JPS5589833A - Photoresist film forming method - Google Patents

Photoresist film forming method

Info

Publication number
JPS5589833A
JPS5589833A JP16479878A JP16479878A JPS5589833A JP S5589833 A JPS5589833 A JP S5589833A JP 16479878 A JP16479878 A JP 16479878A JP 16479878 A JP16479878 A JP 16479878A JP S5589833 A JPS5589833 A JP S5589833A
Authority
JP
Japan
Prior art keywords
tube
photoresist
substrates
valve
wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16479878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6126648B2 (https=
Inventor
Kazuo Toda
Ryuichi Ogawa
Shuzo Oshio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16479878A priority Critical patent/JPS5589833A/ja
Publication of JPS5589833A publication Critical patent/JPS5589833A/ja
Publication of JPS6126648B2 publication Critical patent/JPS6126648B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16479878A 1978-12-28 1978-12-28 Photoresist film forming method Granted JPS5589833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16479878A JPS5589833A (en) 1978-12-28 1978-12-28 Photoresist film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16479878A JPS5589833A (en) 1978-12-28 1978-12-28 Photoresist film forming method

Publications (2)

Publication Number Publication Date
JPS5589833A true JPS5589833A (en) 1980-07-07
JPS6126648B2 JPS6126648B2 (https=) 1986-06-21

Family

ID=15800127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16479878A Granted JPS5589833A (en) 1978-12-28 1978-12-28 Photoresist film forming method

Country Status (1)

Country Link
JP (1) JPS5589833A (https=)

Also Published As

Publication number Publication date
JPS6126648B2 (https=) 1986-06-21

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