50gp−tert−ブ
チル安息香酸 ・・・99g50% K
O)l
・・・250gノニオン界面活性剤(エマルゲン
147、化工(株)製)・・・2.5g
Aケイ酸カリウム ・・・178
g亜硫酸カリウム ・・・60
gこの濃厚現像液を水で6倍に希釈した現像液の[Si
O□]/[Mlは0.43、pHは12.99であった
。Concentrated developer composition water
...426g β-anilinoethanol
...25g propylene glycol
...25g 3-hydroxy-2-su7toic acid ...50gp-tert-butylbenzoic acid ...99g50% K
O)l
...250g nonionic surfactant (Emulgen 147, manufactured by Kako Co., Ltd.) ...2.5g Potassium silicate A ...178
g Potassium sulfite...60
g This concentrated developer was diluted 6 times with water.
O□]/[Ml was 0.43, and pH was 12.99.
現像結果は、調製した直後に使用したものと、調製の1
箇月後に使用したものとの間に現像速度の差異が認めら
れた。The development results are for the one used immediately after preparation and the one used immediately after preparation.
A difference in development speed was observed between the two and those used after several months.
上記現像液を実施例1と同一条件で強制劣化を行った結
果、pllの変動は−0,08であった。As a result of forced deterioration of the above developer under the same conditions as in Example 1, the pll variation was -0.08.
実施例3
濃厚現像液として下記組成のものを使用したほかは、実
施例1と同様の実験を行った。Example 3 An experiment similar to Example 1 was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
・・・1220g安息香酸
・・・122g50%KOH・・・4
50g
ノニオン界面活性剤(エマルゲン147、化工(株)製
)・・・5g
Aケイ酸カリウム ・・・430g
炭酸カリウム ・・・61gこ
の濃厚現像液を6倍に希釈した現像液の[SiO2]/
[Ml ILL 0.21%pHハ13.30 ’T
: アラf:。Concentrated developer composition water
...1220g benzoic acid
...122g50%KOH...4
50g Nonionic surfactant (Emulgen 147, manufactured by Kako Co., Ltd.)...5g Potassium silicate A...430g
Potassium carbonate...61g This concentrated developer is diluted 6 times [SiO2]/
[Ml ILL 0.21%pH 13.30'T
: Ara f:.
現像結果は、調製した直後に使用したものと、調製の1
箇月後に使用したものとの間に現像速度の差異が認めら
れなかった。The development results are for the one used immediately after preparation and the one used immediately after preparation.
No difference in development speed was observed between the two and those used after several months.
また、上記現像液を実施例1と同一条件で強制劣化を行
ったが、pHの変動はなかった。Further, the above developer was subjected to forced deterioration under the same conditions as in Example 1, but there was no change in pH.
比較例3
濃厚現像液として下記組成のものを使用したほかは実施
例Iと同様の実験を行った。Comparative Example 3 An experiment similar to Example I was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
・・・1220g安息香酸
・・・122g50%KOF+
−450gノニオン界面活性剤
(エマルゲン147、化工(株)製)・・・5g
Aケイ酸カリウム ・・・150
gこの濃厚現像液を水で6倍に希釈した現像液の(s;
o21/[Mlは0.21SpHは13.28であった
。Concentrated developer composition water
...1220g benzoic acid
...122g50%KOF+
-450g nonionic surfactant (Emulgen 147, manufactured by Kako Co., Ltd.)...5g Potassium silicate A...150
g This concentrated developer was diluted 6 times with water (s;
o21/[Ml was 0.21SpH was 13.28.
現像結果は、調製した直後に使用したものと、調製の1
箇月後に使用したものとの間に現像速度の差異が認めら
れた。The development results are for the one used immediately after preparation and the one used immediately after preparation.
A difference in development speed was observed between the two and those used after several months.
上記現像液を実施例1と同一条件で強制劣化を行った結
果、pHの変動は−0,06であった。As a result of forced deterioration of the above developer under the same conditions as in Example 1, the pH fluctuation was -0.06.
