JPS5592392A - Preparation of tri-substituted halogenosilane - Google Patents
Preparation of tri-substituted halogenosilaneInfo
- Publication number
- JPS5592392A JPS5592392A JP2779A JP2779A JPS5592392A JP S5592392 A JPS5592392 A JP S5592392A JP 2779 A JP2779 A JP 2779A JP 2779 A JP2779 A JP 2779A JP S5592392 A JPS5592392 A JP S5592392A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- hydrogen halide
- substituted
- reacting
- prepared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 abstract 4
- 229910000039 hydrogen halide Inorganic materials 0.000 abstract 3
- 239000012433 hydrogen halide Substances 0.000 abstract 3
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- -1 hexa-substituted disiloxane Chemical class 0.000 abstract 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 abstract 1
- 229940073561 hexamethyldisiloxane Drugs 0.000 abstract 1
- 150000002894 organic compounds Chemical class 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
Abstract
PURPOSE: To prepare the title compound useful as a silylating agent for organic compounds, easily, in high purity, by reacting a hexa-substituted disiloxane with a hydrogen halide at a specific temperature.
CONSTITUTION: The compound of formula II is prepared by reacting a compound I (R is lower alkyl, halogen-substituted lower alkyl, lower alkoxy, or aryl), e.g. hexamethyl disiloxane with hydrogen halide at ≤-5°C, pref. ≤-17°C.
EFFECT: Since the reaction is carried out at a low temperature, the loss of hydrogen halide gas and the objective compound having low vapor pressure can be prevented, the reaction proceeds quantitatively, and the objective compound is prepared in high yield.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54000027A JPS5941998B2 (en) | 1979-01-05 | 1979-01-05 | Method for producing tri-substituted halogenosilane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54000027A JPS5941998B2 (en) | 1979-01-05 | 1979-01-05 | Method for producing tri-substituted halogenosilane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5592392A true JPS5592392A (en) | 1980-07-12 |
| JPS5941998B2 JPS5941998B2 (en) | 1984-10-11 |
Family
ID=11462886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54000027A Expired JPS5941998B2 (en) | 1979-01-05 | 1979-01-05 | Method for producing tri-substituted halogenosilane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5941998B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3133885A1 (en) * | 1981-08-27 | 1983-03-10 | Bayer Ag, 5090 Leverkusen | Process for the preparation of dimethylhydrogenchlorosilane |
| US4780556A (en) * | 1987-02-06 | 1988-10-25 | Sumitomo Chemical Company, Limited | Method for producing chlorosilanes |
| US5122356A (en) * | 1988-05-31 | 1992-06-16 | Daikin Industries Ltd. | Process for purification of hydrochloric acid |
| WO2003040156A1 (en) * | 2001-11-08 | 2003-05-15 | Hokko Chemical Industry Co., Ltd. | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes |
| CN106883258A (en) * | 2017-01-19 | 2017-06-23 | 浙江硕而博化工有限公司 | HMDO produces trim,ethylchlorosilane new technology |
-
1979
- 1979-01-05 JP JP54000027A patent/JPS5941998B2/en not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3133885A1 (en) * | 1981-08-27 | 1983-03-10 | Bayer Ag, 5090 Leverkusen | Process for the preparation of dimethylhydrogenchlorosilane |
| DE3133885C2 (en) * | 1981-08-27 | 1986-03-27 | Bayer Ag, 5090 Leverkusen | Process for the production of dimethylhydrogenchlorosilane |
| US4780556A (en) * | 1987-02-06 | 1988-10-25 | Sumitomo Chemical Company, Limited | Method for producing chlorosilanes |
| US5122356A (en) * | 1988-05-31 | 1992-06-16 | Daikin Industries Ltd. | Process for purification of hydrochloric acid |
| WO2003040156A1 (en) * | 2001-11-08 | 2003-05-15 | Hokko Chemical Industry Co., Ltd. | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes |
| US8008521B2 (en) | 2001-11-08 | 2011-08-30 | Hokko Chemical Industry Co., Ltd. | Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes |
| CN106883258A (en) * | 2017-01-19 | 2017-06-23 | 浙江硕而博化工有限公司 | HMDO produces trim,ethylchlorosilane new technology |
| CN106883258B (en) * | 2017-01-19 | 2019-11-15 | 浙江硕而博化工有限公司 | Hexamethyldisiloxane produces trim,ethylchlorosilane technique |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5941998B2 (en) | 1984-10-11 |
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