JPS5590041A - Ion source for ion implantation system - Google Patents

Ion source for ion implantation system

Info

Publication number
JPS5590041A
JPS5590041A JP15823079A JP15823079A JPS5590041A JP S5590041 A JPS5590041 A JP S5590041A JP 15823079 A JP15823079 A JP 15823079A JP 15823079 A JP15823079 A JP 15823079A JP S5590041 A JPS5590041 A JP S5590041A
Authority
JP
Japan
Prior art keywords
ion
implantation system
source
ion implantation
ion source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15823079A
Other languages
English (en)
Inventor
Hinkeru Horugaa
Kurausu Jieooku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5590041A publication Critical patent/JPS5590041A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP15823079A 1978-12-22 1979-12-07 Ion source for ion implantation system Pending JPS5590041A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782855864 DE2855864A1 (de) 1978-12-22 1978-12-22 Ionenquelle, insbesondere fuer ionenimplantationsanlagen

Publications (1)

Publication Number Publication Date
JPS5590041A true JPS5590041A (en) 1980-07-08

Family

ID=6058189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15823079A Pending JPS5590041A (en) 1978-12-22 1979-12-07 Ion source for ion implantation system

Country Status (4)

Country Link
US (1) US4288716A (ja)
EP (1) EP0012838B1 (ja)
JP (1) JPS5590041A (ja)
DE (2) DE2855864A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0135366B1 (en) * 1983-08-15 1990-11-07 Applied Materials, Inc. System and method for ion implantation
US4608513A (en) * 1984-09-13 1986-08-26 Varian Associates, Inc. Dual filament ion source with improved beam characteristics
US4841197A (en) * 1986-05-28 1989-06-20 Nihon Shinku Gijutsu Kabushiki Kaisha Double-chamber ion source
US4749911A (en) * 1987-03-30 1988-06-07 Rpc Industries Ion plasma electron gun with dose rate control via amplitude modulation of the plasma discharge
US4760262A (en) * 1987-05-12 1988-07-26 Eaton Corporation Ion source
US4891525A (en) * 1988-11-14 1990-01-02 Eaton Corporation SKM ion source
US6683414B2 (en) * 2001-10-25 2004-01-27 Northrop Grumman Corporation Ion-shielded focusing method for high-density electron beams generated by planar cold cathode electron emitters

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB792042A (en) * 1954-03-03 1958-03-19 Gen Electric Improvements in and relating to mass spectrometers
US3075078A (en) * 1960-05-13 1963-01-22 Rca Corp Corona device
FR1374335A (fr) * 1962-12-13 1964-10-09 Electronique & Physique Dispositif pour fabriquer une lame en matériau à grande pureté
US3364355A (en) * 1965-07-13 1968-01-16 Atomic Energy Commission Usa Neutron generator with occluded gas ion source
DE1964694B2 (de) * 1968-12-28 1974-04-18 Canon K.K., Tokio Kamera Verschluß mit elektronischer Zeitbildungseinrichtung
FR1604695A (ja) * 1968-12-31 1972-01-03
FR2096876B1 (ja) * 1970-07-09 1973-08-10 Thomson Csf
NL7101954A (ja) * 1971-02-13 1972-08-15
US3813549A (en) * 1972-12-26 1974-05-28 Ibm Self-healing electrode for uniform negative corona
US4156159A (en) * 1974-06-21 1979-05-22 Futaba Denshi Kogyo Kabushiki Kaisha Self crossed field type ion source
US4056723A (en) * 1976-01-23 1977-11-01 Xerox Corporation Rotatable corona device

Also Published As

Publication number Publication date
EP0012838A1 (de) 1980-07-09
US4288716A (en) 1981-09-08
DE2963692D1 (en) 1982-11-04
DE2855864A1 (de) 1980-07-10
EP0012838B1 (de) 1982-09-15

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