実施例4
濃厚現像液として下記組成のものを使用したほかは、実
施例1と同様の実験を行った。Example 4 An experiment similar to Example 1 was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
・・・610g安息香酸
・・・122g50%KOH・・・250
g
ノニオン界面活性剤(エマルゲン147、化工(株)製
)・・・5g
Aケイ酸カリウム ・・・300
g炭酸カリウム ・・・61g
この濃厚現像液を6倍に希釈した現像液の[SiO。Concentrated developer composition water
...610g benzoic acid
...122g50%KOH...250
g Nonionic surfactant (Emulgen 147, manufactured by Kako Co., Ltd.)...5g A Potassium silicate...300
g Potassium carbonate...61g
A developer obtained by diluting this concentrated developer 6 times [SiO].
/[Mlは0.70、pHは13.11であった。/[Ml was 0.70, pH was 13.11.
現像結果は、調製した直後に使用したものと、調製のl
箇月後に使用したものとの間に現像速度の差異が認めら
れなかった。The development results are those used immediately after preparation and those used immediately after preparation.
No difference in development speed was observed between the two and those used after several months.
また、上記現像液を実施例1と同一条件で強制劣化を行
ったが、pHの変動はなかった。Further, the above developer was subjected to forced deterioration under the same conditions as in Example 1, but there was no change in pH.
比較例4
濃厚現像液として下記組成のものを使用したほかは実施
例1と同様の実験を行った。Comparative Example 4 An experiment similar to Example 1 was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
−610g安息香酸
・・・122g50%KO!(・・・25
0g
ノニオン界面活性剤(エマルゲン147、花王(株)製
)・・・5g
Aケイ酸カリウム ・・・30g
この濃厚現像液を水で6倍に希釈した現像液の[S10
□]/[M]は0.70、pllは13.10であった
。Concentrated developer composition water
-610g benzoic acid
...122g 50% KO! (...25
0g Nonionic surfactant (Emulgen 147, manufactured by Kao Corporation)...5g Potassium silicate A...30g
A developer obtained by diluting this concentrated developer 6 times with water [S10
□]/[M] was 0.70, and pll was 13.10.
現像結果は、調製した直後に使用したものと、調製の1
箇月後に使用したものとの間に現像速度の差異が認めら
れた。The development results are for the one used immediately after preparation and the one used immediately after preparation.
A difference in development speed was observed between the two and those used after several months.
上記現像液を実施例1と同一条件で強制劣化を行った結
果、pHの変動は−0,05であった。As a result of forced deterioration of the above developer under the same conditions as in Example 1, the pH fluctuation was -0.05.
比較例5
濃厚現像液として下記組成のものを使用したほかは実施
例1と同様の実験を行った。Comparative Example 5 An experiment similar to Example 1 was conducted except that a concentrated developer having the following composition was used.
濃厚現像液組成
水
・・・610g安息香酸
・・・122g50%KOH・・・
250g
ノニオン界面活性剤(エマルゲン147、花王(株)製
)・・・5g
Aケイ酸カリウム ・・・150
g塩化カリウム ・・・61
gこの濃厚現像液を水で6倍に希釈した現像液の[S
io□]/[M]は0.44、p+は13.00であっ
た。Concentrated developer composition water
...610g benzoic acid
...122g50%KOH...
250g Nonionic surfactant (Emulgen 147, manufactured by Kao Corporation)...5g Potassium silicate A...150
g Potassium chloride...61
g This concentrated developer was diluted 6 times with water.
io□]/[M] was 0.44, and p+ was 13.00.
現像結果は、調製した直後に使用したものと、調製の1
箇月後に使用したものとの間に現像速度の差異が認めら
れた。The development results are for the one used immediately after preparation and the one used immediately after preparation.
A difference in development speed was observed between the two and those used after several months.
上記現像液を実施例1と同一条件で強制劣化を行った結
果、pHの変動は−0.04であった。As a result of forced deterioration of the above developer under the same conditions as in Example 1, the pH variation was -0.04.
以上の実施例及び比較例から、アルカリ金属ケイ酸塩を
含有するアルカリ性水性現像液において、[SiO,]
/[M]比を低下させても、炭酸塩を添加することによ
り、緩衝能が劣化しないことが判る。また、中性塩の添
加と比較して炭酸塩の添加は保存安定性の改良効果が優
れていることが判る。From the above Examples and Comparative Examples, in an alkaline aqueous developer containing an alkali metal silicate, [SiO,]
It can be seen that even if the /[M] ratio is lowered, the buffering capacity does not deteriorate by adding carbonate. It is also found that the addition of carbonate has a superior effect of improving storage stability compared to the addition of neutral salt.
本発明によれば、アルカリ剤としてアルカリ金属ケイ酸
塩を含有する水性現像液の[5tOzl/[M]を低下
させた場合の緩衝能の低下を防止できるので、現像液の
(Si02]/[M]を低下することでき、これにより
、現像速度を低下させないで保存安定性および現像安定
性を高めることができる。According to the present invention, it is possible to prevent a decrease in buffering capacity when [5tOzl/[M] of an aqueous developer containing an alkali metal silicate as an alkaline agent is lowered, so that (Si02]/[M] of the developer can be prevented. M], thereby increasing storage stability and development stability without reducing development speed.
第1図は本発明の実施例に使用した自動現像機の概略側
断面図である。
■・・・搬送ローラ対 2・・・感光材料3・・
・押さえローラ 4・・・傾斜ローラ5・・・現
像タンク
5a、 25a、 25b・・・ポンプ6・・・現像液
供給パイプ
7・・・現像液供給部材
U・・・現像液槽
13・・・ブラシローラ
21・・・混合槽
23・・・希釈水貯蔵槽
31・・・ガム引き部FIG. 1 is a schematic side sectional view of an automatic processor used in an embodiment of the present invention. ■...Transport roller pair 2...Photosensitive material 3...
・Press roller 4... Inclined roller 5... Developing tank 5a, 25a, 25b... Pump 6... Developer supply pipe 7... Developer supply member U... Developer tank 13...・Brush roller 21...Mixing tank 23...Dilution water storage tank 31...Gumming section
Claims (1)
、該現像液に含まれるSiO_2とアルカリ金属との割
合[SiO_2]/[M]([SiO_2]はSiO_
2をグラム分子単位で表したときの単位体積中の含有量
を示し、[M]はアルカリ金属をグラム原子単位で表し
たときの単位体積中の含有量を示す。)が0.75以下
であり、さらに炭酸塩が添加されていることとを特徴と
する感光材料用現像液。A developer consisting of an aqueous solution of an alkali metal silicate, the ratio of SiO_2 and alkali metal contained in the developer is [SiO_2]/[M] ([SiO_2] is SiO_
2 in unit volume when expressed in gram molecules, and [M] indicates the content in unit volume when alkali metal is expressed in gram atoms. ) is 0.75 or less, and further contains a carbonate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14848288A JPH022571A (en) | 1988-06-15 | 1988-06-15 | Developing solution for photosensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14848288A JPH022571A (en) | 1988-06-15 | 1988-06-15 | Developing solution for photosensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH022571A true JPH022571A (en) | 1990-01-08 |
Family
ID=15453744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14848288A Pending JPH022571A (en) | 1988-06-15 | 1988-06-15 | Developing solution for photosensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH022571A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH023065A (en) * | 1988-06-17 | 1990-01-08 | Fuji Photo Film Co Ltd | Development processing method for photosensitive planographic printing plate |
US5756584A (en) * | 1993-11-10 | 1998-05-26 | Minnesota Mining And Manufacturing Company | Tackified pressure sensitive adhesives |
CN107728438A (en) * | 2017-10-30 | 2018-02-23 | 江门市奔力达电路有限公司 | A kind of new welding resistance developer solution and preparation method thereof |
-
1988
- 1988-06-15 JP JP14848288A patent/JPH022571A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH023065A (en) * | 1988-06-17 | 1990-01-08 | Fuji Photo Film Co Ltd | Development processing method for photosensitive planographic printing plate |
JP2639693B2 (en) * | 1988-06-17 | 1997-08-13 | 富士写真フイルム株式会社 | Development method of photosensitive lithographic printing plate |
US5756584A (en) * | 1993-11-10 | 1998-05-26 | Minnesota Mining And Manufacturing Company | Tackified pressure sensitive adhesives |
CN107728438A (en) * | 2017-10-30 | 2018-02-23 | 江门市奔力达电路有限公司 | A kind of new welding resistance developer solution and preparation method thereof |
CN107728438B (en) * | 2017-10-30 | 2021-02-05 | 江门市奔力达电路有限公司 | Novel solder resist developing solution and preparation method thereof |
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